Charged particle lithography system and beam generator

Patent metadata

Field	Value
Publication number	US-9653261-B2
Application number	US-201314400569-A
Country	US
Kind code	B2
Filing date	May 14, 2013
Priority date	May 14, 2012
Publication date	May 16, 2017
Grant date	May 16, 2017

Abstract

The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array ( 6 ) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector ( 12 ) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source ( 3 ) for generating a diverging charged particle beam; a collimator system ( 5 a, 5 b, 5 c, 5 d; 72;300 ) for refracting the diverging charged particle beam; and a cooling arrangement ( 203 ) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

First claim

The invention claimed is:

1. A charged particle lithography system for exposing a target, the system comprising:
a charged particle beam generator for generating a charged particle beam;
an aperture array for forming a plurality of beamlets from the charged particle beam; and
a beamlet projector for projecting the beamlets onto a surface of the target, wherein the charged particle beam generator comprises:
a charged particle source for generating a diverging charged particle beam;
a collimator system for refracting the diverging charged particle beam, wherein the collimator system comprises a body comprising electrodes, wherein the electrodes define an inner surface of the body; and
a cooling arrangement for removing heat from the collimator system, wherein the cooling arrangement is formed by the body, wherein the body comprises one or more cooling channels defined within the body and arranged for accommodating a flow of cooling fluid.

2. The lithography system of claim 1 , wherein the charged particle source is located in a first vacuum chamber and wherein the collimator system and the cooling arrangement are located in a second vacuum chamber.

3. The lithography system of claim 1 , wherein the beam generator is included within an exposure vacuum chamber of the lithography system.

4. The lithography system of claim 1 , wherein the cooling arrangement comprises a closed body provided with a cavity, wherein the inner surface of the body serves as upper and lower electrodes.

5. The lithography system of claim 1 , wherein the cooling arrangement is integrated with at least part of the collimator system.

6. The lithography system of claim 1 , wherein the collimator system forms a chamber with predominantly closed walls.

7. The lithography system of claim 1 , wherein the collimator system comprises an Einzel lens comprising three electrodes.

8. The lithography system of claim 7 , wherein a center electrode of the Einzel lens electrodes is prepared for a positive potential relative to outer electrodes of the Einzel lens electrodes.

9. The lithography system of claim 8 , wherein the outer electrodes of the Einzel lens are prepared for inclusion at ground potential.

10. The lithography system of claim 7 , wherein at least an upper electrode of the Einzel lens is provided with one or more cooling channels for guiding the cooling fluid.

11. The lithography system of claim 10 , wherein at least a portion of the one or more cooling channels extends in a substantially vertical direction at or in close proximity of a surface of the electrode facing the charged particle beam during use.

12. The lithography system of claim 10 , wherein at least a portion of the cooling channels substantially extends in a radial direction away from and substantially perpendicular to an optical axis of the charged particle beam during use.

13. The lithography system of claim 7 , wherein the Einzel lens comprises an upper and a lower electrode, and wherein the upper and lower electrodes of the Einzel lens comprise one or more cooling channels for guiding the cooling fluid.

14. The lithography system of claim 7 , wherein the Einzel lens comprises an upper electrode and wherein the upper electrode has a central aperture, the central aperture being one of substantially conically shaped and substantially bell-shaped.

15. A charged particle beam generator for use in a charged particle lithography system according to claim 1 , the charged particle beam generator comprising:
a charged particle source for generating a diverging charged particle beam;
a collimator system for refracting the diverging charged particle beam, wherein the collimator system comprises a body comprising electrodes, wherein the electrodes define an inner surface of the body; and
a cooling arrangement for removing heat from the collimator system, wherein the cooling arrangement is formed by the body, wherein the body comprises one or more cooling channels defined within the body and arranged for accommodating a flow of cooling fluid.

16. The generator of claim 15 , wherein the charged particle source is located in a first vacuum chamber and wherein the collimator system and the cooling arrangement are located in a second vacuum chamber.

17. The generator of claim 15 , wherein the cooling arrangement comprises a closed body provided with a cavity, wherein the inner surface of the body serves as upper and lower electrodes.

18. The generator of claim 15 , wherein the cooling arrangement is integrated with at least part of the collimator system.

19. The generator of claim 15 , wherein the collimator system forms a chamber with predominantly closed walls.

20. The generator of claim 15 , wherein the collimator system comprises an Einzel lens comprising three electrodes ( 5 a , 5 b , 5 c ).

21. The generator of claim 20 , wherein a center electrode ( 5 b ) of the Einzel lens electrodes is prepared for a positive potential relative to outer electrodes of the Einzel lens electrodes.

22. The generator of claim 21 , wherein the outer electrodes ( 5 a , 5 c ) of the Einzel lens are prepared for inclusion at ground potential.

23. The generator of claim 20 , wherein at least and upper electrode of the Einzel lens is provided with one or more cooling channels for guiding the cooling fluid.

24. The generator of claim 23 , wherein at least a portion of the one or more cooling channels extends in a substantially vertical direction at or in close proximity of a surface of the electrode facing the charged particle beam during use.

25. The generator of claim 23 , wherein at least a portion of the cooling channels substantially extends in a radial direction away from and substantially perpendicular to an optical axis of the charged particle beam during use.

26. The generator of claim 20 , wherein Einzel lens comprises an upper and a lower electrode, and wherein the upper and lower electrodes of the Einzel lens comprise one or more cooling channels for guiding the cooling fluid.

27. The generator of claim 20 , wherein the Einzel lens comprises an upper electrode, and wherein the upper electrode has a central aperture, the central aperture being one of substantially conically shaped and substantially bell-shaped.

Assignees

• Mapper Lithography Ip Bv

Inventors

• Van Veen Alexander Hendrik Vincent
• Urbanus Willem Henk

Classifications

• H01J2237/002

  Cooling arrangements · CPC title

• H01J2237/0264

  magnetic · CPC title

• H01J2237/0262

  electrostatic · CPC title

• H01J2237/026

  Shields · CPC title

• H01J37/3177

  Multi-beam, e.g. fly's eye, comb probe · CPC title