Composition, method for producing film with the composition, and method for producing liquid discharge head

US9696620B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9696620-B2
Application numberUS-201514692496-A
CountryUS
Kind codeB2
Filing dateApr 21, 2015
Priority dateApr 23, 2014
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A composition includes a photoacid generator and a fluorine-containing epoxy resin that is a polymer of monomers that include an acrylic monomer (a) having a perfluoropolyether group having 9 or more carbon atoms and an acrylic monomer (b) having an epoxy group in a composition ratio such that a number of acrylic functional groups derived from the acrylic monomer (b) is larger than a number of acrylic functional groups derived from the acrylic monomer (a).

First claim

Opening claim text (preview).

What is claimed is: 1. A composition comprising: a fluorine-containing epoxy resin that is a polymer of monomers that includes: an acrylic monomer (a) having a perfluoropolyether group having 9 or more carbon atoms; an acrylic monomer (b) having an epoxy group; and an acrylic monomer (c) having a fluorine-containing group other than perfluoropolyether groups: wherein the polymer is obtained by polymerizing a mixture of the monomers and, total number of acrylic groups of the acrylic monomer (b) in the monomer mixture is larger than total number of acrylic groups of the acrylic monomer (a) in the monomer mixture; and a photoacid generator. 2. The composition according to claim 1 , wherein the acrylic monomer (a) is at least one of compounds represented by formulae (1), (2), and (3) below, in the formulae (1) and (2), X represents a hydrogen atom, a fluorine atom, —CFX 1 X 2 group, a linear or branched fluoroalkyl group having 1 to 21 carbon atoms, a substituted or unsubstituted benzyl group, a substituted or unsubstituted phenyl group, or a linear or branched alkyl group having 1 to 20 carbon atoms, where X 1 and X 2 of CFX 1 X 2 represent a hydrogen atom or a fluorine atom; Y represents a single bond, a linear or branched aliphatic group that has 1 to 10 carbon atoms and may have an oxygen atom, an aromatic group that has 6 to 10 carbon atoms and may have an oxygen atom, an alicyclic group, a group having a urethane bond, or a —CH 2 CH(OY 1 )CH 2 — group, where Y 1 represents a hydrogen atom or an acetyl group, and Rp is a group represented by a formula (6) below, in the formula (6), o, p, q, and r each represent 0 or an integer of 1 to 30 and satisfy 3×o+2×p+3×q+r≧9; and the repeating units may be arranged in random order, in the formula (3), a represents an integer of 1 to 4, b represents an integer of 1 to 4, and a+b is 3, 4, or 5; Z represents a divalent organic group; c represents 0 or 1; Rp has the same definition as in the formulae (1) and (2); R 3 is a group represented by a formula (4) below; and R 2 is a group represented by a formula (5) below, —(C 4 H 8 O) d (C 3 H 6 O) e (C 2 H 4 O) f (CH 2 O) g -  (4) in the formula (4), d, e, f, and g each independently represent an integer of 0 to 4 as long as R 3 has a molecular weight in a range of 30 to 300; and the repeating units may be arranged in random order, in the formula (5), R 4 represents a divalent or trivalent bonding group that has 1 to 18 carbon atoms and that may have an ether bond and/or an ester bond; l represents 1 or 2; and X has the same definition as in the formulae (1) and (2). 3. The composition according to claim 2 , wherein, in the formula (6), q≧1. 4. The composition according to claim 2 , wherein the acrylic monomer (b) is represented by a formula (7) below, in the formula (7), Rc represents a substituent having an epoxy group; and X and Y have the same definitions as in the formulae (1) and (2). 5. The composition according to claim 4 , wherein, in the formula (7), Rc represents a 3,4-epoxycyclohexyl group. 6. The composition according to claim 1 , wherein the monomers include, as another monomer, an acrylic monomer (d) having an alkyl group or an aryl group. 7. The composition according to claim 1 , further comprising an epoxy resin other than the fluorine-containing epoxy resin. 8. A method for producing a film, comprising a step of subjecting the composition according to claim 1 to cationic polymerization.

Assignees

Inventors

Classifications

  • Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

  • Polyorganosiloxane-containing compositions · CPC title

  • G03F7/038Primary

    Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

  • Macromolecular compounds · CPC title

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What does patent US9696620B2 cover?
A composition includes a photoacid generator and a fluorine-containing epoxy resin that is a polymer of monomers that include an acrylic monomer (a) having a perfluoropolyether group having 9 or more carbon atoms and an acrylic monomer (b) having an epoxy group in a composition ratio such that a number of acrylic functional groups derived from the acrylic monomer (b) is larger than a number of …
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G03F7/038. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).