Rapid thickening of aminosilicones to promote emulsion stability and adhesion of UV-curable quantum dot enhancement film emulsions
US-12122948-B2 · Oct 22, 2024 · US
US9698311B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9698311-B2 |
| Application number | US-201414244539-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 3, 2014 |
| Priority date | Apr 5, 2013 |
| Publication date | Jul 4, 2017 |
| Grant date | Jul 4, 2017 |
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The present invention relates to colloidal quantum dots, to a process for producing such colloidal quantum dots, to the use thereof and to optoelectronic components comprising colloidal quantum dots.
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The invention claimed is: 1. Colloidal quantum dots comprising: a) a core comprising zinc selenide; b) one or more shells comprising zinc selenide grown onto the core, thereby obtaining a last shell; and c) at least one shell of a ZnS passivating material applied to at least one of the core or the last shell, said colloidal quantum dots being cadmium-free; and wherein a standard deviation for a size distribution of the colloidal quantum dots is not more than 10%. 2. Colloidal quantum dots according to claim 1 having an emission wavelength between 400 and 460 nm. 3. Colloidal quantum dots according to claim 1 having a half-height width (FWHM) of emission peak within a range from 10 to 30nm. 4. Colloidal quantum dots according to claim 1 , being provided in OLEDs, hybrid QD solar cells, as a stable fluorescent label in bioanalytics, in fluorescence collectors, as a luminescent security feature, in X-ray scintillators, in organic field-effect transistors and in lighting technology. 5. Colloidal quantum dots according to claim 1 , being provided in an optoelectronic component comprising a transparent anode, a hole-injecting layer, a hole-conducting layer, an electron-conducting layer, optionally an electron-injecting layer and a metal cathode. 6. Colloidal quantum dots according to claim 1 , wherein said quantum dots have a particle size between 2 and 10 nm. 7. Process for producing colloidal quantum dots according to claim 1 , comprising: a) providing a raw solution comprising at least one zinc carboxylate, b) providing at least one selenium source, c) providing at least one sulfur source, d) contacting the raw solution comprising at least one zinc carboxylate from step a) with at least one selenium source from step b), thereby obtaining a reaction solution comprising particles having a particle size, e) the reaction solution obtained from step d) with at least one further selenium source from step b) in at least one growing step thereby obtaining another reaction solution comprising particles having a particle size, and f) contacting the reaction solution obtained from at least one of step d) or step e) with at least one sulfur source from step c), wherein the colloidal quantum dots are produced in a one-pot process and the particle size in steps d) and e) is defined via the stoichiometric ratio of the raw solution comprising at least one zinc carboxylate from step a) and the selenium source from step b) or via the number of growth steps in step e). 8. Process according to claim 7 , wherein the raw solution comprising at least one zinc carboxylate is obtained by contacting a zinc salt selected from the group consisting of zinc acetate, zinc fluoride, zinc chloride, zinc bromide, zinc iodide, zinc nitrate, zinc triflate, zinc tosylate, zinc mesylate, zinc oxide, zinc sulphate, zinc acetylacetonate, zinc toluene-3,4-dithiolate, zinc p-toluene-sulphonate, zinc diethyldithiocarbamate, zinc dibenzyldithiocarbamate and mixtures of these, with at least one carboxylic acid selected from the group consisting of acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, heptanoic acid, caprylic acid, capric acid, undecanoic acid, lauric acid, myristic acid, palmitic acid, stearic acid, behenic acid, acrylic acid, methacrylic acid, but-2-enoic acid, but-3-enoic acid, pent-2-enoic acid, pent-4-enoic acid, hex-2-enoic acid, hex-3-enoic acid, hex-4-enoic acid, hex-5-enoic acid, hept-6-enoic acid, oct-2-enoic acid, dec-2-enoic acid, undec-10-enoic acid, dodec-5-enoic acid, oleic acid, gadoleic acid, erucic acid, linoleic acid, α-linolenic acid, calendic acid, eicosadienoic acid, eicosatrienoic acid, arachidonic acid, stearidonic acid, benzoic acid, para-toluic acid, ortho-toluic acid, meta-toluic acid, hydrocinnamic acid, naphthenic acid, cinnamic acid, para-toluenesulphonic acid and mixtures of these. 9. Process according to claim 7 , wherein the selenium source is selected from the group consisting of trioctylphosphine selenide, tri(n-butyl)phosphine selenide, tri(sec-butyl)phosphine selenide, tri(tert-butyl) phosphine selenide, trimethylphosphine selenide, triphenylphosphine selenide, diphenylphosphine selenide, phenylphosphine selenide, cyclohexylphosphine selenide, octaselenol, dodecaselenol, selenophenol, elemental selenium dissolved in octadecene, selenium dioxide dissolved in octadecene, selenourea, bis(trimethylsilyl) selenide and mixtures of these. 10. Process according to claim 7 , wherein the sulfur source is selected from the group consisting of elemental sulfur, octanethiol, dodecanethiol, octadecanethiol, tributylphosphine sulphide, cyclohexyl isothiocyanate, α-toluenethiol, ethylene trithiocarbonate, allyl mercaptan, bis(trimethylsilyl) sulphide, trioctylphosphine sulphide and mixtures of these. 11. Process according to claim 7 , wherein (i) the raw solution comprising at least one zinc carboxylate from step a), before being contacted with the selenium source from step b) in step d), is heated to a temperature within a range from 200° C. to 320° C., (ii) the reaction solution of a further selenium source from step b), obtained from step d), is contacted and, after contacting, is heated to a temperature within a range from 200° C. to 320° C., and (iii) the reaction solution obtained from at least one of step d) or step e), after being contacted with the sulfur source from step c), is heated to a temperature within a range from 200° C. to 320° C. 12. Process for producing an optoelectronic component comprising: a) providing a transparent anode, b) providing a hole-injecting layer, c) providing a hole-conducting layer, d) providing a layer comprising quantum dots according to claim 1 , e) providing an electron-conducting layer, f) optionally providing an electron-injecting layer, and g) providing a metal cathode, wherein the optoelectronic component is produced in a layer structure and the quantum dot layer is applied to the hole-conducting layer by spin-coating, dip-coating, inkjet printing, gravure printing and/or spray-coating.
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