Contact probe pin

US9625492B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9625492-B2
Application numberUS-201113883698-A
CountryUS
Kind codeB2
Filing dateNov 16, 2011
Priority dateNov 19, 2010
Publication dateApr 18, 2017
Grant dateApr 18, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a contact probe pin in which a carbon film having both of conductivity and durability is formed on a base material with a tip divided, wherein Sn adherence can be reduced as much as possible to be able to maintain stable electrical contact over a long period of time, even under such circumstances that the temperature of a usage environment becomes high. The present invention relates to a contact probe pin, including a tip divided into 2 or more projections and repeatedly coming into contact with a test surface at the projection, wherein a carbon film containing a metal element is formed at least on a surface of the projection, and a radius of curvature at an apex part of the projection is 30 μm or more.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for measuring electrical property of a semiconductor element, the method comprising: contacting a contact probe pin with a test surface of the semiconductor element, wherein the contact probe pin comprises a tip divided into two or more projections each having an apex part with an apical radius of curvature of 30 μm or more and 100 μm or less, at least a surface of each said projection is coated with a film comprising carbon and a metal element, and a contact angle between contacted surfaces is 45° or less when said contacting between the apex part of each projection and the test surface occurs while a load of from 5 to 40 g is applied. 2. The method of claim 1 , wherein said contacting occurs at a temperature of at least 85° C. 3. The method of claim 1 , wherein said contacting occurs at a temperature of at least 90° C. 4. The method of claim 1 , wherein said contacting occurs at a temperature of 130° C. 5. The method of claim 1 , wherein the test surface comprises Sn. 6. The method of claim 1 , wherein the tip is divided into three projections. 7. The method of claim 1 , wherein the tip is divided into four to eight projections. 8. The method of claim 1 , wherein the apical radius of curvature is from 30 μm to 50 μm. 9. The method of claim 1 , wherein the apical radius of curvature is from 50 μm to 100 μm. 10. The method of claim 1 , wherein said film has a metal content ranging from 5 to 30 atomic %. 11. The method of claim 1 , wherein the metal element is at least one selected from the group consisting of W, Ta, Mo, Nb, Ti and Cr. 12. The method of claim 1 , wherein said film comprises an elemental metal mixed with carbon. 13. The method of claim 1 , wherein said film comprises a metal carbide. 14. The method of claim 1 , wherein said film comprises tungsten or tungsten carbide. 15. The method of claim 1 , wherein said film is at east 0.1 μm thick. 16. The method of claim 1 , wherein said film has a thickness of from 0.1 μm to 5 μm.

Assignees

Inventors

Classifications

  • related to layers · CPC title

  • characterised by the material, e.g. plating, or coating materials · CPC title

  • related to tip portion · CPC title

  • G01R1/067Primary

    Measuring probes · CPC title

Patent family

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Frequently asked questions

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What does patent US9625492B2 cover?
The present invention provides a contact probe pin in which a carbon film having both of conductivity and durability is formed on a base material with a tip divided, wherein Sn adherence can be reduced as much as possible to be able to maintain stable electrical contact over a long period of time, even under such circumstances that the temperature of a usage environment becomes high. The presen…
Who is the assignee on this patent?
Hirano Takayuki, Kobori Takashi, Kobe Steel Ltd, and 1 more
What technology area does this patent fall under?
Primary CPC classification G01R1/06738. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).