Line width error obtaining method, line width error obtaining apparatus, and inspection system

Patent metadata

Field	Value
Publication number	US-9646374-B2
Application number	US-201615051744-A
Country	US
Kind code	B2
Filing date	Feb 24, 2016
Priority date	Feb 25, 2015
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

Optical image data is acquired by irradiating a pattern with light emitted from a light source. A threshold value is specified by internally dividing a minimum value and a maximum value of a signal amount of reference image data by a division ratio. A position corresponding to a signal amount of a threshold value is determined as an edge of a pattern of the reference image data. A position of a signal amount equal to the threshold value is determined as an edge of the pattern of the optical image data. A line width error is obtained as a difference between a first line width of the optical image data and a second line width of the reference image data. A new threshold value is specified in the case of fluctuation of a light quantity of the light source or decrease of a contrast value of the optical image data.

First claim

What is claimed is:

1. A line width error of a pattern formed in a sample obtaining method comprising:
acquiring optical image data of a pattern formed in a sample by irradiating the pattern with light emitted from a light source, and causing the light transmitted through the sample or reflected by the sample to be incident on a sensor;
generating reference image data corresponding to the optical image data from design data of the pattern;
specifying a threshold value by internally dividing a minimum value and a maximum value of a signal amount of the reference image data by a division ratio, and determining a position corresponding to the signal amount of the threshold value as an edge of the pattern of the reference image data;
determining a position of the signal amount equal to the threshold value as an edge of the pattern of the optical image data, and detecting an edge pair consisting of an edge as a starting point for a measurement of a first line width of the pattern, and another edge as an ending point of the measurement of the first line width;
obtaining the first line width of the pattern using the edge pair of the optical image data, and obtaining a line width error as a difference between the first line width and a second line width of the pattern obtained using an edge pair of the reference image data corresponding to the edge pair of the optical image data; and
wherein a new threshold value is specified in the case of fluctuation of a light quantity of the light source or decrease of a contrast value of the optical image data, and a position of the signal amount equal to the new threshold value is determined as an edge of the pattern of the optical image data.

2. The line width error of a pattern formed in a sample obtaining method according to claim 1 , wherein consecutive values between the minimum value and the maximum value are split into two groups by the division ratio taking the threshold value as a boundary.

3. The line width error of a pattern formed in a sample obtaining method according to claim 1 ,
wherein the specifying step for the new threshold value comprises,
obtaining at least one of a relationship between a fluctuation amount of the light quantity of the light source and an optimum threshold value, and a relationship between a degradation amount of the contrast value and the optimum threshold value, by performing an experiment; and specifying the new threshold value according to at least one of these relationships.

4. A line width error of a pattern formed in a sample obtaining method comprising:
acquiring optical image data of a pattern formed in a sample by irradiating the pattern with light emitted from a light source, and causing the light transmitted through the sample or reflected by the sample to be incident on a sensor;
generating reference image data corresponding to the optical image data from design data of the pattern;
specifying a threshold value by internally dividing a minimum value and a maximum value of a signal amount of the reference image data by a division ratio, and determining a position corresponding to the signal amount of the threshold value as an edge of the pattern of the reference image data;
determining a position of the signal amount equal to the threshold value as an edge of the pattern of the optical image data, and detecting an edge pair consisting of an edge as a starting point for a measurement of any line width of the pattern, and another edge as an ending point of the measurement of the line width;
obtaining a plurality of line widths having different design values of the pattern using the edge pairs of the optical image data;
specifying a line width range including at least one of the line widths;
obtaining a line width error as a difference between a first line width included in the line width range, and a second line width of the pattern of the reference image data corresponding to the optical image data of the pattern having the first line width; and
wherein a new line width range is specified in the case of fluctuation of a light quantity of the light source or decrease of a contrast value of the optical image data.

5. The line width error of a pattern formed in a sample obtaining method according to claim 4 , wherein consecutive values between the minimum value and the maximum value are split into two groups by the division ratio taking the threshold value as a boundary.

6. The line width error of a pattern formed in a sample obtaining method according to claim 4 ,
wherein the specifying step for the new threshold value comprises,
obtaining at least one of a relationship between a fluctuation amount of the light quantity of the light source and an optimum threshold value, and a relationship between a degradation amount of the contrast value and the optimum threshold value, by performing an experiment, and specifying the new threshold value according to at least one of these relationships.

7. A line width error of a pattern formed in a sample obtaining apparatus comprising:
a table configured to be movable in an X-axis direction and a Y-axis direction;
a position measuring unit configured to measure a position coordinate of the table;
an illumination optical system configured to illuminate light emitted from a light source to a sample on the table;
an imaging unit configured to acquire an optical image data of a pattern formed in the sample by causing the light transmitted through the sample or reflected by the sample to be incident on a sensor;
a line width error obtaining unit configured to specify a position of the signal amount of the optical image data equal to a threshold value by internally dividing a minimum value and a maximum value of the signal amount of a reference image data generated from design data of the pattern, by a division ratio, as an edge of the pattern of the optical image data, and detect an edge pair consisting of an edge as a starting point for a measurement of a first line width, and another edge as an ending point of the measurement of the first line width, and obtain the first line width of the pattern of the optical image data using the edge pair, and obtain a line width error as a difference between the first line width and a second line width of the pattern obtained using an edge pair of the reference image data corresponding to the edge pair of the optical image data;
a light quantity sensor configured to detect a fluctuation of light quantity of the light source; and
wherein the line width error obtaining unit specifies a new threshold value in the case of the light quantity sensor detecting the fluctuation of the light quantity of the light source, and determines a position of the signal amount equal to the new threshold value as an edge of the pattern of the optical image data.

8. The line width error of a pattern formed in a sample obtaining method according to claim 7 , wherein consecutive values between the minimum value and the maximum value are split into two groups by the division ratio taking the threshold value as a boundary.

9. The line width error of a pattern formed in a sample obtaining apparatus according to claim 7 , further comprising a map generating unit configured to generate a map of the line width error corresponding to the position coordinate of the sample using information of the position coordinate of the table output from the position measuring unit.

10. A line width error of a pattern formed in a sample obtaining apparatus comprising:
a table configured to be movable in an X-axis direction and a Y-axis direction;
a position measuring unit configured to measure a position coordinate of the table;
an illumination optical system configured to illuminate ligh

Assignees

• Nuflare Technology Inc

Inventors

• Hashimoto Hideaki
• Nukada Hideki
• Inoue Kazuhiko

Classifications

• G06T2207/30148

  Semiconductor; IC; Wafer · CPC title

• G06T7/001 Primary

  using an image reference approach · CPC title