Curable composition for imprints, patterning method and pattern

Patent metadata

Field	Value
Publication number	US-9684233-B2
Application number	US-201013509209-A
Country	US
Kind code	B2
Filing date	Nov 10, 2010
Priority date	Nov 10, 2009
Publication date	Jun 20, 2017
Grant date	Jun 20, 2017

Abstract

A curable composition for imprints, containing (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom, (A2) a polymerizable compound having an aromatic group and (B) a photopolymerization initiator, exhibits good patternability in repeated pattern transferring and solvent resistance.

First claim

The invention claimed is:

1. A curable composition for imprints, comprising (A) a polymerizable compound and (B) a photopolymerization initiator, wherein:
the polymerizable compound (A) comprises (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom and (A2) a polymerizable compound having an aromatic group;
the polymerizable compound (A2) having an aromatic group is an acrylate or a methacrylate; and
the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom has a partial structure of the following formula (II):

wherein L 1 represents an alkylene group having from 1 to 8 carbon atoms; L 2 represents a linking group; m1 indicates 0 or 1, m2 indicates 1; m3 indicates an integer of from 1 to 3; p indicates an integer of from 1 to 8; and when m3 is 2 or more, (—C p F 2p+1 )'s may be the same or different.

2. The curable composition for imprints according to claim 1 , wherein 20% by mass or more of the polymerizable compound (A) is a polyfunctional polymerizable compound having two or more polymerizable functional groups and an aromatic group in the molecule.

3. The curable composition for imprints according to claim 1 , wherein more than 90% by mass of the polymerizable compound (A) is a polymerizable compound having a viscosity of 300 mPa·s or less.

4. The curable composition for imprints according to claim 1 , wherein 80% by mass or more of the polymerizable compound (A) is a monomer having an aromatic group.

5. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is a polymerizable compound having a trifluoromethyl group structure.

6. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is a polymerizable compound having two or more fluorine-containing groups in a molecule.

7. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is a polymerizable compound having a fluorine content of from 20 to 60% by mass.

8. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is a polymer having a fluorine atom and having a weight average molecular weight of from 2000 to 100000.

9. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is a monomer having a silicon atom.

10. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A2) having an aromatic group has a molecular weight of from 150 to 500.

11. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A2) having an aromatic group has a viscosity of from 2 to 300 mPa·s.

12. The curable composition for imprints according to claim 1 , wherein the polymerizable compound (A2) having an aromatic group is contained in an amount of 80% by mass or more in all the polymerizable compounds contained in the curable composition.

13. A patterning method comprising:
applying the curable composition for imprints according to claim 1 onto a substrate to form a patterning layer thereon,
pressing a mold against the surface of the patterning layer, and
irradiating the patterning layer with light.

14. A pattern formed according to the patterning method of claim 13 .

15. The curable composition for imprints according to claim 1 , wherein 50% by mass or more of the polymerizable compound (A) is a polyfunctional polymerizable compound having two or more polymerizable functional groups in the molecule.

16. A curable composition for imprints, comprising (A) a polymerizable compound and (B) a photopolymerization initiator, wherein:
the polymerizable compound (A) comprises (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom and (A2) a polymerizable compound having an aromatic group;
the polymerizable compound (A2) having an aromatic group is an acrylate or a methacrylate; and
the polymerizable compound (A1) having at least one of a fluorine atom and a silicon atom is represented by the following formula (III):

wherein R 1 represents a hydrogen atom, an alkyl group, a halogen atom or a cyano group; A represents an (a1+a2)-valent linking group; a1 indicates an integer of from 1 to 6; a2 indicates an integer of from 2 to 6; R 2 represents an alkylene group having from 1 to 8 carbon atoms; R 3 represents a linking group; Rf represents a fluoroalkyl group or a fluoroalkyl ether group; m1 indicates 0 or 1; m2 indicates 1; m3 indicates an integer of from 1 to 3; when a1 is 2 or more, each R 1 may be the same or different; when a2 is 2 or more, each R 2 , R 3 , m1, m2 and m3 may be the same or different; and when m3 is 2 or more, each Rf may be the same or different.

Assignees

• Kodama Kunihiko
• Fujifilm Corp

Inventors

• Kodama Kunihiko

Classifications

• C08F222/1006

  of polyhydric alcohols or polyhydric phenols · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• C08F220/22

  Esters containing halogen · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title