Copper alloy wire, copper alloy stranded wire, covered electric wire, and terminal-fitted electric wire
US-2015371726-A1 · Dec 24, 2015 · US
US9666325B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9666325-B2 |
| Application number | US-201214008910-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 29, 2012 |
| Priority date | Mar 31, 2011 |
| Publication date | May 30, 2017 |
| Grant date | May 30, 2017 |
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Disclosed is a beryllium-free copper alloy having high strength, high electric conductivity and good bending workability and a method of manufacturing the copper alloy. Provided is a copper alloy having a composition represented by the composition formula by atom %: Cu100-a-b-c(Zr, Hf)a(Cr, Ni, Mn, Ta)b(Ti, Al)c [wherein 2.5≦a≦4.0, 0.1<b≦1.5 and 0≦c≦0.2; (Zr, Hf) means one or both of Zr and Hf; (Cr, Ni, Mn, Ta) means one or more of Cr, Ni, Mn and Ta; and (Ti, Al) means one or both of Ti and Al], and having Cu primary phases in which the mean secondary dendrite arm spacing is 2 μm or less and eutectic matrices in which the lamellar spacing between a metastable Cu5(Zr, Hf) compound phase and a Cu phase is 0.2 μm or less.
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The invention claimed is: 1. A copper alloy having a composition represented by the composition formula by atom %: Cu 100-a-b-c (Zr, Hf) a (Cr, Ni, Mn, Ta) b (Ti, Al) c [wherein, 2.5≦a≦4.0, 0.1<b≦1.5 and 0≦c≦0.2; (Zr, Hf) means one or both of Zr and Hf; (Cr, Ni, Mn, Ta) means one or more of Cr, Ni, Mn and Ta; and (Ti, Al) means one or both of Ti and Al], and having Cu primary phases in which the mean secondary dendrite arm spacing is 2 μm or less and eutectic matrices in which the lamellar spacing between a metastable Cu 5 (Zr, Hf) compound phase and a Cu phase is 0.2 μm or less. 2. The copper alloy according to claim 1 , wherein the Cu primary phases and the eutectic matrices are layered by cold working. 3. The copper alloy according to claim 2 , wherein the cold working is rolling, and by performing aging heat treatment after the cold working, tensile strength is 1000 MPa or more, and electric conductivity is 30% IACS or more, and the ratio R min /t is 1 or less wherein t represents a plate thickness and R min , represent a minimum bending radius without causing a crack when performing bending work in the direction of the plate thickness and in the direction orthogonal to the rolling direction after aging heat treatment. 4. The method of manufacturing the copper alloy recited in claim 1 , the method comprising: dissolving a master alloy prepared by formulating each element to give a composition represented by the composition formula by atom %: Cu 100-a-b-c (Zr, Hf) a (Cr, Ni, Mn, Ta) b (Ti, Al) c [wherein 2.5≦a≦4.0, 0.1<b≦1.5 and 0≦c≦0.2; (Zr, Hf) means one or both of Zr and Hf; (Cr, Ni, Mn, Ta) means one or more of Cr, Ni, Mn and Ta; and (Ti, Al) means one or both of Ti and Al]; and then rapidly solidifying the master alloy. 5. The method of manufacturing a copper alloy according to claim 4 , comprising: performing cold working with a processing rate of between 81% and 99.5% inclusive to form a structure in which the Cu primary phases having a mean secondary dendrite arm spacing of 2 μm or less and the eutectic matrices having a lamellar spacing of 0.2 μm or less between the metastable Cu 5 (Zr,Hf) compound phase and the Cu phase are layered after the rapid solidification. 6. The method of manufacturing a copper alloy according to claim 5 , comprising: performing aging heat treatment at a temperature ranging from 300 to 450° C. for 0.5 to 2 hours after performing the cold working.
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