Antireflective laminate

Patent metadata

Field	Value
Publication number	US-9683108-B2
Application number	US-201514867319-A
Country	US
Kind code	B2
Filing date	Sep 28, 2015
Priority date	Aug 28, 2003
Publication date	Jun 20, 2017
Grant date	Jun 20, 2017

Abstract

There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

First claim

The invention claimed is:

1. A process for producing an antireflective laminate that includes a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on said light transparent base material, said process comprising:
(1) preparing a composition for the low refractive index layer that comprises an ionizing radiation curing resin composition and silica fine particles having an outer shell layer with the interior of said silica fine particles being porous or void,
(2) applying the composition on the light transparent base material to form a coating layer and drying the coating layer, and
(3) irradiating the coating layer with an ionizing radiation and/or heating the coating layer to form the low refractive index layer,
wherein said silica fine particles are obtained by the following steps (a) to (d):
(a) adding an aqueous sodium silicate solution and an aqueous sodium aluminate solution to a silica raw material to prepare colloid particles comprising a composite oxide,
(b) selectively removing at least a part of elements other than silicon and oxygen from the colloid particles of the composite oxide,
(c) adding a hydrolytic organosilicon compound or a silicic acid liquid to the colloid particles from which a part of the elements has been removed to prepare a composite oxide sol, and
(d) repeatedly carrying out a hydrothermal treatment of the composite oxide sol at temperatures of 50 to 300° C. to obtain silica fine particles having an Na 2 O content of 0.5-2 ppm and an ammonia content of 600-1000 ppm.

2. The process for producing an antireflective laminate according to claim 1 , wherein said silica fine particles have been subjected to surface treatment with 1 to 50% by weight, based on said silica fine particles, of said silane coupling agent.

3. The process for producing an antireflective laminate according to claim 1 , wherein said silica fine particles have an average diameter of 5 to 100 nm.

4. The process for producing an antireflective laminate according to claim 1 , wherein said outer shell layer in said silica fine particles has a thickness of 1/60 to ⅓ of the average particle diameter of said silica fine particles.

Assignees

• Dainippon Printing Co Ltd
• Jgc Catalysts & Chemicals Ltd

Inventors

• Mizuno Utako
• Nakajo Midori
• Shinohara Seiji
• Yoshihara Toshio
• Nishida Hiroyasu
• Muraguchi Ryo
• Hirai Masafumi

Classifications

• C08K3/36

  Silica · CPC title

• C08K7/26

  Silicon- containing compounds · CPC title

• C09D7/1216

  Chemistry & Metallurgy · mapped topic

• B05D3/06

  by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141}) · CPC title

• C09D7/1291

  Chemistry & Metallurgy · mapped topic