Silver-containing film and method for producing same
US-2024279816-A1 · Aug 22, 2024 · US
US9673547B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9673547-B2 |
| Application number | US-201314395906-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 9, 2013 |
| Priority date | May 11, 2012 |
| Publication date | Jun 6, 2017 |
| Grant date | Jun 6, 2017 |
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The present invention aims to provide a plated terminal for connector which requires a smaller insertion force by reducing a friction coefficient and a terminal pair formed using such a plated terminal for connector. An alloy containing layer ( 1 ) made of tin and palladium and containing a tin-palladium alloy is formed on a surface of a terminal base material ( 2 ) made of copper or copper alloy. Here, the alloy containing layer ( 1 ) is preferably such that domain structures of a first metal phase ( 11 ) made of an alloy of tin and palladium are formed in a second metal phase ( 12 ) made of pure tin or an alloy having a higher ratio of tin to palladium than in the first metal phase ( 11 ).
Opening claim text (preview).
The invention claimed is: 1. A plated terminal for connector, comprising: a base material made of copper or a copper alloy; and an alloy containing layer carried on a surface of the base material, the alloy containing layer comprising a first metal phase made of an alloy of tin and palladium in a second metal phase made of pure tin or an alloy having a higher ratio of tin to palladium than in the first metal phase, the first metal phase and the second metal phase exposed on a surface of the alloy containing layer, and including an exposed surface ratio of the first metal phase to the second metal phase of 10% to 80%. 2. The plated terminal for connector of claim 1 , wherein a content of palladium in the alloy containing layer is not lower than 1 atom %. 3. The plated terminal for connector of claim 2 , wherein the content of palladium in the alloy containing layer is below 20 atom %. 4. The plated terminal for connector of claim 1 , wherein the glossiness of the surface is in a range of 10 to 300%. 5. The plated terminal for connector of claim 1 , wherein a thickness of the alloy containing layer is not smaller than 0.8 μm. 6. The plated terminal for connector of claim 1 , wherein a dynamic friction coefficient when surfaces of the alloy containing layers are rubbed against each other is not higher than 0.4. 7. The plated terminal for connector of claim 1 , wherein a Vickers hardness of the alloy containing layer is not lower than 100. 8. The plated terminal for connector of claim 1 , wherein a domain of the first metal phase having a dimension shorter than the longest one of straight lines crossing a contact portion to be brought into electrical contact with another electrically conductive member is exposed on a surface of the contact portion. 9. The plated terminal for connector of claim 1 , wherein the contact portion is in the form of an emboss. 10. The plated terminal for connector of claim 1 , wherein a radius of the emboss is not smaller than 3 mm. 11. A terminal pair, comprising a male connector terminal and a female connector terminal, wherein at least one of the male and female connector terminals is formed by a plated terminal for connector of claim 1 . 12. The terminal pair of claim 11 , wherein a contact load applied to a contact portion where the male and female connector terminals come into contact with each other is not lower than 2 N. 13. The terminal pair of claim 12 , wherein the contact load is not lower than 5 N. 14. The plated terminal for connector of claim 1 , wherein a content of palladium in the alloy containing layer is between 1 atom % and 7 atom %. 15. A plated terminal for connector, comprising: a base material carrying an alloy containing layer, the alloy containing layer comprising a first metal phase made of an alloy of tin and palladium in a second metal phase made of pure tin or an alloy having a higher ratio of tin to palladium than in the first metal phase, the alloy containing layer including a surface composition that includes an exposed surface ratio of the first metal phase to the second metal phase of 10% to 80%. 16. The plated terminal of claim 15 , wherein the base material comprises a layer of copper or a copper alloy. 17. The plated terminal of claim 16 , wherein the base material comprises a surface layer of nickel. 18. The plated terminal of claim 15 , wherein the alloy containing layer includes a nickel tin alloy layer adjacent to the base material. 19. The plated terminal of claim 15 , wherein a content of palladium in the alloy containing layer is between 1 atom % and 7 atom %.
at least one layer being of nickel or chromium · CPC title
Electroplating characterised by the article coated · CPC title
containing more than 50% by weight of tin · CPC title
characterised by the material, e.g. plating, or coating materials · CPC title
Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance · CPC title
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