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US-12045007-B2 · Jul 23, 2024 · US
Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
US9678425B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9678425-B2 |
| Application number | US-201414246561-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 7, 2014 |
| Priority date | Dec 15, 2008 |
| Publication date | Jun 13, 2017 |
| Grant date | Jun 13, 2017 |
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- Title
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Abstract
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Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
First claim
Opening claim text (preview).
The invention claimed is: 1. A resist material, comprising: a fluoropolymer, wherein the fluoropolymer comprises: a repeating unit represented by the following general formula (5): where R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group, and a hydroxyl group represented by —OH and directly bonded to a ring, and a hexafluoroisopropyl hydroxyl group represented by —C(CF 3 ) 2 OH are adjacent to each other. 2. A resist material as claimed in claim 1 , further containing: at least one selected from the group consisting of an acid generator, a basic compound and an organic solvent. 3. A resist material as claimed in claim 2 , wherein the organic solvent is an alcohol-based solvent having 5 to 20 carbon atoms.
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Classifications
with acrylic or methacrylic acids · CPC title
containing no aromatic rings in the alcohol moiety · CPC title
Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title
in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title
containing perhaloalkyl radicals · CPC title
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- What does patent US9678425B2 cover?
- Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymeri…
- Who is the assignee on this patent?
- Central Glass Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C08F20/28. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jun 13 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).