Anode and/or cathode pan assemblies in an electrochemical cell, and methods to use and manufacture thereof
US-2024055636-A1 · Feb 15, 2024 · US
US9644276B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9644276-B2 |
| Application number | US-201414509361-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 8, 2014 |
| Priority date | Oct 17, 2013 |
| Publication date | May 9, 2017 |
| Grant date | May 9, 2017 |
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Provided is a semiconductor photoelectrode comprising a first conductive layer; a first n-type semiconductor layer disposed on the first conductive layer; and a second conductive layer covering the first n-type semiconductor layer. The first n-type semiconductor layer has a first n-type surface region and a second n-type surface region. The first n-type surface region is in contact with the first conductive layer. The second n-type surface region is in contact with the second conductive layer. The first n-type semiconductor layer is formed of at least one selected from the group consisting of a nitride semiconductor and an oxynitride semiconductor. The second conductive layer is light-transmissive. The second conductive layer is formed of a p-type oxide conductor.
Opening claim text (preview).
The invention claimed is: 1. A semiconductor photoelectrode, comprising: a first conductive layer; a first n-type semiconductor layer disposed on the first conductive layer; and a second conductive layer covering the first n-type semiconductor layer, wherein the first n-type semiconductor layer has a first n-type surface region and a second n-type surface region; the first n-type surface region is in contact with the first conductive layer; the second n-type surface region is in contact with the second conductive layer; a band edge level E C2a of a conduction band of the first n-type surface region is not higher than a band edge level E C2b of a conduction band of the second n-type surface region; a band edge level E V2a of a valence band of the first n-type surface region is not higher than a band edge level E V2b of a valence band of the second n-type surface region; a Fermi level E F2b of the second n-type surface region is not higher than a Fermi level E F2a of the first n-type surface region; the Fermi level E F2a of the first n-type surface region is lower than a Fermi level E F1 of the first conductive layer; a Fermi level E F3 of the second conductive layer is lower than the Fermi level E F2b of the second n-type surface region; the first n-type semiconductor layer is formed of at least one selected from the group consisting of a nitride semiconductor and an oxynitride semiconductor; the second conductive layer is light-transmissive; and the second conductive layer is formed of a p-type oxide conductor. 2. The semiconductor photoelectrode according to claim 1 , wherein the nitride semiconductor and the oxynitride semiconductor each contain a metal selected from the group consisting of Ti, Nb, and Ta. 3. The semiconductor photoelectrode according to claim 1 , wherein the first n-type semiconductor layer is composed of two or more kinds of elements; and a concentration of the at least one kind of the element included in the first n-type semiconductor layer is increased or decreased along a thickness direction of the first n-type semiconductor layer. 4. The semiconductor photoelectrode according to claim 1 , further comprising: a second n-type semiconductor layer, wherein the second n-type semiconductor layer is interposed between the first conductive layer and the first n-type semiconductor layer; a band edge level of a conduction band E C22 of the second n-type semiconductor layer is lower than a band edge level of a conduction band E C21 of the first n-type semiconductor layer; a band edge level of a valence band E V22 of the second n-type semiconductor layer is lower than a band edge level of a valence band E V21 of the first n-type semiconductor layer; a Fermi level E F21 of the first n-type semiconductor layer is lower than a Fermi level E F22 of the second n-type semiconductor layer; the Fermi level E F22 of the second n-type semiconductor layer is lower than the Fermi level E F1 of the first conductive layer; and the Fermi level E F3 of the second conductive layer is lower than the Fermi level E F22 of the first n-type semiconductor layer. 5. The semiconductor photoelectrode according to claim 4 , wherein the first n-type semiconductor layer is formed of a nitride or oxynitride semiconductor containing a metal selected from the group consisting of Ti, Nb and Ta. 6. The semiconductor photoelectrode according to claim 5 , wherein the second n-type semiconductor layer is formed of an oxide, nitride, or oxynitride semiconductor containing a metal selected from the group consisting of Ti, Nb and Ta. 7. The semiconductor photoelectrode according to claim 6 , wherein the metal selected from the group consisting of Ti, Nb, and Ta contained in the first n-type semiconductor layer is the same as the metal selected from the group consisting of Ti, Nb, and Ta contained in the second n-type semiconductor layer. 8. The semiconductor photoelectrode according to claim 1 , wherein the p-type oxide conductor is formed of a material selected from the group consisting of p-type nickel oxide, p-type copper oxide, p-type cobalt oxide, p-type zinc oxide, p-type CuNbO 3 , p-type SrCu 2 O 2 , p-type BaCuSeF, and p-type CuAlO 2 . 9. The semiconductor photoelectrode according to claim 8 , wherein the p-type oxide conductor is formed of p-type nickel oxide. 10. A photoelectrochemical cell, comprising: the semiconductor photoelectrode according to claim 1 ; a counter electrode electrically connected to the first conductive layer included in the semiconductor photoelectrode; an electrolyte aqueous solution in contact with surfaces of the semiconductor photoelectrode and the counter electrode; and a container containing the semiconductor photoelectrode, the counter electrode, and the electrolyte aqueous solution. 11. A method for generating hydrogen, the method comprising: (a) preparing the photoelectrochemical cell according to claim 10 ; and (b) irradiating the semiconductor photoelectrode included in the photoelectrochemical cell with light to generate hydrogen on the counter electrode included in the photoelectrochemical cell. 12. An energy system, comprising: the photoelectrochemical cell according to claim 10 ; a hydrogen reservoir for storing hydrogen generated in the photoelectrochemical cell, a first pipe for connecting the hydrogen reservoir to the photoelectrochemical cell; a fuel cell for converting hydrogen stored in the hydrogen reservoir into electric power; and a second pipe for connecting the fuel cell to the hydrogen reservoir.
by electrolysis of water · CPC title
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
by electrochemical means (H01M8/065 takes precedence) · CPC title
Chemistry & Metallurgy · mapped topic
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