Cryopump

Patent metadata

Field	Value
Publication number	US-9700812-B2
Application number	US-201414197882-A
Country	US
Kind code	B2
Filing date	Mar 5, 2014
Priority date	Mar 5, 2013
Publication date	Jul 11, 2017
Grant date	Jul 11, 2017

Abstract

A cryopump includes: a cryopanel assembly including a plurality of cryopanels each having an adsorption area on both surfaces thereof; a radiation shield forming a gas receiving space that surrounds the cryopanel assembly; and a radiation cover disposed in a cryopump inlet. The radiation cover includes a main plate located at a position in the cryopanel inlet that corresponds to the cryopanel assembly and a louver portion located at a position in the cryopanel inlet that corresponds to the gas receiving space. The radiation cover may not include the louver portion.

First claim

What is claimed is:

1. A cryopump comprising:
a cryopump inlet;
a cryopump bottom axially remote from the cryopump inlet;
a cryopanel assembly comprising a top panel located closest to the cryopump inlet and a plurality of cryopanels arranged between the top panel and the cryopump bottom, the cryopanels arranged axially spaced apart from each other at an axial interval, each of the cryopanels comprising a front cryopanel surface directed to the cryopump inlet and comprising a front adsorption area thereon and a back cryopanel surface directed to the cryopump bottom and comprising a back adsorption area thereon;
a radiation shield forming a gas receiving space that surrounds the cryopanel assembly; and
a radiation cover disposed in the cryopump inlet, the radiation cover comprising a main plate located at a first position in the cryopanel inlet that corresponds to the cryopanel assembly, the radiation cover faces the top panel, an axial distance from the main plate to the top panel being smaller than the axial interval of the cryopanels, and a louver portion located at a second position in the cryopanel inlet that corresponds to the gas receiving space,
wherein the entire surface of the main plate is flat, the main plate comprises a flat periphery radially extending in a plane perpendicular to an axial direction of the cryopump,
wherein the entire surface for each of the cryopanels is flat, a distance between the cryopanel assembly and the main plate is 5 cm or less.

2. The cryopump according to claim 1 ,
wherein the louver portion comprises a plurality of louver boards that are provided to cross a transverse direction of the cryopump inlet such that the plurality of louver boards have a first height in a height direction that is perpendicular to the transverse direction, and
wherein the main plate has a second height that is smaller than the first height in the height direction.

3. The cryopump according to claim 1 ,
wherein the main plate covers at least 80 percent of a projection area of the top panel and occupies at most ⅓ of an opening area of the cryopump inlet.

4. The cryopump according to claim 1 ,
wherein the main plate is a flat plate that extends along a transverse direction of the cryopump inlet.

5. The cryopump according to claim 1 ,
wherein the louver portion comprises a plurality of louver boards that are provided to cross a transverse direction of the cryopump inlet, a most inner louver board of the louver boards arranged contactlessly and closest to the main plate in the transverse direction to form a transverse gap between the most inner louver board and the main plate.

6. A cryopump comprising:
a cryopump inlet;
a cryopump bottom axially remote from the cryopump inlet;
a cryopanel assembly comprising a top panel located closest to the cryopump inlet and a plurality of cryopanels arranged between the top panel and the cryopump bottom, each of the cryopanels comprising a front cryopanel surface directed to the cryopump inlet and comprising a front adsorption area thereon and a back cryopanel surface directed to the cryopump bottom and comprising a back adsorption area thereon;
a radiation shield comprising a radiation shield inner surface extending from the cryopump inlet to the cryopump bottom and surrounding the cryopanel assembly; and
a radiation cover plate disposed in the cryopump inlet, the radiation cover forms an uncovered open area extending transversely from the cover plate to the radiation shield inner surface,
wherein the radiation cover plate faces the top panel and covers at least 80 percent of a projection area of the top panel and that occupies at most ⅓ of an opening area of the cryopump inlet, and
wherein the entire surface for each of the cryopanels is flat, a distance between the cryopanel assembly and the radiation cover plate is 5 cm or less, and
wherein the entire surface of the radiation cover plate is flat, the radiation cover plate comprises a flat periphery radially extending in a plane perpendicular to an axial direction of the cryopump.

7. The cryopump according to claim 6 ,
wherein the radiation shield forms a gas receiving space between the radiation shield inner surface and the cryopanel assembly, the gas receiving space connected to outside of the cryopump through the uncovered open area.

8. The cryopump according to claim 6 ,
wherein the cover plate is a flat plate that extends along a transverse direction of the cryopump inlet.

9. The cryopump according to claim 6 ,
wherein the cryopanels are arranged axially spaced apart from each other at an axial interval, an axial distance from the cover plate to the top panel being smaller than the axial interval of the cryopanels.

10. A cryopump comprising:
a cryopump inlet;
a cryopump bottom axially remote from the cryopump inlet;
a cryopanel assembly comprising a top panel located closest to the cryopump inlet and a plurality of cryopanels arranged between the top panel and the cryopump bottom, the cryopanels arranged axially spaced apart from each other at an axial interval, each of the cryopanels comprising a front cryopanel surface directed to the cryopump inlet and comprising a front adsorption area thereon and a back cryopanel surface directed to the cryopump bottom and comprising a back adsorption area thereon;
a radiation shield forming a gas receiving space that surrounds the cryopanel assembly; and
a radiation cover disposed in the cryopump inlet, the radiation cover comprising a main plate located at a first position in the cryopanel inlet that corresponds to the cryopanel assembly, the radiation cover facing the top panel,
wherein the entire surface of the main plate is flat, the main plate comprises a flat periphery radially extending in a plane perpendicular to an axial direction of the cryopump,
wherein the entire surface of the top panel is flat, a distance between the cryopanel assembly and the main plate is 5 cm or less.

11. The cryopump according to claim 10 ,
wherein an axial distance from the main plate to the top panel being smaller than the axial interval of the cryopanels.

12. The cryopump according to claim 10 ,
wherein the radiation cover comprises a louver portion located at a second position in the cryopanel inlet that corresponds to the gas receiving space.

13. The cryopump according to claim 12 ,
wherein the louver portion comprises a plurality of louver boards that are provided to cross a transverse direction of the cryopump inlet such that the plurality of louver boards have a first height in a height direction that is perpendicular to the transverse direction, and
wherein the main plate has a second height that is smaller than the first height in the height direction.

14. The cryopump according to claim 12 ,
wherein the louver portion comprises a plurality of louver boards that are provided to cross a transverse direction of the cryopump inlet, a most inner louver board of the louver boards arranged contactlessly and closest to the main plate in the transverse direction to form a transverse gap between the most inner louver board and the main plate.

15. The cryopump according to claim 10 ,
wherein the main plate covers at least 80 percent of a projection area of the top panel and occupies at most ⅓ of an opening area of the cryopump inlet.

16. The cryopump according to claim 10 ,
wherein the main plate is a flat plate that extends along a transverse direction of the cryopump inlet.

17. The cryopump according to claim 10 ,
wherein the radiation shield comprises a radiation shield inner surface ex

Assignees

• Sumitomo Heavy Industries

Inventors

• Takahashi Kakeru

Classifications

• F04B53/06

  Venting · CPC title

• F04B37/18

  for specific elastic fluids · CPC title

• F04B37/08 Primary

  by condensing or freezing, e.g. cryogenic pumps · CPC title

• B01D8/00 Primary

  Cold traps; Cold baffles (pumps for evacuating by condensing or freezing F04B37/08) · CPC title