Method for layout design and structure with inter-layer vias

US9679840B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9679840-B2
Application numberUS-201414220751-A
CountryUS
Kind codeB2
Filing dateMar 20, 2014
Priority dateMar 20, 2014
Publication dateJun 13, 2017
Grant dateJun 13, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. The layout method can include placing a circuit cell and an inter-layer via together in a first device layer of the IC structure, and placing a metal pattern in a second device layer of the IC structure. The inter-layer via and the metal pattern may be configured to form a direct connection channel for the circuit cell and the metal pattern.

First claim

Opening claim text (preview).

What is claimed is: 1. A computer implemented layout method, the method comprising: bundling, for purposes of placement, a circuit cell and an inter-layer via together as an integral unit; placing the integral unit of the circuit cell and the inter-layer via in a first device layer of an integrated circuit (IC) design; and placing a metal pattern in a second device layer of the IC design, wherein the placing the integral unit of the circuit cell and the inter-layer via forms a direct electrical connection channel between the circuit cell and the metal pattern, and at least one of the above placing operations is performed using a layout generating machine. 2. The method of claim 1 , wherein the circuit cell includes at least one active component. 3. The method of claim 1 , wherein the circuit cell and the inter-layer via are placed in a location within the first device layer of the IC design, and wherein the location within the first device layer corresponds to a location within the second device layer. 4. The method of claim 3 , further comprising placing a power supply line in the first device layer to the circuit cell. 5. The method of claim 3 , wherein the first device layer is placed with a first power supply line and the second device layer is placed with a second power supply line. 6. The method of claim 1 , wherein the circuit cell includes a voltage level shifter. 7. The method of claim 1 , wherein the inter-layer via is configured to carry a power supply voltage, an analog signal or a logic signal. 8. The method of claim 1 , further comprising: placing a plurality of circuits in the IC design, at least one of the plurality of circuits being connected to the circuit cell; evaluating routing and timing violations of the IC design; and relocating the circuit cell and the metal pattern to meet a predetermined routing rule and timing goal. 9. The method of claim 1 , wherein the IC structure is a monolithic three dimensional IC (3DIC) structure. 10. A computer implemented layout method, the method comprising: bundling, for purposes of placement, a circuit cell and the inter-layer via together as an integral unit; placing the integral unit of the circuit cell and the inter-layer via in a first device layer of an integrated circuit (IC) design, the first device layer including at least one active component; placing a connection between the circuit cell and a power supply rail within the first device layer; and placing a metal pattern in a second device layer of the IC design, the second device layer including a second power supply voltage connection, wherein the placing the integral unit of the circuit cell and the inter-layer via and the metal pattern forms a direct electrical connection channel between the first device layer and the second device layer; evaluating routing and timing violations of the IC design; and relocating the circuit cell along with the metal pattern to meet a predetermined routing rule and timing goal, wherein at least one of the above placing operations is performed using a layout generating machine. 11. The method of claim 10 , wherein the circuit cell includes a voltage level shifter. 12. The method of claim 10 , wherein the inter-layer via is configured to carry a power supply voltage. 13. The method of claim 10 , wherein the inter-layer via is configured to carry an analog or a logic signal. 14. The method of claim 10 , further comprising: placing a plurality of circuits in the IC design, at least one of the plurality of circuits being connected to the circuit cell. 15. The method of claim 10 , further comprising bundling, as an integral unit for purposes of placement, the inter-layer via and the circuit cell, which includes the voltage level shifter; and wherein the placing a circuit cell and an inter-layer via places the integral unit of the inter-layer via and the circuit cell, which includes the voltage level shifter. 16. A three dimensional integrated circuit (3DIC) structure comprising: a circuit cell in a first device layer of the 3DIC structure, the circuit cell includes a voltage level shifter; a metal pattern in a second device layer of the 3DIC structure; and an inter-layer via connecting the voltage level shifter of the circuit cell in the first device layer at a predetermined location and connecting the metal pattern in the second device layer of the 3DIC structure, the predetermined location being within a cell boundary of the circuit cell in the first device layer of the 3DIC structure; wherein a footprint of the inter-layer via is at least one order of magnitude smaller than a footprint of the circuit cell. 17. The integrated circuit of claim 16 , wherein the predetermined location within the first device layer corresponds to a location within the second device layer. 18. The integrated circuit of claim 16 , wherein the inter-layer via is configured to carry a power supply voltage, an analog signal, or a logic signal. 19. The integrated circuit of claim 16 , wherein the inter-layer via is vertical or substantially vertical to the first device layer and the second device layer. 20. The integrated circuit of claim 16 , wherein: a footprint of the inter-layer via is two orders of magnitude smaller than a footprint of a through-silicon-via.

Assignees

Inventors

Classifications

  • Power or ground buses · CPC title

  • H10W20/42Primary

    Vias, e.g. via plugs · CPC title

  • Timing analysis or timing optimisation · CPC title

  • Routing (G06F30/396 takes precedence) · CPC title

  • Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] (optical proximity correction [OPC] design processes G03F1/36) · CPC title

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What does patent US9679840B2 cover?
A computer implemented layout method for an integrated circuit (IC) structure and IC structure are provided. The layout method can include placing a circuit cell and an inter-layer via together in a first device layer of the IC structure, and placing a metal pattern in a second device layer of the IC structure. The inter-layer via and the metal pattern may be configured to form a direct connect…
Who is the assignee on this patent?
Taiwan Semiconductor Mfg Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W20/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 13 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).