Epoxy resin composition for encapsulating semiconductor device and semiconductor package encapsulated using the same

US9673120B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9673120-B2
Application numberUS-201514706663-A
CountryUS
Kind codeB2
Filing dateMay 7, 2015
Priority dateSep 25, 2014
Publication dateJun 6, 2017
Grant dateJun 6, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An epoxy resin composition for encapsulating a semiconductor device and a semiconductor package, the composition including an epoxy resin; a polyorganosiloxane resin represented by Formula 3, below; a curing agent; a curing accelerator; and an inorganic filler:

First claim

Opening claim text (preview).

What is claimed is: 1. An epoxy resin composition for encapsulating a semiconductor device, the composition comprising: an epoxy resin; a polyorganosiloxane resin represented by Formula 4, below; a curing agent; a curing accelerator; and an inorganic filler, wherein: R 1 and R 2 each independently include a substituted or unsubstituted C 1 to C 10 alkyl group, a substituted or unsubstituted C 3 to C 20 cycloalkyl group, a substituted or unsubstituted C 6 to C 20 aryl group, a substituted or unsubstituted C 7 to C 20 arylalkyl group, a substituted or unsubstituted C 1 to C 20 heteroalkyl group, a substituted or unsubstituted C 2 to C 20 heterocycloalkyl group, a substituted or unsubstituted C 2 to C 20 alkenyl group, a substituted or unsubstituted C 2 to C 20 alkynyl group, a substituted or unsubstituted C 1 to C 10 alkoxy group, an epoxy-substituted organic group, or a hydroxyl-substituted organic group; n is 0 to about 100 on average, and the polyorganosiloxane resin is present in the composition in an amount of about 0.1 wt % to about 1.0 wt %, based on a total weight of the composition. 2. The epoxy resin composition as claimed in claim 1 , wherein, in Formula 4, at least one R 2 is an epoxy-substituted organic group. 3. The epoxy resin composition as claimed in claim 1 , wherein the composition includes: about 3 wt % to about 15 wt % of the epoxy resin; the about 0.1 wt % to about 1.0 wt % of the polyorganosiloxane resin; about 2 wt % to about 10 wt % of the curing agent; about 0.01 wt % to about 1.0 wt % of the curing accelerator; and about 82 wt % to about 92 wt % of the inorganic filler, all wt % being based on the total weight of the composition. 4. The epoxy resin composition as claimed in claim 1 , wherein the epoxy resin includes at least one of an ortho-cresol novolac epoxy resin represented by Formula 1 or a phenolaralkyl epoxy resin represented by Formula 2: wherein, in Formula 1, R is a C 1 to C 4 alkyl group and n is 0 to about 7 on average, wherein, in Formula 2, n is about 1 to about 7 on average. 5. The epoxy resin composition as claimed in claim 1 , wherein the curing agent includes a phenolaralkyl type phenol resin, a xylok type phenol resin, a phenol novolac type phenol resin, a cresol novolac type phenol resin, a naphthol type phenol resin, a terpene type phenol resin, a polyfunctional phenol resin, a polyaromatic phenol resin, a dicyclopentadiene phenol resin, a terpene modified phenol resin, a dicyclopentadiene modified phenol resin, a novolac type phenol resin prepared from bisphenol A and resol, a multivalent phenol compound, an acid anhydride, metaphenylenediamine, diaminodiphenylmethane, or diaminodiphenylsulfone. 6. The epoxy resin composition as claimed in claim 1 , wherein the curing accelerator includes a tertiary amine, an organometallic compound, an organophosphorus compound, an imidazole compound, or a boron-containing compound. 7. The epoxy resin composition as claimed in claim 1 , wherein the inorganic filler includes fused silica, crystalline silica, calcium carbonate, magnesium carbonate, alumina, magnesia, clay, talc, calcium silicate, titanium oxide, antimony oxide, or glass fiber. 8. The epoxy resin composition as claimed in claim 1 , wherein the inorganic filler includes fused spherical silica having an average particle diameter of about 0.001 μm to about 30 μm. 9. A semiconductor package, comprising: a substrate; a semiconductor device mounted on the substrate; a connecting portion electrically connecting the semiconductor device and the substrate; and a molding portion encapsulating the semiconductor device and the connecting portion, wherein the molding portion is prepared from the epoxy resin composition for encapsulating a semiconductor device as claimed claim 1 . 10. The semiconductor package as claimed in claim 9 , wherein the semiconductor device is mounted on the substrate via a die adhesive film, the die adhesive film being a silicon-based adhesive.

Assignees

Inventors

Classifications

  • Encapsulations, e.g. protective coatings · CPC title

  • characterised by their materials · CPC title

  • comprising holes not having chips therein, e.g. for outgassing, underfilling or bond wire passage · CPC title

  • of bond wires · CPC title

  • of die-attach connectors · CPC title

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Frequently asked questions

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What does patent US9673120B2 cover?
An epoxy resin composition for encapsulating a semiconductor device and a semiconductor package, the composition including an epoxy resin; a polyorganosiloxane resin represented by Formula 3, below; a curing agent; a curing accelerator; and an inorganic filler:
Who is the assignee on this patent?
Samsung Sdi Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W74/476. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).