Pressure based mass flow controller

US9690301B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9690301-B2
Application numberUS-201314022165-A
CountryUS
Kind codeB2
Filing dateSep 9, 2013
Priority dateSep 10, 2012
Publication dateJun 27, 2017
Grant dateJun 27, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mass flow controller (MFC) has a standard envelope with an enclosure and a corresponding base. A pressure transducer is communicatively coupled to a process gas in a proportional inlet valve without being physically coupled to the base. The space formerly occupied by the pressure transducer is available for additional component integration, or reduction of the standard envelope size. A second pressure transducer is located remotely and shared by multiple MFCs. A relief valve can quickly relieve a P 1 pressure of a P 1 volume of process gas. A first laminar flow element (LFE) and a second LFE and in series high conductance valve configured in parallel to produce a wide-range MFC that maintains accuracy.

First claim

Opening claim text (preview).

We claim: 1. A mass flow controller (MFC) for delivery of process gas, comprising: an enclosure attached to a base with a length; a conduit channeling through the base of the MFC to receive the process gas and to exhaust the process gas at a desired mass flow rate; a proportional inlet valve physically coupled to the base and having an input and an output to utilize conductance to control a P 1 pressure of a P 1 volume of the process gas, wherein a first pressure transducer is coupled to the proportional inlet valve without being physically coupled to the conduit in the base, and wherein a pressure of the process gas, after passing through a valve seat of proportional inlet valve, is communicated to the first pressure transducer via a hole in the proportional inlet valve; a restrictor coupled to the conduit of the base downstream from the proportional inlet valve; a second pressure transducer physically coupled to the conduit of the base downstream from the restrictor; an embedded temperature sensor; a printed circuit board (PCB) containing support electronics and software to detect and control the gas flow; and a relief valve to reduce bleed down time of transients between gas flows by venting at least a portion of process gas from the P 1 volume; wherein the relief valve comprises an on/off valve with an orifice in series for bleeding off process gas from the P 1 volume only when wanted. 2. The MFC of claim 1 , wherein the proportional inlet valve comprises a hole drilled through a middle piece, allowing the process gas to be communicatively coupled to the first pressure transducer. 3. The MFC of claim 1 , wherein the relief valve comprises a proportional-integral-derivate (PID) controlled relief valve. 4. The MFC of claim 1 , further comprising: a first laminar flow element (LFE) that maintains an accuracy of 1% over a first dynamic range; and a second LFE in series with a valve to control activation of the second LFE, the second LFE configured in parallel to the first LFE and maintaining an accuracy of 1% over a second dynamic range. 5. A mass flow controller (MFC) for delivery of process gas, comprising: a base, the base having an inlet and an outlet; a conduit having sections and running along the base to receive the process gas at the inlet of the base at an initial mass flow rate and to exhaust the process gas at the outlet of the base at a desired mass flow rate; a proportional inlet valve coupled to the base and having an input and an output to affect the process gas flowing through a first section of the conduit; a first pressure transducer coupled to the base to monitor a pressure of the process gas flowing through a second section of the conduit; a restrictor coupled to the conduit of the base downstream from the first pressure transducer; an embedded temperature sensor; a printed circuit board (PCB) containing support electronics and software to detect and control the gas flow; a second pressure transducer configured to monitor a manifold pressure of the process gas in a manifold located downstream from the outlet of the base; and a relief valve physically coupled to the base to reduce bleed down time of transients between gas flows by venting at least a portion of process gas at P 1 pressure. 6. A mass flow controller (MFC) for delivery of process gas, comprising: an enclosure attached to a base with a length; a conduit channeling through the base of the MFC to receive the process gas and to exhaust the process gas at a desired mass flow rate; a proportional inlet valve physically coupled to the base and having an input and an output to utilize conductance to control a P 1 pressure of the process gas, wherein a first pressure transducer is coupled to the proportional inlet valve without being physically coupled to the conduit in the base, wherein a pressure of the process gas is communicated to the first pressure transducer via a hole drilled through the proportional inlet valve; a relief valve physically coupled to the base to reduce bleed down time of transients between gas flows by venting at least a portion of process gas at P 1 pressure a restrictor coupled to the conduit of the base downstream from the proportional inlet valve; a second pressure transducer external to the enclosure and coupled to receive the process gas downstream from the MFC, wherein the second pressure transducer is accessed by more than one MFC; a first laminar flow element (LFE) that maintains an accuracy of 1% over a first dynamic range; and a second LFE in series with a valve to control activation of the second LFE, the second LFE configured in parallel to the first LFE and maintaining an accuracy of 1% over a second dynamic range, an embedded temperature sensor; a printed circuit board (PCB) containing support electronics and software to detect and control the gas flow. 7. A mass flow controller (MFC) for delivery of process gas, comprising: an enclosure attached to a base with a length; a conduit channeling through the base of the MFC to receive the process gas and to exhaust the process gas at a desired mass flow rate; a proportional inlet valve physically coupled to the base and having an input and an output to utilize conductance to control a P 1 pressure of a P 1 volume of the process gas, a first pressure transducer physically coupled to the base downstream from the proportional inlet valve to monitor P 1 pressure; a restrictor coupled to the conduit of the base downstream from the proportional inlet valve; a first laminar flow element (LFE) that maintains an accuracy of 1% over a first dynamic range; and a second LFE in series with a high conductance valve to control activation of the second LFE, the second LFE configured in parallel to the first LFE and maintaining an accuracy of 1% over a second dynamic range, a second pressure transducer physically coupled to the conduit of the base downstream from the first and second LFEs; an embedded temperature sensor; and a printed circuit board (PCB) containing support electronics and software to detect and control the gas flow. 8. A mass flow controller (MFC) for delivery of process gas, comprising: an enclosure attached to a base with a length; a conduit channeling through the base of the MFC to receive the process gas and to exhaust the process gas at a desired mass flow rate; a proportional inlet valve physically coupled to the base and having an input and an output to utilize conductance to control a P 1 pressure of a P 1 volume of the process gas; a first pressure transducer physically coupled to the base downstream from the proportional inlet valve to monitor P 1 pressure; a relief valve to reduce bleed down time of transients between gas flows by venting at least a portion of process gas at P 1 pressure; a restrictor coupled to the conduit of the base downstream from the proportional inlet valve; a second pressure transducer physically coupled to the conduit of the base downstream from the restrictor; an embedded temperature sensor; and a printed circuit board (PCB) containing support electronics and software to detect and control the gas flow; wherein the relief valve is located between the restrictor and the proportional inlet valve. 9. The MFC of claim 8 , wherein the relief valve comprises a PID controlled relief valve. 10. The MFC of claim 8 , wherein the relief valve comprises an on/off valve with an orifice in series for bleeding off only when wanted. 11. The MFC of claim 10 , wherein the relief valve is located downstream, external to the enclosure. 12. An integrated gas system (IGS)-style mass flow controller (MFC) for delivery of pro

Assignees

Inventors

Classifications

  • Control by pressures across flow line valve · CPC title

  • G05D7/0635Primary

    by action on throttling means (G05D7/0688, G05D7/0694 take precedence) · CPC title

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What does patent US9690301B2 cover?
A mass flow controller (MFC) has a standard envelope with an enclosure and a corresponding base. A pressure transducer is communicatively coupled to a process gas in a proportional inlet valve without being physically coupled to the base. The space formerly occupied by the pressure transducer is available for additional component integration, or reduction of the standard envelope size. A second…
Who is the assignee on this patent?
Reno Tech Inc
What technology area does this patent fall under?
Primary CPC classification G05D7/0635. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 27 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).