Composition and method for forming conductive pattern, and resin structure having conductive pattern thereon

US9659682B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9659682-B2
Application numberUS-201414916100-A
CountryUS
Kind codeB2
Filing dateNov 28, 2014
Priority dateNov 29, 2013
Publication dateMay 23, 2017
Grant dateMay 23, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a composition for forming a conductive pattern capable of forming a fine conductive pattern on a variety of polymer resin products or resin layers by a significantly simple process, a method for forming a conductive pattern using the same, and a resin structure having a conductive pattern. The composition for forming a conductive pattern includes: a polymer resin; and a non-conductive metal compound including at least one of first and second metals as a predetermined non-conductive metal compound including the first and second metals, wherein a metal core including the first or second metal, or an ion thereof is formed from the non-conductive metal compound by electromagnetic irradiation.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition for forming a conductive pattern by electromagnetic irradiation, the composition comprising: a polymer resin; and a non-conductive metal compound of Chemical Formula 1 including a first metal and a second metal, wherein a metal core including the first metal, the second metal, or an ion thereof is formed from the non-conductive metal compound by electromagnetic irradiation: A 3−x B 3+x C 8   [Chemical Formula 1] in Chemical Formula 1, A and B are each independently the first and second metals different from each other, C is oxygen, nitrogen, or sulfur, and x satisfies 0≦x≦0.6. 2. The composition of claim 1 , wherein A is one or more metals selected from the group consisting of Cu, Ag, Pd, Au, Pt, Ni, and Sn, and B is one or more metals selected from the group consisting of Mn, Al, Cr, Fe, Mo, and W. 3. The composition of claim 1 , wherein the non-conductive metal compound has an average particle size of 1 μm or less. 4. The composition of claim 1 , wherein the polymer resin includes a thermosetting resin or a thermoplastic resin. 5. The composition of claim 4 , wherein the polymer resin includes one or more selected from the group consisting of an ABS resin, a polyalkylene terephthalate resin, a polycarbonate resin, a polypropylene resin, and a polyphthalamide resin. 6. The composition of claim 1 , wherein the non-conductive metal compound is included in an amount of 1 to 10 wt %, with respect to the total composition. 7. The composition of claim 1 , further comprising a coloring additive; and one or more additives selected from the group consisting of an inorganic filler, a flame retardant, an impact modifier, a heat stabilizer, a UV stabilizer, a lubricant, and an antioxidant. 8. The composition of claim 7 , wherein the coloring additive includes one or more selected from the group consisting of carbon black, graphite, graphene, clay, talc, TiO 2 , ZrO 2 , Fe 2 O 3 , BaSO 4 , CaCO 3 , SiO 2 , ZnS, ZnO, ZnCrO 4 , Cr 2 O 3 , CoO.nAl 2 O 3 , Co 3 (PO 4 ) 2 , copper phthalocyanine, and quinacridone. 9. The composition of claim 7 , wherein the flame retardant includes a phosphorus based flame retardant and an inorganic flame retardant. 10. A method for forming a conductive pattern by direct electromagnetic irradiation, the method comprising: molding the composition of claim 1 to a resin product or applying the composition to another product so as to form a resin layer; irradiating an electromagnetic wave to a predetermined region of the resin product or the resin layer so as to generate a metal core including a first or second metal or an ion thereof from a non-conductive metal compound; and chemically reducing or plating the region in which the metal core is generated so as to form a conductive metal layer. 11. The method of claim 10 , wherein in the generating of the metal core, a laser electromagnetic wave is irradiated. 12. The method of claim 11 , wherein the laser electromagnetic wave has a wavelength of 200 nm to 11000 nm. 13. The method of claim 10 , wherein in the generating of the metal core, the non-conductive metal compound is partially exposed on a surface of the predetermined region of the resin product or the resin layer to thereby generate the metal core therefrom, and an adhesion-activated surface activated so as to have higher adhesion is formed. 14. The method of claim 13 , wherein the conductive metal layer is formed on the adhesion-activated surface by chemical reduction of the first or second metal ion included in the metal core or electroless plating thereof. 15. The method of claim 10 , wherein in the reducing or plating, the region on which the metal core is generated is treated with an acidic or basic solution including a reducing agent. 16. The method of claim 15 , wherein the reducing agent is one or more selected from the group consisting of formaldehyde, hypophosphite, dimethylamino borane (DMAB), diethylamino borane (DEAB), and hydrazine. 17. A resin structure having a conductive pattern, the resin structure comprising: a polymer resin substrate; a non-conductive metal compound of Chemical Formula 1 including a first metal and a second metal and dispersed in the polymer resin substrate; an adhesion-activated surface including a metal core including the first or second metal or an ion thereof exposed on a surface of a predetermined region of the polymer resin substrate; and a conductive metal layer formed on the adhesion-activated surface: A 3−x B 3+x C 8   [Chemical Formula 1] in Chemical Formula 1, A and B are each independently the first and second metals different from each other, C is oxygen, nitrogen, or sulfur, and x satisfies 0≦x≦0.6. 18. The resin structure of claim 17 , wherein a predetermined region on which the adhesion-activated surface and the conductive metal layer are formed corresponds to a region of the polymer resin substrate to which an electromagnetic wave is irradiated.

Assignees

Inventors

Classifications

  • Photodevelopable thick film, e.g. conductive or insulating paste · CPC title

  • by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam · CPC title

  • of copper · CPC title

  • for polymer thick films, i.e. having a permanent organic polymeric binder · CPC title

  • by photographic methods · CPC title

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What does patent US9659682B2 cover?
The present invention relates to a composition for forming a conductive pattern capable of forming a fine conductive pattern on a variety of polymer resin products or resin layers by a significantly simple process, a method for forming a conductive pattern using the same, and a resin structure having a conductive pattern. The composition for forming a conductive pattern includes: a polymer resi…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification H01B1/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 23 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).