Method for producing an electronic component and electronic component

US9647186B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9647186-B2
Application numberUS-201414163240-A
CountryUS
Kind codeB2
Filing dateJan 24, 2014
Priority dateJan 30, 2008
Publication dateMay 9, 2017
Grant dateMay 9, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for producing an electronic component comprising barrier layers for the encapsulation of the component comprises, in particular, the following steps: providing a substrate with at least one functional layer, applying at least one first barrier layer on the functional layer via plasma enhanced atomic layer deposition (PEALD), and applying at least one second barrier layer on the functional layer by means of plasma-enhanced chemical vapor deposition (PECVD), where the at least one first barrier layer is applied at a temperature of less than 100° C.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing an electronic component comprising barrier layers for the encapsulation of the component, comprising: providing a substrate with at least one functional layer; applying at least one first barrier layer on the functional layer via plasma enhanced atomic layer deposition (PEALD); and applying at least one second barrier layer on the functional layer by means of plasma-enhanced chemical vapor deposition (PECVD); wherein the at least one first barrier layer is applied at a temperature of less than 100° C. 2. The method as claimed in claim 1 , wherein the at least one first barrier layer is applied at a temperature of less than 80° C. 3. The method as claimed in claim 1 , further comprising: applying a protective layer on the first and second barrier layers. 4. The method as claimed in claim 3 , wherein the protective layer has a spray coating. 5. The method as claimed in claim 1 , further comprising: applying a first electrode on the substrate and applying a second electrode on the at least one functional layer while providing the substrate with the at least one functional layer; wherein the at least one functional layer comprises an organic functional layer and wherein the at least one first barrier layer is applied on the second electrode. 6. The method as claimed in claim 1 , wherein at least one of the at least one first barrier layer and the at least one second barrier layer comprises one of an oxide, a nitride and an oxynitride. 7. The method as claimed in claim 1 , wherein a layer sequence composed of at least two layers comprising different materials is applied as the second barrier layer. 8. The method as claimed in claim 7 , wherein the at least two layers comprising different materials comprise a layer comprising an oxide and a layer comprising a nitride. 9. The method as claimed in claim 7 , wherein the first and second barrier layers are applied alternately one on top of another. 10. The method as claimed claim 1 , wherein at least one of at least one further first barrier layer and at least one further second barrier layer is applied. 11. The method as claimed in claim 1 , wherein the second barrier layer is applied before the first barrier layer. 12. The method as claimed in claim 1 , wherein the at least one first barrier layer and the at least one second barrier layer are applied at a temperature of less than 100° C. 13. The method as claimed in claim 1 , wherein the at least one first barrier layer has a thickness of greater than or equal to 10 nm and less than or equal to 30 nm. 14. The method as claimed in claim 1 , wherein the at least one second barrier layer has a thickness of greater than or equal to 100 nm and less than or equal to 1000 nm. 15. The method as claimed in claim 1 , wherein the electronic component comprises at least one of an organic light emitting diode (OLED) and a solar cell.

Assignees

Inventors

Classifications

  • Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

  • in the presence of a plasma [PECVD] · CPC title

  • by multiple encapsulations, e.g. by a thin protective coating and a thick encapsulation · CPC title

  • comprising organic materials, e.g. plastics or resins · CPC title

  • characterised by their shape or disposition · CPC title

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What does patent US9647186B2 cover?
A method for producing an electronic component comprising barrier layers for the encapsulation of the component comprises, in particular, the following steps: providing a substrate with at least one functional layer, applying at least one first barrier layer on the functional layer via plasma enhanced atomic layer deposition (PEALD), and applying at least one second barrier layer on the functio…
Who is the assignee on this patent?
Schmid Christian, Schlenker Tilman, Zull Heribert, and 4 more
What technology area does this patent fall under?
Primary CPC classification C23C16/0272. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 09 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).