Photoimageable compositions containing thermal base generators

US9690196B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9690196-B2
Application numberUS-201514982672-A
CountryUS
Kind codeB2
Filing dateDec 29, 2015
Priority dateDec 30, 2014
Publication dateJun 27, 2017
Grant dateJun 27, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Embodiments in accordance with the present invention encompass positive-tone, aqueous developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoimageable aqueous developable positive tone composition comprising: a) a polymer having one or more first repeating units represented by formula (IA), said first repeating unit is derived from a monomer of formula (I): wherein: m is an integer 0, 1 or 2; R 1 , R 2 , R 3 and R 4 are the same or different and each independently selected from the group consisting of hydrogen, halogen, linear or branched (C 1 -C 12 )alkyl, hydroxy(C 1 -C 12 )alkyl, perfluoro(C 1 -C 12 )alkyl, (C 3 -C 12 )cycloalkyl, (C 6 -C 12 )bicycloalkyl, (C 7 -C 14 )tricycloalkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 6 )alkyl, perfluoro(C 6 -C 10 )aryl, perfluoro(C 6 -C 10 )aryl(C 1 -C 3 )alkyl, (C 5 -C 10 )heteroaryl, (C 5 -C 10 )heteroaryl(C 1 -C 3 )alkyl, hydroxy, (C 1 -C 12 )alkoxy, (C 3 -C 12 )cycloalkoxy, (C 6 -C 12 )bicycloalkoxy, (C 7 -C 14 )tricycloalkoxy, (C 6 -C 10 )aryloxy(C 1 -C 3 )alkyl, (C 5 -C 10 )heteroaryloxy(C 1 -C 3 )alkyl, (C 6 -C 10 )aryloxy, (C 5 -C 10 )heteroaryloxy, (C 1 -C 6 )acyloxy, —(CH 2 ) a —CO 2 R, a group of formula (A): —(CH 2 ) b —(OCH 2 —CH 2 ) c —OR  (A); and a group of formula (B): wherein: a is an integer from 0 to 4 b is an integer 0, 1, 2, 3 or 4; c is an integer 0, 1, 2, 3 or 4; and R is selected from the group consisting of hydrogen, linear or branched (C 1 -C 6 )alkyl, (C 5 -C 8 )cycloalkyl, (C 6 -C 10 )aryl and (C 7 -C 12 )aralkyl; and a second repeating unit represented by formula (IIA) or (IIB), said second repeating unit is derived from a monomer of formula (II): wherein: R 5 , R 6 , R 7 and R 8 are each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 9 )alkyl, fluorinated or perfluorinated (C 1 -C 9 )alkyl, (C 1 -C 12 )alkoxy(C 1 -C 12 )alkyl and (C 1 -C 12 )alkoxy(C 1 -C 12 )alkoxy(C 1 -C 12 )alkyl; and wherein each of aforementioned groups, where valence is permissible, is optionally substituted with one or more groups selected from the group consisting of linear or branched (C 1 -C 6 )alkyl, (C 3 -C 7 )cycloalkyl, (C 1 -C 6 )perfluoroalkyl, (C 1 -C 6 )alkoxy, (C 3 -C 7 )cycloalkoxy, (C 1 -C 6 )perfluoroalkoxy, halogen, hydroxy, linear or branched hydroxy(C 1 -C 6 )alkyl, acetoxy, phenyl, hydroxyphenyl and acetoxyphenyl; b) a thermal base generator selected from the group consisting of: (i) a compound of formula (III): (ii) a compound of formula (IV): (iii) a compound of formula (V):  and (iv) a compound of formula (VI): wherein R 9 , R 10 and R 11 are the same or different and each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 16 )alkyl, cyano(C 1 -C 16 )alkyl, cyano(C 1 -C 16 )alkoxy(C 1 -C 16 )alkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 3 )alkyl, perfluoro(C 6 -C 10 )aryl, perfluoro(C 6 -C 10 )aryl(C 1 -C 3 )alkyl, (C 1 -C 12 )alkoxy(C 1 -C 8 )alkyl, (C 6 -C 10 )aryloxy(C 1 -C 3 )alkyl, (C 5 -C 10 )heteroaryloxy(C 1 -C 3 )alkyl, (C 6 -C 10 )aryloxy, (C 5 -C 10 )heteroaryloxy, (C 1 -C 6 )acyloxy and (C 1 -C 6 )acyloxy; R 12 is selected from the group consisting of (C 1 -C 6 )alkyloxycarbonyl, (C 6 -C 10 )aryl(C 1 -C 6 )alkyloxycarbonyl, (C 6 -C 10 )aryloxycarbonyl and cyano(C 1 -C 6 )alkyl; R 13 , R 14 and R 17 are the same or different and each independently of one another selected from the group consisting of hydrogen, methyl, ethyl, a linear, branched or cyclic (C 3 -C 12 )alkyl, a linear, branched or cyclic (C 3 -C 12 )heteroalkyl having from 1 to 4 heteroatoms independently selected from