Xylylene diamine composition, and method for producing polyamide resin

US9637594B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9637594-B2
Application numberUS-201415032020-A
CountryUS
Kind codeB2
Filing dateOct 29, 2014
Priority dateOct 31, 2013
Publication dateMay 2, 2017
Grant dateMay 2, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided are [1] a xylylenediamine composition containing xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a compound represented by the following general formula (1), a diamine including xylylenediamine (but excluding the compound represented by the general formula (1)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the compound represented by the general formula (1) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine, where, in the general formula (1), n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1.

First claim

Opening claim text (preview).

The invention claimed is: 1. A xylylenediamine composition comprising xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine: wherein n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1. 2. The xylylenediamine composition according to claim 1 , wherein the compound represented by the general formula (1) is an aminoethylbenzylamine represented by the following formula (a): 3. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 4. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine. 5. The xylylenediamine composition according to claim 1 , wherein the content of xylylenediamine is 99.5% by mass or more. 6. The xylylenediamine composition according to claim 1 , which is used for a raw material for polyamide resin. 7. The xylylenediamine composition according to claim 1 , which is used for an epoxy resin curing agent. 8. A method for producing a polyamide resin comprising the steps of introducing a compound represented by the following general formula (1), a diamine comprising xylylenediamine (but excluding the compound represented by the general formula (1)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the compound represented by the general formula (1) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine: wherein n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1. 9. The method for producing a polyamide resin according to claim 8 , wherein the compound represented by the general formula (1) is an aminoethylbenzylamine represented by the following formula (a): 10. The method for producing a polyamide resin according to claim 8 , wherein the dicarboxylic acid is at least one selected from an aliphatic dicarboxylic acid having 4 to 20 carbon atoms, terephthalic acid, and isophthalic acid. 11. The method for producing a polyamide resin according to claim 8 , wherein the content of xylylenediamine in the xylylenediamine-containing diamine is 70 mol % or more, and the content of the aliphatic dicarboxylic acid having 4 to 20 carbon atoms in the dicarboxylic acid is 50 mol % or more. 12. The method for producing a polyamide resin according to claim 10 , wherein the aliphatic dicarboxylic acid having 4 to 20 carbon atoms is at least one selected from adipic acid and sebacic acid. 13. The method for producing a polyamide resin according to claim 8 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 14. The method for producing a polyamide resin according to claim 8 , wherein the xylylenediamine is m-xylylenediamine. 15. The method for producing a polyamide resin according to claim 8 , further comprising a step of solid-phase polymerization.

Assignees

Inventors

Classifications

  • Solid state polycondensation · CPC title

  • Amines · CPC title

  • from at least two different diamines or at least two different dicarboxylic acids · CPC title

  • C08G69/28Primary

    Preparatory processes · CPC title

  • aromatic · CPC title

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What does patent US9637594B2 cover?
Provided are [1] a xylylenediamine composition containing xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a compound represented…
Who is the assignee on this patent?
Mitsubishi Gas Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G69/28. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 02 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).