Membrane design for reducing defects in electroplating systems

US9677190B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9677190-B2
Application numberUS-201414256770-A
CountryUS
Kind codeB2
Filing dateApr 18, 2014
Priority dateNov 1, 2013
Publication dateJun 13, 2017
Grant dateJun 13, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Certain embodiments disclosed herein pertain to methods and apparatus for electrodepositing material on a substrate. More particularly, a novel membrane for separating the anode from the cathode/substrate, and a method of using such a membrane are presented. The membrane includes at least an ion exchange layer and a charge separation layer. The disclosed embodiments are beneficial for maintaining relatively constant concentrations of species in the electrolyte over time, especially during idle (i.e., non-electroplating) times.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for electroplating material onto a substrate, comprising: a reaction vessel comprising a cathode chamber and an anode chamber, the cathode chamber configured to hold catholyte during electroplating and the anode chamber configured to hold anolyte and an anode during electroplating; a membrane in the reaction vessel separating the cathode chamber from the anode chamber, the membrane comprising an ion exchange layer and a charge separation layer, wherein the charge separation layer is at least about 150 μm thick, and wherein the membrane has a molecular weight cut off between about 200-1500 Da; and a substrate support mechanism for supporting the substrate in the reaction vessel such that the substrate is exposed to the catholyte in the cathode chamber during electroplating. 2. The apparatus of claim 1 , wherein the charge separation layer is between about 150-1000 μm thick. 3. The apparatus of claim 1 , wherein the charge separation layer has a molecular weight cutoff between about 200-1000 Da. 4. The apparatus of claim 1 , wherein the charge separation layer has an average pore diameter of about 1 nm or less. 5. The apparatus of claim 1 , wherein the charge separation layer comprises one or more of the materials from the group consisting of: polysulfone, polyethersulfone, polyetheretherketone, cellulose acetate, cellulose ester, polyacrylonitrile, polyvinylidene fluoride, polyimide, polyetherimide, aliphatic polyamide, polyethylene, polypropylene, polytetrafluoroethylene, and silicone. 6. The apparatus of claim 1 , wherein the charge separation layer is stable in acidic electrolyte. 7. The apparatus of claim 1 , wherein the charge separation layer comprises a nanofiltration material. 8. The apparatus of claim 7 , wherein the charge separation layer comprises MPF-34. 9. The apparatus of claim 1 , wherein the ion exchange layer is between about 10-100 μm thick. 10. The apparatus of claim 1 , wherein the charge separation layer faces the cathode chamber and the ion exchange layer faces the anode chamber. 11. The apparatus of claim 1 , the membrane further comprising a second charge separation layer, wherein the charge separation layer contacts a first side of the ion exchange layer and wherein the second charge separation layer contacts a second side of the ion exchange layer, such that the membrane has a sandwich structure. 12. A method of electroplating material onto a substrate, comprising: providing a substrate in a reaction vessel comprising a cathode chamber, an anode chamber, and a membrane separating the cathode chamber from the anode chamber, wherein the membrane comprises an ion exchange layer and a charge separation layer, wherein the charge separation layer is at least about 150 μm thick, and has a molecular weight cutoff between about 200-1500 Da, and wherein the substrate contacts catholyte in the cathode chamber; and electroplating material onto the substrate. 13. The method of claim 12 , wherein the ion exchange layer comprises pores having an average diameter, the surface of the pores comprising positively or negatively charged groups, and wherein at least one of the anolyte and catholyte comprises an adsorbing species having a charge that is opposite the charge of the charged groups in the pores, the adsorbing species having an average molecular diameter between about 50-150% of the average diameter of the pores. 14. The method of claim 13 , wherein the adsorbing species comprises a leveler. 15. The method of claim 14 , wherein the leveler comprises polyvinylpyrrolidone and the charged groups on the surface of the pores comprise SO 3 − . 16. The method of claim 15 , wherein the charge separation layer faces the cathode chamber, and wherein the ion exchange layer faces the anode chamber. 17. The method of claim 12 , further comprising repeating the method to electroplate material onto a plurality of substrates, wherein there is an idle period between electroplating sub sequent substrates. 18. The method of claim 17 , wherein a voltage profile during electroplating is substantially uniform between subsequent substrates. 19. The method of claim 17 , wherein the idle period between electroplating subsequent substrates is at least about 6 hours, and wherein a resistance of the membrane does not increase by more than about 25% during the idle period. 20. The method of claim 17 , wherein the ion exchange layer comprises pores comprising charged groups, wherein at least one of the anolyte and catholyte comprises an adsorbing species having a charge that is opposite the charge of the charged groups in the pores, wherein the idle period between electroplating subsequent substrates is at least about 1 hour, and wherein a concentration of adsorbing species in the anolyte or catholyte does not decrease by more than about 8% during the idle period. 21. A method of idling an electrodeposition apparatus, comprising: idling an electrodeposition apparatus comprising: a reaction vessel comprising a cathode chamber, an anode chamber, and a membrane separating the cathode chamber from the anode chamber, wherein the membrane comprises an ion exchange layer and a charge separation layer, the charge separation layer having a thickness of at least about 150 μm and a molecular weight cutoff between about 200-1500 Da, and wherein the cathode chamber comprises catholyte and the anode chamber comprises anolyte. 22. The method of claim 21 , wherein the ion exchange layer comprises pores having an average diameter, the surface of the pores comprising positively or negatively charged groups, and wherein at least one of the anolyte and catholyte comprises an adsorbing species having a charge that is opposite the charge of the charged groups in the pores, the adsorbing species having an average molecular diameter between about 50-150% of the average diameter of the pores. 23. The method of claim 21 , wherein after idling for a period of at least about 6 hours, a resistance of the membrane does not increase by more than about 25%.

Assignees

Inventors

Classifications

  • C25D17/002Primary

    Cell separation, e.g. membranes, diaphragms · CPC title

  • Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

  • Semiconductors first coated with a seed layer or a conductive layer · CPC title

  • by ion-exchange · CPC title

  • Supporting} racks {, i.e. not for suspending · CPC title

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What does patent US9677190B2 cover?
Certain embodiments disclosed herein pertain to methods and apparatus for electrodepositing material on a substrate. More particularly, a novel membrane for separating the anode from the cathode/substrate, and a method of using such a membrane are presented. The membrane includes at least an ion exchange layer and a charge separation layer. The disclosed embodiments are beneficial for maintaini…
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/002. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 13 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).