nitrogen, oxygen and sulfur, (C 6 -C 10 )aryl and (C 5 -C 10 )heteroaryl having from 1 to 4 heteroatoms independently selected from nitrogen, oxygen and sulfur; R 15 and R 16 are the same or different and each independently of one another selected from the group consisting of hydrogen and (C 1 -C 6 )alkyl; or where R 16 taken together with the nitrogen atom to which it is attached to and one of R 13 or R 14 taken together with the nitrogen atom to which it is attached to and any intervening atoms form a cyclic heteroalkyl group; R 17 taken together with the carbon atom to which it is attached to and one of R 13 or R 14 taken together with the nitrogen atom to which it is attached to and any intervening atoms form a cyclic heteroalkyl group; one of R 13 or R 14 taken together with the nitrogen atom to which it is attached to and one of adjacent R 13 or R 14 taken together with the nitrogen atom to which it is attached to and any intervening atoms form a cyclic heteroalkyl group; and X Θ is selected from the group consisting of halide, sulfonate, methanesulfonate, trifluoromethanesulfonate and a carboxylate anion; c) a photoactive compound; and d) a carrier solvent. 2. The composition of claim 1 , wherein m is 0, R 1 is phenethyl, R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are hydrogen. 3. The composition of claim 1 , wherein the polymer comprises one or more repeat units derived from the corresponding monomers selected from the group consisting of: 5-benzylbicyclo[2.2.1]hept-2-ene; and 5-phenethylbicyclo[2.2.1]hept-2-ene. 4. The composition of claim 1 , wherein the polymer comprises one or more repeat units derived from the corresponding monomers selected from the group consisting of: maleic anhydride; and 2-methyl-maleic anhydride. 5. The composition of claim 1 , wherein the polymer is selected from the group consisting of: a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene and repeat unit of formula (IIA) where R 5 , R 6 , R 7 and R 8 are hydrogen; a copolymer containing repeating units derived from 5-phenethylbicyclo[2.2.1]hept-2-ene and repeat unit of formula (IIA) where R 5 , R 6 , R 7 are hydrogen and R 8 is methyl. 6. The composition of claim 1 , wherein the thermal base generator is of the formula (III): wherein R 12 is selected from the group consisting of tert-butoxycarbonyl, iso-butoxycarbonyl, iso-propoxycarbonyl, n-propoxycarbonyl, methoxycarbonyl, ethoxycarbonyl and cyanoethyl; and R 9 , R 10 and R 11 are the same or different and each independently of one another selected from the group consisting of hydrogen, methyl, ethyl, phenyl and cyanoethoxymethyl. 7. The composition of claim 6 , wherein the thermal base generator is selected from the group consisting of: 1-(tert-butoxycarbonyl)imidazole; 1-(iso-butoxycarbonyl)imidazole; 1-(iso-propoxycarbonyl)imidazole; 1-(n-propoxycarbonyl)imidazole; 1-(methoxycarbonyl)imidazole;

Assignees

Inventors

Classifications

  • the macromolecular compound having an alicyclic moiety in a side chain · CPC title

  • used as adhesion-promoting additives or as means to improve adhesion · CPC title

  • G03F7/0233Primary

    characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides · CPC title

  • Macromolecular quinonediazides; Macromolecular additives, e.g. binders {(G03F7/0226 takes precedence)} · CPC title

  • G03F7/039Primary

    Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title

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What does patent US9690196B2 cover?
Embodiments in accordance with the present invention encompass positive-tone, aqueous developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
Who is the assignee on this patent?
Promerus Llc
What technology area does this patent fall under?
Primary CPC classification G03F7/0233. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 27 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).