Method of producing structure containing phase-separated structure and method of forming top coat film

Patent metadata

Field	Value
Publication number	US-9644110-B2
Application number	US-201514674515-A
Country	US
Kind code	B2
Filing date	Mar 31, 2015
Priority date	Apr 9, 2014
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.

First claim

What is claimed is:

1. A method of producing a structure containing a phase-separated structure, comprising:
forming a layer containing a block copolymer on a substrate;
applying a top coat material to the layer containing the block copolymer to form a top coat film; and
subjecting the layer containing the block copolymer having the top coat film formed thereon to annealing treatment to conduct a phase separation of the layer,
wherein the top coat material comprises an organic solvent component (S) and a polymeric compound containing a structural unit containing either a dicarboxylic acid or a salt of a dicarboxylic acid, and
the organic solvent component (S) comprises water and an alcohol having 3 or more carbon atoms.

2. The method according to claim 1 , wherein the alcohol having 3 or more carbon atoms is at least one solvent selected from the group consisting of isopropyl alcohol, propylene glycol monom ethyl ether, 3-methoxy-1-prop anol, 3-methoxy-3-methylbutanol and t-butanol.

3. The method according to claim 1 , wherein the alcohol having 3 or more carbon atoms is isopropyl alcohol.

4. The method according to claim 3 , wherein the mixing ratio of isopropyl alcohol to water is in the range of 0.1 to 5.

5. The method according to claim 3 , wherein the structural unit is represented by any one of chemical formulae (Tc1-1) to (Tc1-3) shown below;

6. The method according to claim 4 , wherein the structural unit is represented by any one of chemical formulae (Tc1-1) to (Tc1-3) shown below;

7. The method according to claim 1 , wherein the block copolymer contains an Si-containing block.

8. The method according to claim 4 , wherein the block copolymer contains an Si-containing block.

9. The method according to claim 5 , wherein the block copolymer contains an Si-containing block.

10. The method according to claim 6 , wherein the block copolymer contains an Si-containing block.

11. A method of forming a top coat film, comprising:
forming a layer containing a block copolymer on a substrate; and
applying a top coat material to the layer containing the block copolymer to form a top coat film,
wherein the top coat material comprises an organic solvent component (S) and a polymeric compound containing a structural unit containing either a dicarboxylic acid or a salt of a dicarboxylic acid, and
the organic solvent component (S) comprises water and an alcohol having 3 or more carbon atoms.

12. The method according to claim 11 , wherein the alcohol having 3 or more carbon atoms is at least one solvent selected from the group consisting of isopropyl alcohol, propylene glycol monomethyl ether, 3-methoxy-l-propanol, 3-methoxy-3-methylbutanol and t-butanol.

13. The method according to claim 11 , wherein the alcohol having 3 or more carbon atoms is isopropyl alcohol.

14. The method according to claim 13 , wherein the mixing ratio of isopropyl alcohol to water is in the range of 0.1 to 5.

15. The method according to claim 13 , wherein the structural unit is represented by any one of chemical formulae (Tc1-1) to (Tc1-3) shown below;

16. The method according to claim 14 , wherein the structural unit is represented by any one of chemical formulae (Tc1-1) to (Tc1-3) shown below;

17. The method according to claim 11 , wherein the block copolymer contains an Si-containing block.

18. The method according to claim 14 , wherein the block copolymer contains an Si-containing block.

19. The method according to claim 15 , wherein the block copolymer contains an Si-containing block.

20. The method according to claim 16 , wherein the block copolymer contains an Si-containing block.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Seshimo Takehiro
• Maehashi Takaya
• Dazai Takahiro
• Utsumi Yoshiyuki

Classifications

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• C09D153/00 Primary

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• C09D183/00

  Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title