Microchip and film forming method for metal thin film of microchip

US9696253B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9696253-B2
Application numberUS-201414895405-A
CountryUS
Kind codeB2
Filing dateJun 2, 2014
Priority dateJun 4, 2013
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Disclosed herein are a microchip provided with a titanium oxide film between a glass substrate and a metal thin film; and a method for forming the metal thin film and the titanium oxide film on the glass substrate of the microchip. The microchip has a second microchip substrate that has the metal thin film inside a channel, and the titanium oxide film, which has a low extinction coefficient, is provided as a buffer layer between the substrate and the metal thin film such as a gold film.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a metal thin film in a microchip including a substrate made of glass on which the metal thin film is formed, and a channel formed in a space including the metal thin film, the method comprising: irradiating a surface of the substrate with light including vacuum ultraviolet light with a wavelength equal to or less than 200 nm under an ambient atmosphere containing oxygen and moisture; immersing the substrate in titanium ion solution and forming a titanium oxide film having a rutile type structure and an anatase type structure being mixed on a vacuum ultraviolet light irradiated face of the substrate; and depositing the metal thin film on the surface of the substrate on which the titanium oxide film is formed. 2. The method for forming a metal thin film in a microchip according to claim 1 , wherein the metal thin film is composed of any of gold (Au), platinum (Pt), rhodium (Rh), palladium (Pd), or palladium-platinum alloy (Pd—Pt alloy).

Assignees

Inventors

Classifications

  • Hydrophilic and oleophilic coatings · CPC title

  • Properties of coatings · CPC title

  • Pre-treatment · CPC title

  • Coatings of the type glass/inorganic compound/metal · CPC title

  • the multilayer coating containing a metal layer · CPC title

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What does patent US9696253B2 cover?
Disclosed herein are a microchip provided with a titanium oxide film between a glass substrate and a metal thin film; and a method for forming the metal thin film and the titanium oxide film on the glass substrate of the microchip. The microchip has a second microchip substrate that has the metal thin film inside a channel, and the titanium oxide film, which has a low extinction coefficient, is…
Who is the assignee on this patent?
Ushio Electric Inc
What technology area does this patent fall under?
Primary CPC classification G01N21/05. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).