Flexible display with bent edge regions

Patent metadata

Field	Value
Publication number	US-9640561-B2
Application number	US-201514954805-A
Country	US
Kind code	B2
Filing date	Nov 30, 2015
Priority date	Apr 9, 2013
Publication date	May 2, 2017
Grant date	May 2, 2017

Abstract

An electronic device may have a flexible display with portions that are bent along a bend axis. The display may have display circuitry such as an array of display pixels in an active area. Contact pads may be formed in an inactive area of the display. Signal lines may couple the display pixels to the contact pads. The signal lines may overlap the bend axis in the inactive area of the display. During fabrication, an etch stop may be formed on the display that overlaps the bend axis. The etch stop may prevent over etching of dielectric such as a buffer layer on a polymer flexible display substrate. A layer of polymer that serves as a neutral stress plane adjustment layer may be formed over the signal lines in the inactive area of the display. Upon bending, the neutral stress plane adjustment layer helps prevent stress in the signal lines.

First claim

What is claimed is:

1. A display having an active area that includes an array of display pixels and having an inactive area, comprising:
a display substrate;
a first buffer layer on the display substrate;
a metal structure on the first buffer layer in the active area;
a second buffer layer that overlaps the metal structure;
polysilicon structures on the second buffer layer;
metal traces on the display substrate that overlap a bend axis in the inactive area along which the display substrate is bent and that extend into the active area;
a bond pad in the inactive area that is electrically connected to the metal traces in the inactive area; and
a layer of polymer overlapping the metal traces along the bend axis in the inactive area, wherein the layer of polymer is interposed between the bond pad and the active area.

2. The display defined in claim 1 wherein the metal structure is formed as part of a layer containing an etch stop structure in the inactive area, the display further comprising:
gate insulator on the polysilicon structures and the second buffer layer; and
interlayer dielectric on the gate insulator.

3. The display defined in claim 2 , wherein the interlayer dielectric is formed on the gate insulator in the active area and in the inactive area.

4. The display defined in claim 3 , wherein the bond pad is configured to couple the metal traces to a display driver integrated circuit.

5. The display defined in claim 4 , further comprising:
a first metal layer that forms transistor gate structures on the gate insulator in the active area;
a second metal layer that forms the metal traces in the inactive area and that forms source and drain contacts for the polysilicon structures in the active area; and
a third metal layer that forms the bond pad in the inactive area and that is coupled to the source and drain contacts in the active area.

6. The display defined in claim 4 , wherein a portion of the metal traces are formed directly on the first buffer layer along the bend axis in the inactive area.

7. The display defined in claim 6 , wherein the layer of polymer overlaps the portion of the metal traces formed directly on the first buffer layer in the inactive area.

8. The display defined in claim 1 , wherein the polymer layer is a neutral stress plane adjustment layer that shifts the neutral stress plane of the display into alignment with the metal traces.

9. A display having an active area and an inactive area, the display comprising:
a flexible substrate;
a buffer layer on the flexible substrate in the active and inactive areas;
polysilicon transistor structures on the buffer layer in the active area;
gate insulator on the buffer layer and the polysilicon transistor structures in the active area;
a first metal layer that forms transistor gates for the polysilicon transistor structures in the active area, wherein the first metal layer is formed on the gate insulator;
interlayer dielectric on the gate insulator and the first metal layer in the active area; and
a second metal layer that forms signal lines in the inactive area and that forms source and drain contacts for the polysilicon transistor structures in the active area, wherein the second metal layer is formed on the interlayer dielectric in the active area and is formed directly on the buffer layer in the inactive area.

10. The display defined in claim 9 , further comprising:
a third metal layer that forms a contact pad in the inactive area and that is coupled to the source and drain contacts in the active area.

11. The display defined in claim 10 , wherein the contact pad is configured to couple a display driver integrated circuit to the signal lines.

12. The display defined in claim 11 , further comprising:
a passivation layer on the second metal layer, wherein the passivation layer is absent where the contact pad is coupled to the signal lines in the inactive area and where the third metal layer is coupled to the source and drain terminals in the active area.

13. The display defined in claim 9 , wherein the second metal layer is formed directly on the buffer layer in the inactive area over a bend axis of the display.

14. A flexible display having an active area and an inactive area, the flexible display comprising:
a buffer layer in the active area and the inactive area;
an interlayer dielectric layer over the buffer layer; and
a metal layer that is formed directly on a first portion of the interlayer dielectric layer in the active area and that is formed directly on the buffer layer in the inactive area, wherein a second portion of the interlayer dielectric layer is formed in the inactive area, and wherein the first portion is separated from the second portion by a gap in the inactive area that is free of the interlayer dielectric layer.

15. The flexible display defined in claim 14 , wherein the metal layer is formed directly on the buffer layer over a bend axis of the display in the inactive area.

16. The flexible display defined in claim 15 , wherein a portion of the metal layer is formed directly on the second portion of the interlayer dielectric layer that is formed in the inactive area.

17. The flexible display defined in claim 16 , wherein the bend axis is between the first portion of the interlayer dielectric layer in the active area and the second portion of the interlayer dielectric layer in the inactive area.

18. The flexible display defined in claim 17 , further comprising:
a polymer layer formed over the bend axis between the first portion of the interlayer dielectric layer in the active area and the second portion of the interlayer dielectric layer in the inactive area.

19. The flexible display panel defined in claim 14 , wherein only the buffer layer, the metal layer, and a passivation layer are formed in the gap.

Assignees

• Apple Inc

Inventors

• Park Young Bae
• Chang Shih Chang
• Gupta Vasudha

Classifications

• Y02E10/549

  Organic PV cells · CPC title

• H01L51/0097

  Electricity · mapped topic

• H01L2251/5338

  Electricity · mapped topic

• H01L27/124 Primary

  Electricity · mapped topic

• H01L27/3276

  Electricity · mapped topic