Modified product of polyhedral structure polysiloxane, polyhedral structure polysiloxane composition, cured product, and optical semiconductor device

US9698320B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9698320-B2
Application numberUS-201113823497-A
CountryUS
Kind codeB2
Filing dateSep 13, 2011
Priority dateSep 22, 2010
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  5. First independent claim

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Abstract

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An object of the present invention is to provide a polyhedral polysiloxane composition that has high heat resistance and high light resistance, is excellent in gas-barrier properties and thermal shock resistance, and exhibits good handleability when used to encapsulate an optical semiconductor device. The polyhedral polysiloxane composition of the present invention is characterized by including a modified polyhedral polysiloxane which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and a hydrosilyl group-containing compound (b) and has a structure derived from an organic silicon compound (a′) having one alkenyl group per molecule.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polyhedral polysiloxane composition, comprising a modified polyhedral polysiloxane which is obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a) and an organic silicon compound (a′) having one alkenyl group per molecule and at least one aryl group per molecule with a hydrosilyl group-containing compound (b), wherein the hydrosilyl group-containing compound (b) is a hydrosilyl group-containing cyclic siloxane and wherein the organic silicon compound (a′) is a silane, wherein the polyhedral polysiloxane composition has a viscosity at 23° C. of not less than 1 Pa·s and up to 5.9 Pa·s; and the modified polyhedral polysiloxane, comprises a siloxane unit represented by the formula: [XR 3 2 SiO—SiO 3/2 ] a [R 4 3 SiO—SiO 3/2 ] b wherein a+b is an integer of 6 to 24, provided that a is an integer of 1 or larger and b is an integer of 0 or 1 or larger; R 3 is alkyl; R 4 is alkenyl, hydrogen, alkyl, or a group bonded to another polyhedral polysiloxane; and X has a structure represented by the following formula (2), and in the case where multiple Xs are present, the structures of the formula (2) may be different from one another; wherein l is an integer of 2 or larger; n is an integer of 2 or larger; Z is hydrogen, alkenyl, alkyl, aryl, or a moiety bonded to a polyhedral polysiloxane via an alkylene chain, and Zs may be the same as or different from one another, provided that at least one of Zs is hydrogen, and at least one of Zs has a structure represented by the formula (3): —[CH 2 ] l —R 5   (3) wherein l is an integer of 2 or larger, and R 5 is a group containing a silane having at least two aryl groups; and R is alkyl or aryl; a phosphor; and further comprising a compound (B) having at least two alkenyl groups per molecule. 2. The polyhedral polysiloxane composition according to claim 1 , wherein the modified polyhedral polysiloxane is in liquid form at 20° C. 3. The polyhedral polysiloxane composition according to claim 1 , wherein the aryl group is directly bonded to a silicon atom. 4. The polyhedral polysiloxane composition according to claim 1 , wherein the hydrosilyl group-containing compound (b) is 1,3,5,7-tetrahydrogen-1,3,5,7-tetramethylcyclotetrasiloxane. 5. The polyhedral polysiloxane composition according to claim 1 , wherein the alkenyl group-containing polyhedral polysiloxane compound (a) is an alkenyl group-containing polyhedral polysiloxane compound comprising a siloxane unit represented by the formula: [AR 1 2 SiO—SiO 3/2 ] a [R 2 3 SiO—SiO 3/2 ] b wherein a+b is an integer of 6 to 24, provided that a is an integer of 1 or larger and b is an integer of 0 or 1 or larger; A is alkenyl; R 1 is alkyl; and R 2 is hydrogen, alkyl, or a group bonded to another polyhedral polysiloxane. 6. The polyhedral polysiloxane composition according to claim 1 , wherein the modified polyhedral polysiloxane has at least three hydrosilyl groups on average per molecule. 7. The polyhedral polysiloxane composition according to claim 1 , wherein the compound (B) is a polysiloxane (B1) having at least two alkenyl groups per molecule. 8. The polyhedral polysiloxane composition according to claim 7 , wherein the polysiloxane (B1) having at least two alkenyl groups per molecule has at least one aryl group. 9. The polyhedral polysiloxane composition according to claim 1 , wherein the compound (B) is an organic compound (B2) represented by the following formula (4) and having at least two alkenyl groups per molecule: wherein R 9 s each represent a monovalent C 1-50 organic group or hydrogen, and may be the same as or different from one another. 10. The polyhedral polysiloxane composition according to claim 9 , wherein the organic compound (B2) has a number average molecular weight of less than 900. 11. The polyhedral polysiloxane composition according to claim 9 , wherein the organic compound (B2) is at least one selected from the group consisting of triallyl isocyanurate, diallyl isocyanurate, diallyl monomethyl isocyanurate, and diallyl monoglycidyl isocyanurate. 12. The polyhedral polysiloxane composition according to claim 9 , wherein the organic compound (B2) is diallyl monomethyl isocyanurate. 13. The polyhedral polysiloxane composition according to claim 1 , comprising a hydrosilylation catalyst. 14. The polyhedral polysiloxane composition according to claim 1 , comprising a cure retardant. 15. A cured product, obtained by curing the polyhedral polysiloxane composition according to claim 1 . 16. An optical semiconductor device, comprising the polyhedral polysiloxane composition according to claim 1 as an encapsulant.

Assignees

Inventors

Classifications

  • Polysiloxanes · CPC title

  • containing silicon bound to hydrogen · CPC title

  • H01L33/56Primary

    Electricity · mapped topic

  • Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers · CPC title

  • Additives improving gas barrier properties · CPC title

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What does patent US9698320B2 cover?
An object of the present invention is to provide a polyhedral polysiloxane composition that has high heat resistance and high light resistance, is excellent in gas-barrier properties and thermal shock resistance, and exhibits good handleability when used to encapsulate an optical semiconductor device. The polyhedral polysiloxane composition of the present invention is characterized by including…
Who is the assignee on this patent?
Tanaka Hiroyuki, Manabe Takao, Kaneka Corp
What technology area does this patent fall under?
Primary CPC classification H01L33/56. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).