Method for producing meta-xylylenediisocyanates

US9670148B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9670148-B2
Application numberUS-201414903268-A
CountryUS
Kind codeB2
Filing dateAug 11, 2014
Priority dateAug 23, 2013
Publication dateJun 6, 2017
Grant dateJun 6, 2017

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Abstract

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A method for producing meta-xylylenediisocyanates includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound represented by general formula (1) below are allowed to react in the presence of an acidic liquid to produce a bisamide compound; a dehalogenation step in which in the bisamide compound, the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom; and a thermal decomposition step in which the bisamide compound from which the halogen atom is eliminated is subjected to thermal decomposition. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 14, the acidic liquid has an inorganic acid concentration of more than 90 mass %, and the reaction temperature is more than 10° C. General formula (1): wherein R 1 represents an alkoxy group or an amino group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing meta-xylylenediisocyanate, comprising: reacting monohalogenated benzene, formaldehydes, and an amide compound represented by formula (1) below in the presence of an acidic liquid to produce a bisamide compound, dehalogenating the bisamide compound wherein a halogen atom derived from the monohalogenated benzene is replaced with a hydrogen atom, and thermally decomposing the bisamide compound from which the halogen atom is eliminated, wherein in the reacting of the monohalogenated benzene, formaldehydes, and the amide compound, the acidic liquid contains inorganic acid, an equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzene is more than 14, the acidic liquid has an inorganic acid concentration of more than 90 mass %, and a reaction temperature is more than 10° C.: formula (1): wherein R 1 represents an alkoxy group or an amino group. 2. The method for producing meta-xylylenediisocyanate according to claim 1 , wherein R 1 in formula (1) is an n-butoxy group. 3. The method for producing meta-xylylenediisocyanate according to claim 1 , wherein R 1 in formula (1) is a diisobutyl amino group. 4. The method for producing meta-xylylenediisocyanate according to claim 1 , wherein the inorganic acid is sulfuric acid or phosphoric acid. 5. The method for producing meta-xylylenediisocyanate according to claim 1 , wherein the monohalogenated benzene is monochlorobenzene. 6. The method for producing meta-xylylenediisocyanate according to claim 1 , wherein the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzene is 16 or more, the acidic liquid has an inorganic acid concentration of 95 mass % or more, and the reaction temperature is 20° C. or more.

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Classifications

  • by reduction of nitriles · CPC title

  • Preparation of derivatives of carbamic acid, i.e. compounds containing any of the groups [IMAGE cpc-sch-C07C-0964.gif], the nitrogen atom not being part of nitro or nitroso groups · CPC title

  • from or via carbamates or carbamoyl halides · CPC title

  • C07C263/06Primary

    from or via ureas · CPC title

  • to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups · CPC title

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What does patent US9670148B2 cover?
A method for producing meta-xylylenediisocyanates includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound represented by general formula (1) below are allowed to react in the presence of an acidic liquid to produce a bisamide compound; a dehalogenation step in which in the bisamide compound, the halogen atom derived from the monohalogenated benzenes is r…
Who is the assignee on this patent?
Mitsui Chemicals Inc
What technology area does this patent fall under?
Primary CPC classification C07C263/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).