Program verify word line ramping delay for lower current consumption mode
US-2024395343-A1 · Nov 28, 2024 · US
US9646698B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9646698-B2 |
| Application number | US-201514813901-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 30, 2015 |
| Priority date | Mar 25, 2015 |
| Publication date | May 9, 2017 |
| Grant date | May 9, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A semiconductor memory device includes a plurality of memory cells and an X-decoder. The plurality of memory cells are connected to a word line. The X-decoder is connected to the word line, and applies an operating voltage to the word line. In the semiconductor memory device, tunnel insulating layers included in the plurality of memory cells have different thicknesses according to distances of the plurality of memory cells from the X-decoder.
Opening claim text (preview).
What is claimed is: 1. A semiconductor memory device, comprising: an X-decoder suitable for applying a program voltage and a pass voltage to a plurality of word lines; and a memory cell array including a plurality of cell strings, the memory cell array being connected to the plurality of word lines, wherein channel plugs are formed to different widths according to positions at which the plurality of cell strings are arranged, and wherein each of the plurality of cell strings includes: insulative patterns and conductive patterns which are alternately stacked; a channel layer that passes through the insulative patterns and the conductive patterns; and a tunnel insulating layer that surrounds sidewalls of the channel layer. 2. The semiconductor memory device of claim 1 , wherein a width of a channel plug of a first cell string adjacent to the X-decoder is wider than a width of a channel plug of a second cell string which is located farther from the X-decoder than the channel plug of the first cell string. 3. The semiconductor memory device of claim 2 , wherein a length of the word line connecting the X-decoder to the first cell string is shorter than that of the word line connecting the X-decoder to the second cell string. 4. The semiconductor memory device of claim 1 , wherein a width of a channel plug of each of the plurality of cell strings becomes narrower as a distance of the cell strings from the X-decoder increases.
Address circuits; Decoders; Word-line control circuits · CPC title
Programming or data input circuits · CPC title
comprising cells having several storage transistors connected in series · CPC title
Electricity · mapped topic
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.