Resist composition, method of forming resist pattern, polymeric compound and compound
US-9017924-B2 · Apr 28, 2015 · US
US9657115B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9657115-B2 |
| Application number | US-201414564167-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 9, 2014 |
| Priority date | Dec 20, 2013 |
| Publication date | May 23, 2017 |
| Grant date | May 23, 2017 |
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A polymer compound for a conductive polymer including one or more repeating units represented by general formula (1), which has been synthesized by ion-exchange of a lithium salt, sodium salt, potassium salt, or nitrogen compound salt of a sulfonic acid residue, and has a weight average molecular weight in the range of 1,000 to 500,000, wherein R 1 represents a hydrogen atom or methyl group, R 2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, and Z represents a phenylene group, naphthylene group, or ester group. There can be provided a polymer compound for a conductive polymer having a specific super strongly acidic sulfo group, which is soluble in an organic solvent, and suitably used for a fuel cell or dopant for a conductive material.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a polymer compound for a conductive polymer comprising a repeating unit represented by the following general formula (1), which comprises performing a polymerization reaction using a monomer which has a structure of a salt comprising a sulfonic acid residue and lithium, sodium, potassium, or a nitrogen compound, and after polymerization, converting the structure of the salt comprising the sulfonic acid residue and the lithium, the sodium, the potassium, or the nitrogen compound into a sulfo group by ion-exchange using an ion exchange resin, thereby manufacturing a polymer compound which is used for a conductive polymer, wherein the molecular weight distribution (Mw/Mn) of the polymer compound is 1.0 to 2.0, and the polymer compound contains one or more repeating units selected from the repeating units represented by the following general formula (2-2) or (2-3) as the repeating unit represented by the general formula (1), wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, and Z represents a phenylene group, a naphthylene group, or an ester group, and wherein R 1 has the same meaning as defined above.
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