System and method for multi-source X-ray-based imaging
US-9490099-B2 · Nov 8, 2016 · US
US9646801B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9646801-B2 |
| Application number | US-201514682890-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 9, 2015 |
| Priority date | Apr 9, 2015 |
| Publication date | May 9, 2017 |
| Grant date | May 9, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
In various embodiments, a multi-layer X-ray source target is provided having two or more layers of target material at different depths and different thicknesses. In one such embodiment the X-ray generating layers increase in thickness in relationship to their depth relative to the electron beam facing surface of the source target, such that X-ray generating layer further from this surface are thick than X-ray generating layers closer to the electron beam facing surface.
Opening claim text (preview).
The invention claimed is: 1. An X-ray source, comprising: an emitter configured to emit an electron beam; and a target having an emitter-facing surface and configured to generate X-rays when impacted by the electron beam, the target comprising: two or more X-ray generating layers at different depths relative to the emitter-facing surface, each X-ray generating layer having a different thickness; and at least one intervening thermally-conductive layer between each pair of X-ray generating layers; wherein the X-ray generating layers further from the emitter-facing surface are thicker than X-ray generating layers nearer the emitter-facing surface. 2. The X-ray source of claim 1 , wherein the two or more X-ray generating layers comprise one or more regions of an X-ray generating material that produces X-rays when impacted by the electron beam. 3. The X-ray source of claim 1 , wherein two or more of the X-ray generating layers comprise different X-ray generating materials. 4. The X-ray source of claim 1 , comprising at least two intervening thermally-conductive layers differing in one or both of composition or thickness. 5. The X-ray source of claim 1 , wherein the emitter-facing surface comprises a thermally-conductive material. 6. The X-ray source of claim 1 , further comprising a thermally-conductive substrate opposite the emitter-facing surface. 7. The X-ray source of claim 1 , wherein one or more X-ray generating layers comprise a tungsten region and the at least one thermally-conductive layer comprises diamond. 8. The X-ray source of claim 1 , wherein one or more X-ray generating layers comprise an X-ray generating material region having a cross-sectional extent less than the cross-sectional extent of the respective X-ray generating layer. 9. A method for fabricating an X-ray source target, comprising: forming a first X-ray generating layer, wherein the first X-ray generating layer has a first thickness; on the first X-ray generating layer, forming one or more sets of: an intervening thermally-conductive layer; and an additional X-ray generating layer, wherein each X-ray generating layer has a different thickness than other X-ray generating layers; wherein each additional X-ray generating layer formed over the first X-ray generating layer is less thick than those X-ray generating layers formed prior. 10. The method of claim 9 , wherein the first X-ray generating layer is formed on a thermally-conductive substrate. 11. The method of claim 9 , wherein forming the first X-ray generating layer comprises forming the first X-ray generating layer on a thermally-conductive substrate. 12. The method of claim 9 , wherein the step of forming one or more sets of an intervening layer and an additional X-ray generating layer comprises forming more than one set of said layers, and wherein the thermally conductive layer of one set has a different thickness than the thermally conductive layer of another set. 13. The method of claim 12 , wherein forming one or both of the first X-ray generating layer or the additional X-ray generating layers comprises forming a continuous X-ray generating material region across the full cross-sectional extent of the respective X-ray generating layer. 14. The method of claim 12 , wherein forming one or both of the first X-ray generating layer or the additional X-ray generating layers comprises forming an X-ray generating material region across less than the full cross-sectional extent of the respective X-ray generating layer and forming one or more thermally-conductive regions across the remainder of the respective X-ray generating layer.
of the anode · CPC title
Thermal conductivity · CPC title
Laminated targets, e.g. plurality of emitting layers of unique or differing materials · CPC title
Cooling non-rotary anodes · CPC title
characterised by the material · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.