Gas cleaning system having a gas flow rectifier

US9694315B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9694315-B2
Application numberUS-201113817790-A
CountryUS
Kind codeB2
Filing dateAug 16, 2011
Priority dateAug 19, 2010
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure deals with a gas cleaning system ( 1 ) for cleaning process flue gas. The gas cleaning system ( 1 ) comprises a reactor inlet duct ( 13 ) having a longitudinal axis and a reactor duct ( 14 ) fluidly connected perpendicularly to the reactor inlet duct and positioned downstream from the reactor inlet duct. The reactor duct likewise has a longitudinal axis. Within the reactor duct is a gas cleaning device ( 20 ), such as a catalytic reactor, and a gas flow rectifier ( 30 ) for rectifying flue gas flow from the reactor inlet duct ( 13 ) into the reactor duct ( 14 ). The gas flow rectifier is arranged in the reactor duct upstream of the gas cleaning device ( 20 ), wherein the gas flow rectifier ( 30 ) comprises at least one expanded screen ( 30 a ).

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas cleaning system comprising: a vertical duct comprising an ammonia injection grid arranged horizontally across the vertical duct operative for an upward flow of a flue gas through both the vertical duct and the ammonia injection grid; a vertical reactor duct fluidly connected to the vertical duct for a downward flow of the flue gas therethrough; a catalytic reactor gas cleaning device arranged horizontally across the vertical reactor duct operative for the downward flow of the flue gas therethrough; and a gas flow rectifier comprising at least one planar expanded screen for rectifying flue gas flow comprising a plurality of angled strands alternating between an angled strand angled upwardly to a highest point from a plane of the gas flow rectifier and an angled strand angled downwardly to a lowest point from the plane of the gas flow rectifier with angle, distance, length, height, width, and thickness of the plurality of angled strands defining a solidity of the gas flow rectifier ranging from 0.1 to 0.8, arranged at an entry of the vertical reactor duct with the plane of the gas flow rectifier arranged horizontally across, vertically above, upstream of, and parallel to the catalytic reactor gas cleaning device. 2. A gas cleaning system according to claim 1 , wherein the at least one expanded screen is made of metal. 3. A gas cleaning system according to claim 1 , wherein the at least one expanded screen has a planar side substantially perpendicular to a longitudinal axis of the vertical reactor duct. 4. A gas cleaning system according to claim 1 , wherein each angled strand has at least a portion thereof angled with respect to a planar side of the expanded screen. 5. A gas cleaning system according to claim 1 , wherein the solidity of the at least one expanded screen is between 0.2 and 0.7. 6. A gas cleaning system according to claim 1 , wherein the at least one expanded screen comprises a first expanded screen and at least a second expanded screen, the second expanded screen positioned closer to the catalytic reactor gas cleaning device than the first expanded screen. 7. A gas cleaning system according to claim 6 , wherein the second expanded screen is distanced from the first expanded screen for reduction of flue gas flow turbulence prior to contacting the second expanded screen. 8. A gas cleaning system according to claim 6 , wherein the solidity of the first expanded screen is higher than that of the second expanded screen. 9. A gas cleaning system according to claim 6 , wherein the solidity of the first expanded screen is between 0.4 and 0.6 and the solidity of the second expanded screen is between 0.3 and 0.5. 10. A gas cleaning system according to claim 6 , wherein the at least one expanded screen comprises a plurality of expanded screens arranged in parallel across a longitudinal axis of the vertical reactor duct. 11. A gas cleaning system according to claim 1 , further comprising a reactor inlet duct positioned upstream the vertical reactor duct, the reactor inlet duct having a longitudinal direction diverted from the longitudinal direction of the vertical reactor duct, wherein the gas flow rectifier is arranged for rectifying gas flow from the reactor inlet duct into the vertical reactor duct. 12. A gas cleaning system according to claim 11 , wherein the at least one expanded screen comprises angled strands angled such that they are directed away from the longitudinal axis of the reactor inlet duct. 13. A gas cleaning system according to claim 11 , wherein the at least one expanded screen is arranged substantially perpendicular to a longitudinal axis of the vertical reactor duct.

Assignees

Inventors

Classifications

  • flow channels with means to enhance flow mixing,(e.g. protrusions or projections) · CPC title

  • B01D45/08Primary

    by impingement against baffle separators · CPC title

  • Catalytic processes · CPC title

  • Exhaust flow directors or the like, e.g. upstream of catalytic device · CPC title

  • Expanding other than provided for in groups B21D1/00 - B21D28/00, e.g. for making expanded metal (B21D47/00 takes precedence; enlarging tube ends B21D41/02) · CPC title

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Frequently asked questions

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What does patent US9694315B2 cover?
The present disclosure deals with a gas cleaning system ( 1 ) for cleaning process flue gas. The gas cleaning system ( 1 ) comprises a reactor inlet duct ( 13 ) having a longitudinal axis and a reactor duct ( 14 ) fluidly connected perpendicularly to the reactor inlet duct and positioned downstream from the reactor inlet duct. The reactor duct likewise has a longitudinal axis. Within the reacto…
Who is the assignee on this patent?
Hjelmberg Anders Erik Martin, Tabikh Ali Mustapha, General Electric Technology Gmbh
What technology area does this patent fall under?
Primary CPC classification B01D45/08. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).