Semiconductor devices and methods of manufacturing the same

Patent metadata

Field	Value
Publication number	US-9659772-B2
Application number	US-201514974119-A
Country	US
Kind code	B2
Filing date	Dec 18, 2015
Priority date	Jan 5, 2015
Publication date	May 23, 2017
Grant date	May 23, 2017

Abstract

Semiconductor devices and methods of manufacturing the semiconductor devices are provided. The semiconductor devices may include a first line pattern that includes a first main line having a first width and a first subline having a second width, and a second line pattern that includes a second main line having the first width and a second subline having a third width. The first line pattern may include a first width changer whose width increases from the first width to the second width. The second line pattern may include a second width changer whose width increases from the first width to the third width.

First claim

What is claimed is:

1. A semiconductor device comprising:
a first line pattern comprising a first main line that extends in a first direction and has a first width and a first subline that extends in a second direction from one end of the first main line and has a second width that is greater than the first width; and
a second line pattern comprising a second main line that is parallel to the first main line and has the first width and a second subline that extends parallel to the first subline from one end of the second main line and has a third width that is greater than the first width,
wherein the first line pattern comprises a first width changer that is disposed between the first main line and the first subline and whose width increases from the first width to the second width, and the second line pattern comprises a second width changer that is included in the second main line and whose width increases from the first width to the third width in a longitudinal direction of the second main line.

2. The semiconductor device of claim 1 , wherein the second width and the third width are substantially equal.

3. The semiconductor device of claim 1 , wherein the first width changer and the second width changer face each other.

4. The semiconductor device of claim 1 , wherein the second main line comprises a first line portion and a second line portion that are spaced apart from each other with the second width changer therebetween, and the first line portion has the first width and the second line portion has the third width.

5. The semiconductor device of claim 4 , wherein the second subline extends from one end of the second line portion in the second direction.

6. The semiconductor device of claim 1 , wherein a shortest distance between the first main line and the second main line is smaller than a shortest distance between the first subline and the second subline.

7. The semiconductor device of claim 1 , wherein the first line pattern further comprises a first dummy line that extends from one end of the first subline in the first direction away from the first main line and has the second width, and
the second line pattern further comprises a second dummy line that extends from one end of the second subline in the first direction toward the first dummy line and has the third width.

8. The semiconductor device of claim 1 , further comprising a third line pattern that extends parallel to the second line pattern and comprises a third main line that is parallel to the second main line and has the first width and a third subline that is parallel to the second subline and has a fourth width that is greater than the first width, wherein the second line pattern is between the third line pattern and the first line pattern, and
wherein a shortest distance between the second main line and the third main line and a shortest distance between the second subline and the third subline are substantially equal.

9. The semiconductor device of claim 8 , wherein the third line pattern comprises a third width changer that is disposed between the third main line and the third subline and whose width increases from the first width to the fourth width.

10. A semiconductor device comprising:
a plurality of line patterns that are spaced apart from one another,
wherein each of the plurality of line patterns comprises a main line that extends in a first direction and a subline that extends in a second direction from one end of the main line,
wherein the plurality of line patterns comprise a plurality of sets of line patterns, and each of the plurality of sets of line patterns comprises four line patterns of the plurality of line patterns that are disposed directly adjacent one another,
wherein at least one set of the plurality of sets of line patterns comprises:
a first line pattern comprising a first main line that extends in the first direction and has a first width and a first subline that extends in the second direction from one end of the first main line and has a second width that is greater than the first width; and
a second line pattern comprising a second main line that is parallel to the first main line and has the first width and a second subline that is parallel to the first subline and has a third width that is greater than the first width,
wherein the first line pattern comprises a first width changer that is disposed between the first main line and the first subline and whose width increases from the first width to the second width, and the second line pattern comprises a second width changer that is included in the second main line and whose width increases from the first width to the third width in a longitudinal direction of the second main line.

11. The semiconductor device of claim 10 , wherein the at least one set of the plurality of sets of line patterns further comprises:
a third line pattern that extends parallel to the second line pattern and comprises a third main line that is parallel to the second main line and has the first width and a third subline that is parallel to the second subline and has a fourth width that is greater than the first width, wherein the second line pattern is between the third line pattern and the first line pattern; and
a fourth line pattern that extends parallel to the first line pattern and comprises a fourth main line that is parallel to the first main line and has the first width and a fourth subline that is parallel to the first subline and has a fifth width that is greater than the first width, wherein the first line pattern is between the fourth line pattern and the second line pattern.

12. The semiconductor device of claim 11 , wherein the third line pattern comprises a third width changer that is disposed between the third main line and the third subline and whose width increases from the first width to the fourth width, and
the fourth main line comprises a fourth width changer that is included in the fourth main line and whose width increases from the first width to the fifth width in a longitudinal direction of the fourth main line.

13. The semiconductor device of claim 10 , wherein the at least one set of the plurality of sets of line patterns further comprises:
a third line pattern that extends parallel to the second line pattern and comprises a third main line that is parallel to the second main line and has the first width and a third subline that is parallel to the second subline and has a fourth width that is greater than the first width, wherein the second line pattern is between the third line pattern and the first line pattern; and
a fourth line pattern that extends parallel to the first line pattern and comprises a fourth main line that is parallel to the first main line and has a fifth width that is greater than the first width and a fourth subline that is parallel to the first subline and has a sixth width that is greater than the first width, wherein the first line pattern is between the fourth line pattern and the second line pattern.

14. The semiconductor device of claim 13 , wherein the third line pattern comprises a third width changer that is disposed between the third main line and the third subline and whose width increases from the first width to the fourth width, and
wherein the fifth width and the sixth width are substantially equal.

15. A semiconductor device comprising:
a first line pattern comprising a first portion extending in a first direction and a second portion extending in a second direction that is different from the first direction, the first portion having a first width and the second portion having a second width that is greater t

Assignees

• Seong Ho-Jun
• Han Jee-Hoon
• Samsung Electronics Co Ltd

Inventors

• Seong Ho-Jun
• Han Jee-Hoon

Classifications

• H10P76/4085 Primary

  characterised by the processes involved to create the masks · CPC title

• H10P50/695

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P50/71

  using masks for conductive or resistive materials · CPC title

• H10P76/4088 Primary

  Processes for improving the resolution of the masks · CPC title