Semiconductor photoelectrode, photoelectrochemical cell, hydrogen generation method, and energy system

US9644276B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9644276-B2
Application numberUS-201414509361-A
CountryUS
Kind codeB2
Filing dateOct 8, 2014
Priority dateOct 17, 2013
Publication dateMay 9, 2017
Grant dateMay 9, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Provided is a semiconductor photoelectrode comprising a first conductive layer; a first n-type semiconductor layer disposed on the first conductive layer; and a second conductive layer covering the first n-type semiconductor layer. The first n-type semiconductor layer has a first n-type surface region and a second n-type surface region. The first n-type surface region is in contact with the first conductive layer. The second n-type surface region is in contact with the second conductive layer. The first n-type semiconductor layer is formed of at least one selected from the group consisting of a nitride semiconductor and an oxynitride semiconductor. The second conductive layer is light-transmissive. The second conductive layer is formed of a p-type oxide conductor.

First claim

Opening claim text (preview).

The invention claimed is: 1. A semiconductor photoelectrode, comprising: a first conductive layer; a first n-type semiconductor layer disposed on the first conductive layer; and a second conductive layer covering the first n-type semiconductor layer, wherein the first n-type semiconductor layer has a first n-type surface region and a second n-type surface region; the first n-type surface region is in contact with the first conductive layer; the second n-type surface region is in contact with the second conductive layer; a band edge level E C2a of a conduction band of the first n-type surface region is not higher than a band edge level E C2b of a conduction band of the second n-type surface region; a band edge level E V2a of a valence band of the first n-type surface region is not higher than a band edge level E V2b of a valence band of the second n-type surface region; a Fermi level E F2b of the second n-type surface region is not higher than a Fermi level E F2a of the first n-type surface region; the Fermi level E F2a of the first n-type surface region is lower than a Fermi level E F1 of the first conductive layer; a Fermi level E F3 of the second conductive layer is lower than the Fermi level E F2b of the second n-type surface region; the first n-type semiconductor layer is formed of at least one selected from the group consisting of a nitride semiconductor and an oxynitride semiconductor; the second conductive layer is light-transmissive; and the second conductive layer is formed of a p-type oxide conductor. 2. The semiconductor photoelectrode according to claim 1 , wherein the nitride semiconductor and the oxynitride semiconductor each contain a metal selected from the group consisting of Ti, Nb, and Ta. 3. The semiconductor photoelectrode according to claim 1 , wherein the first n-type semiconductor layer is composed of two or more kinds of elements; and a concentration of the at least one kind of the element included in the first n-type semiconductor layer is increased or decreased along a thickness direction of the first n-type semiconductor layer. 4. The semiconductor photoelectrode according to claim 1 , further comprising: a second n-type semiconductor layer, wherein the second n-type semiconductor layer is interposed between the first conductive layer and the first n-type semiconductor layer; a band edge level of a conduction band E C22 of the second n-type semiconductor layer is lower than a band edge level of a conduction band E C21 of the first n-type semiconductor layer; a band edge level of a valence band E V22 of the second n-type semiconductor layer is lower than a band edge level of a valence band E V21 of the first n-type semiconductor layer; a Fermi level E F21 of the first n-type semiconductor layer is lower than a Fermi level E F22 of the second n-type semiconductor layer; the Fermi level E F22 of the second n-type semiconductor layer is lower than the Fermi level E F1 of the first conductive layer; and the Fermi level E F3 of the second conductive layer is lower than the Fermi level E F22 of the first n-type semiconductor layer. 5. The semiconductor photoelectrode according to claim 4 , wherein the first n-type semiconductor layer is formed of a nitride or oxynitride semiconductor containing a metal selected from the group consisting of Ti, Nb and Ta. 6. The semiconductor photoelectrode according to claim 5 , wherein the second n-type semiconductor layer is formed of an oxide, nitride, or oxynitride semiconductor containing a metal selected from the group consisting of Ti, Nb and Ta. 7. The semiconductor photoelectrode according to claim 6 , wherein the metal selected from the group consisting of Ti, Nb, and Ta contained in the first n-type semiconductor layer is the same as the metal selected from the group consisting of Ti, Nb, and Ta contained in the second n-type semiconductor layer. 8. The semiconductor photoelectrode according to claim 1 , wherein the p-type oxide conductor is formed of a material selected from the group consisting of p-type nickel oxide, p-type copper oxide, p-type cobalt oxide, p-type zinc oxide, p-type CuNbO 3 , p-type SrCu 2 O 2 , p-type BaCuSeF, and p-type CuAlO 2 . 9. The semiconductor photoelectrode according to claim 8 , wherein the p-type oxide conductor is formed of p-type nickel oxide. 10. A photoelectrochemical cell, comprising: the semiconductor photoelectrode according to claim 1 ; a counter electrode electrically connected to the first conductive layer included in the semiconductor photoelectrode; an electrolyte aqueous solution in contact with surfaces of the semiconductor photoelectrode and the counter electrode; and a container containing the semiconductor photoelectrode, the counter electrode, and the electrolyte aqueous solution. 11. A method for generating hydrogen, the method comprising: (a) preparing the photoelectrochemical cell according to claim 10 ; and (b) irradiating the semiconductor photoelectrode included in the photoelectrochemical cell with light to generate hydrogen on the counter electrode included in the photoelectrochemical cell. 12. An energy system, comprising: the photoelectrochemical cell according to claim 10 ; a hydrogen reservoir for storing hydrogen generated in the photoelectrochemical cell, a first pipe for connecting the hydrogen reservoir to the photoelectrochemical cell; a fuel cell for converting hydrogen stored in the hydrogen reservoir into electric power; and a second pipe for connecting the fuel cell to the hydrogen reservoir.

Assignees

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Classifications

  • by electrolysis of water · CPC title

  • Cross-Sectional Technologies · mapped topic

  • Cross-Sectional Technologies · mapped topic

  • H01M8/0656Primary

    by electrochemical means (H01M8/065 takes precedence) · CPC title

  • Chemistry & Metallurgy · mapped topic

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What does patent US9644276B2 cover?
Provided is a semiconductor photoelectrode comprising a first conductive layer; a first n-type semiconductor layer disposed on the first conductive layer; and a second conductive layer covering the first n-type semiconductor layer. The first n-type semiconductor layer has a first n-type surface region and a second n-type surface region. The first n-type surface region is in contact with the fir…
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd, Panasonic Corp
What technology area does this patent fall under?
Primary CPC classification H01M8/0656. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 09 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).