Synthetic gel for crystal growth inducing only secondary growth from surface of silicalite-1 or zeolite beta seed crystal

US9695055B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9695055-B2
Application numberUS-201214408144-A
CountryUS
Kind codeB2
Filing dateJun 15, 2012
Priority dateJun 15, 2012
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A synthetic gel for crystal growth, which induces only secondary growth from the surface of a silicalite-1 or zeolite beta seed crystal and cannot induce crystal nucleation in the synthetic gel for crystal growth or on the surface of the seed crystal. The synthetic gel contains fumed silica, tetraethylammonium hydroxide (TEAOH), [(NH 4 ) 2 SiF 6 ], KOH, and H 2 O, or contains tetraethylorthosilicate (TEOS), tetraethylammonium hydroxide (TEAOH), hydrogen fluoride, and H 2 O.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for preparing a thin film or a thick film, the method comprising: (1) aligning non-spherical silicalite-1 seed crystals on at least one surface of a substrate such that one or more or all of a-axes, b-axes and c-axes of the seed crystals are oriented according to a predetermined rule; (2) removing an amorphous silica layer formed on the surface of the seed crystals; and (3) exposing the aligned seed crystals to the synthetic gel for crystal growth, which induces only secondary growth from a surface of silicalite-1 (SL) seed crystals and does not induce crystal nucleation in the synthetic gel or on the surface of the seed crystals, comprising fumed silica, tetraethylammonium hydroxide (TEAOH), [(NH4)2SiF6], KOH and H2O, and forming and growing the film from the seed crystals by a secondary growth method. 2. The method of claim 1 , wherein a secondary growth from the seed crystal surface using the synthetic gel enables the seed crystals to be connected to one another two-dimensionally while growing vertically to form a three-dimensional structure, thereby forming the film. 3. The method of claim 1 , wherein the film, formed in an area in which orientations of at least one axis of seed crystals adjacent to each other are uniform, have: (a) channels that are continuously connected to one another and extend in an axial direction parallel to the substrate surface; (b) channels that are continuously connected to one another and extend in an axial direction perpendicular or inclined with respect to the substrate surface; or (c) both the channels of (a) and the channels of (b). 4. The method of claim 1 , wherein the a-axis, b-axis or c-axis of the seed crystals is oriented normal to the substrate surface in step (1). 5. The method of claim 1 , wherein step (1) comprises placing the seed crystals on the substrate, and then aligning the orientation of the a-axis, b-axis or c-axis of the seed crystals by physical pressure. 6. The method of claim 5 , wherein the physical pressure is applied by rubbing or pressing against the substrate. 7. A method for preparing a thin film or a thick film, the method comprising: (1) aligning non-spherical or zeolite beta seed crystals on at least one surface of a substrate such that one or more or all of a-axes, b-axes and c-axes of the seed crystals are oriented according to a predetermined rule; (2) removing an amorphous silica layer formed on the surface of the seed crystals; and (3) exposing the aligned seed crystals to the synthetic gel for crystal growth, which induces only secondary growth from a surface of zeolite beta (BEA) seed crystals and does not induce crystal nucleation in the synthetic gel or on the surface of the seed crystals, comprising tetraethylorthosilicate (TEOS), tetraethylammonium hydroxide (TEAOH), hydrogen fluoride and H2O, and forming and growing the film from the seed crystals by a secondary growth method. 8. The method of claim 1 , wherein a ratio of fumed silica:TEAOH:[(NH 4 ) 2 SiF 6 ]:KOH:H 2 O in the synthetic gel for crystal growth is 4.00:1.92:0.36:0.40:n 1 (molar ratio), where n 1 ranges from 30 to 80. 9. The method of claim 1 , wherein the synthetic gel for crystal growth is capable of inducing secondary growth such that a-axes of silicalite-1 (SL) are uniformly oriented. 10. The method of claim 7 , wherein a ratio of TEOS:TEAOH:hydrogen fluoride:H 2 O in the synthetic gel is 4.00:2.20:2.20:n 3 (molar ratio), where n 3 ranges from 30 to 40. 11. The method of claim 7 , wherein the synthetic gel is capable of inducing secondary growth such that a-axes or b-axes of zeolite beta (BEA) are uniformly aligned.

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Classifications

  • C01B39/48Primary

    using at least one organic template directing agent · CPC title

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What does patent US9695055B2 cover?
A synthetic gel for crystal growth, which induces only secondary growth from the surface of a silicalite-1 or zeolite beta seed crystal and cannot induce crystal nucleation in the synthetic gel for crystal growth or on the surface of the seed crystal. The synthetic gel contains fumed silica, tetraethylammonium hydroxide (TEAOH), [(NH 4 ) 2 SiF 6 ], KOH, and H 2 O, or contains tetraethylorthosil…
Who is the assignee on this patent?
Yoon Kyung Byung, Pham Cao Thanh Tung, Kim Hyun Sung, and 1 more
What technology area does this patent fall under?
Primary CPC classification C01B39/48. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).