Gas barrier film and electronic device

Patent metadata

Field	Value
Publication number	US-9646940-B2
Application number	US-201113976300-A
Country	US
Kind code	B2
Filing date	Dec 1, 2011
Priority date	Dec 27, 2010
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

The gas barrier film including, on a base, a first gas barrier layer which is formed by a physical vapor deposition method or a chemical vapor deposition method and contains Si and N; and a second gas barrier layer which is formed by coating a solution containing a polysilazane compound, wherein the second gas barrier layer is subjected to conversion treatment by being irradiated with a vacuum ultraviolet ray; and, when the composition of each layer is represented by SiO x N y , the distribution of the composition SiO x N y of the second gas barrier layer in a thickness direction satisfies a condition specified in the following (A): (A) the second gas barrier layer includes 50 nm or more of a region of 0.25≦x≦1.1 and 0.4≦y≦0.75 in the thickness direction.

First claim

What is claimed is:

1. A gas barrier film comprising:
a base;
a first gas barrier layer which is formed on the base by a physical vapor deposition method or a chemical vapor deposition method, wherein the first gas barrier layer is an inorganic film comprising silicon nitride or silicon oxynitride as a main component and has a film thickness of 40 nm or more and 200 nm or less; and
a second gas barrier layer which is directly adjacent to the first gas barrier layer and is formed by coating a solution containing a polysilazane compound on the first gas barrier layer, wherein the second gas barrier layer has a film thickness of 50 nm or more and 300 nm or less,
wherein the second gas barrier layer is subjected to a conversion treatment by being irradiated with a vacuum ultraviolet ray; and
when the compositions of the second gas barrier layer is represented by SiO x N y , the distribution of the composition SiO x N y of the second gas barrier layer in a thickness direction satisfies a condition specified in the following (A):
(A) the second gas barrier layer includes 50 nm or more of a region of 0.25≦x≦1.1 and 0.4≦y≦0.75 in the thickness direction.

2. The gas barrier film according to claim 1 , wherein the distribution of the composition SiO x N y of the second gas barrier layer in a thickness direction satisfies a condition specified in the following (B):
(B) the second gas barrier layer includes 50 nm or more of a region of 0.25≦x≦0.55 and 0.55≦y≦0.75 in the thickness direction.

3. The gas barrier film according to claim 1 , wherein the composition of the first gas barrier layer is represented by SiO x N y , and the distribution of the compositions SiO x N y of the first gas barrier layer and the second gas barrier layer in a thickness direction satisfies a condition specified in the following (C):
(C) the maximum value of a y value in the distribution of the compositions SiO x N y of the first gas barrier layer and the second gas barrier layer is included in the first gas barrier layer.

4. The gas barrier film according to claim 1 , wherein the distribution of the composition SiO x N y of the second gas barrier layer in a thickness direction satisfies a condition specified in the following (D):
(D) in the surface layer region of the second gas barrier layer, x/y is 6.0 or more.

5. The gas barrier film according to claim 4 , wherein the distribution of the composition SiO x N y of the second gas barrier layer in a thickness direction satisfies the condition specified in the following (A′):
(A′) the second gas barrier layer comprises a region of 0.25≦x≦1.1 and 0.45≦y≦0.75, the region having a thickness of 100 nm or more and 300 nm or less in the thickness direction.

6. An electronic device comprising the gas barrier film according to claim 1 .

Assignees

• Mori Takahiro
• Konica Minolta Inc

Inventors

• Mori Takahiro

Classifications

• H10W42/00

  Arrangements for protection of devices (arrangements for thermal protection H10W40/00) · CPC title

• C08J7/042

  with two or more layers, where at least one layer of a composition contains a polymer binder · CPC title

• H01L2924/0002

  Electricity · mapped topic

• C23C26/00

  Coating not provided for in groups C23C2/00 - C23C24/00 · CPC title

• H01L23/564 Primary

  Electricity · mapped topic