Base film and pressure-sensitive adhesive sheet provided therewith

US9670382B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9670382-B2
Application numberUS-201214005577-A
CountryUS
Kind codeB2
Filing dateMar 22, 2012
Priority dateMar 22, 2011
Publication dateJun 6, 2017
Grant dateJun 6, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The base film of the invention is a base film of a pressure-sensitive adhesive sheet for laminating onto a semiconductor wafer composed of: (A) a layer of a cured product in which a composition including a polyether polyol urethan(meth)acrylate oligomer and an energy ray curable monomer is cured by energy ray irradiation, and (B) a thermoplastic resin layer. The present invention, by using a surface protection sheet, protects a circuit side of a wafer with bumps, prevents collapse of bumps on the circuit side when grinding the back surface, and prevents generation of dimples or cracks on the grinding surface.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pressure-sensitive adhesive sheet for laminating onto a semiconductor wafer, comprising: a pressure-sensitive adhesive layer (C) on a base film, said base film comprising (A) a layer of a cured product in which a composition including a polyether polyol urethane (meth)acrylate oligomer and an energy ray curable monomer is cured by energy ray irradiation, and (B) a thermoplastic resin layer, wherein a molecular weight of a polyether polyol moiety of the polyether polyol urethan(meth)acrylate oligomer is 1,000 to 10,000, wherein a compression stress at 23° C. of the pressure-sensitive adhesive sheet is 0.05 to 0.3 MPa, and wherein said pressure-sensitive adhesive layer (C) is formed on said layer (A), and wherein a weight-average molecular weight of the polyether polyol urethane (meth)acrylate oligomer is 40,000 to 100,000. 2. The pressure-sensitive adhesive sheet according to claim 1 , wherein the pressure-sensitive adhesive layer (C) is re-releasable to the semiconductor wafer. 3. In combination: the pressure-sensitive adhesive sheet according to claim 1 , and a semiconductor wafer, wherein the pressure-sensitive adhesive layer (C) is laminated onto and is re-releasable to the semiconductor wafer.

Assignees

Inventors

Classifications

  • used to protect an active side of a device or wafer · CPC title

  • used during dicing or grinding · CPC title

  • Wafer tapes, e.g. grinding or dicing support tapes · CPC title

  • using UV radiation · CPC title

  • C09J7/0296Primary

    Chemistry & Metallurgy · mapped topic

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Frequently asked questions

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What does patent US9670382B2 cover?
The base film of the invention is a base film of a pressure-sensitive adhesive sheet for laminating onto a semiconductor wafer composed of: (A) a layer of a cured product in which a composition including a polyether polyol urethan(meth)acrylate oligomer and an energy ray curable monomer is cured by energy ray irradiation, and (B) a thermoplastic resin layer. The present invention, by using a su…
Who is the assignee on this patent?
Tamura Kazuyuki, Akutsu Takashi, Eto Yuki, and 3 more
What technology area does this patent fall under?
Primary CPC classification C09J7/0296. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).