Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

US9650451B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9650451-B2
Application numberUS-201414188154-A
CountryUS
Kind codeB2
Filing dateFeb 24, 2014
Priority dateAug 7, 2002
Publication dateMay 16, 2017
Grant dateMay 16, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A fluorine-containing compound represented by the formula 1, where R 1 is a methyl group or trifluoromethyl group, each of R 2 and R 3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R 1 , R 2 and R 3 is in a plural number, the at least one of R 1 , R 2 and R 3 may be identical with or different from each other.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polymer prepared by a polymerization or copolymerization by directly using a fluorine-containing compound represented by formula 1, wherein R 1 is a methyl group or trifluoromethyl group, R 2 and R 3 each independently represent a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25, or (b) an aromatic hydrocarbon group wherein at least one of R 2 and R 3 comprises a functional group selected from the group consisting of vinyl group, allyl group, acryloyl group, and methacryloyl group optionally comprises a substituent having at least one fluorine atom substituted for a part or all<hydrogen atoms of the functional group; and the hydrocarbon group and the aromatic hydrocarbon group each independently and optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, Z represents 0 or 1, and when at least one of R 1 , R 2 and R 3 is in a plural number, the at least one of R 1 , R 2 and R 3 may be identical with or different from each other. 2. A polymer according to claim 1 , wherein at least one of R 2 and R 3 comprises a substituent selected from the group consisting of trifluorovinyl group, difluorotrifluoromethylvinyl group, fluoroacryloyl group, trifluoromethylacryloyl group, and nonylfluorobutylacryloyl group. 3. A polymer according to claim 1 , wherein at least one of R 2 and R 3 comprises an acid-labile protecting group that optionally contains at least one of an oxygen atom, a carbonyl bond and a fluorine atom. 4. A method of using the polymer according to claim 1 , in the manufacture of an anti-reflection coating material for an ultraviolet or visible light, comprising dissolving the polymer in a solvent to form the anti-reflection coating material. 5. A method of using the polymer according to claim 1 in the manufacture of a resist composition, comprising dissolving the polymer in a solvent to form the resist composition.

Assignees

Inventors

Classifications

  • Polymer of unsaturated acid or ester · CPC title

  • C08F14/18Primary

    Monomers containing fluorine · CPC title

  • containing no aromatic rings in the alcohol moiety · CPC title

  • Processes of polymerisation · CPC title

  • Homopolymers or copolymers of alkyl-substituted styrenes · CPC title

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Frequently asked questions

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What does patent US9650451B2 cover?
A fluorine-containing compound represented by the formula 1, where R 1 is a methyl group or trifluoromethyl group, each of R 2 and R 3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or rin…
Who is the assignee on this patent?
Central Glass Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08F14/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 16 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).