Electron beam irradiation method and scanning electron microscope

Patent metadata

Field	Value
Publication number	US-9640366-B2
Application number	US-201113580288-A
Country	US
Kind code	B2
Filing date	Feb 9, 2011
Priority date	Mar 30, 2010
Publication date	May 2, 2017
Grant date	May 2, 2017

Abstract

The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.
To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.

First claim

The invention claimed is:

1. An electron beam irradiation method for scanning a first electron beam on a sample to electrify the sample and for measuring or inspecting the sample based on electrons obtained by scanning a second electron beam on the electrified sample,
wherein a scanning area of the second electron beam includes a plurality of divisional areas, and each irradiation condition of the first electron beam for each of the plurality of divisional areas is selected so that, when the first electron beam is irradiated to the divisional areas, although electrification generated in each of the divisional areas varies, differences in electrification among the divisional areas are canceled out so that electrification generated in the scanning area is symmetrical with respect to a center of the scanning area.

2. The electron beam irradiation method according to claim 1 , wherein each electrification parameter indicative of degrees of the electrification generated in the divisional areas is derived based on at least one of a density of a pattern inside a respective divisional area and a parameter allotted in compliance with a material of the pattern inside the respective divisional area.

3. The electron beam irradiation method according to claim 1 , wherein the first electron beam is scanned with different beam irradiation conditions for a first divisional area and a second divisional area.

4. The electron beam irradiation method according to claim 1 , wherein conditions of scanning for the plurality of divisional areas are determined such that dispersions in electrification distribution in the scanning area of the second electron beam are suppressed or cancelled out.

5. The electron beam irradiation method according to claim 1 , wherein each electrification parameter is derived based on design data of the sample.

6. A scanning electron microscope comprising:
an electron source;
a lens for converging an electron beam emitted from the electron source;
a scanning deflector for scanning the electron beam on a sample; and
a detector for detecting electrons given off from the sample,
wherein the scanning electron microscope further comprises a control unit which incorporates a memory medium adapted to store beam conditions of a first electron beam for electrifying the sample and beam conditions of a second electron beam for measuring or inspecting the sample, or which can access the memory medium,
wherein the control unit is configured to divide a scanning area of the second electron beam into a plurality of divisional areas, and to select each irradiation condition of the first electron beam for each of the plurality of divisional areas so that, when the first electron beam is irradiated to the divisional areas, although electrification generated in each of the divisional areas varies, differences in electrification among the divisional areas are canceled out so that electrification generated in the scanning area is symmetrical with respect to a center of the scanning area.

7. The scanning electron microscope according to claim 6 , wherein the control unit derives each electrification parameter based on at least one of a density of a pattern inside a respective divisional area and a parameter allotted in compliance with a material of the pattern inside the respective divisional area.

8. The scanning electron microscope according to claim 6 , wherein the control unit derives, by scanning the electron beam under different beam conditions to the plurality of divisional areas, a condition for minimizing the difference between the electrification parameters of a first divisional area and a second divisional area.

9. The scanning electron microscope according to claim 6 , wherein the control unit sets conditions of scanning for the plurality of divisional areas such that dispersions in electrification distribution in the second electron beam scan area are suppressed or cancelled out.

10. The scanning electron microscope according to claim 6 , wherein the control unit derives each electrification parameter based on design data of the sample.

Assignees

• Yokosuka Toshiyuki
• Yamazaki Minoru
• Kazumi Hideyuki
• Tago Kazutami
• Hitachi High Tech Corp

Inventors

• Yokosuka Toshiyuki
• Yamazaki Minoru
• Kazumi Hideyuki
• Tago Kazutami

Classifications

• H01J2237/2594

  Measuring electric fields or potentials · CPC title

• H01J2237/0048

  Charging arrangements · CPC title

• H01J37/268

  with scanning beams · CPC title

• H01J37/026

  Means for avoiding or neutralising unwanted electrical charges on tube components · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title