Semiconductor wafer processing tool with improved leak check
US-2024084445-A1 · Mar 14, 2024 · US
US9625349B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9625349-B2 |
| Application number | US-201213482639-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 29, 2012 |
| Priority date | Feb 29, 2012 |
| Publication date | Apr 18, 2017 |
| Grant date | Apr 18, 2017 |
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The claimed method and system provide a process control device monitoring system and a process control valve assembly with a process control device monitoring system to measure one or more operating states of a process control device. The process control device monitoring system may also associate a time-stamp with the one or more measured operating states of the process control device in response to a trigger generated based on the one or more measured operating states. The process control device monitoring system may also transmit the time-stamp and an indication of the one or more operating states to a monitoring device.
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What is claimed is: 1. A method in a process control device monitoring system, the method comprising: measuring, in the process control device monitoring system, one or more operating states of a process control device; associating, in the process control device monitoring system, a time-stamp with the one or more measured operating states of the process control device at a point in time when a fugitive emission, to a surrounding atmosphere, begins to occur, wherein the time-stamp is associated with the one or more operating states in response to a trigger that is generated based on the one or more measured operating states, and wherein the trigger is indicative that the fugitive emission has occurred; and transmitting the time-stamp and an indication of the one or more operating states to a monitoring device that quantifies an amount of fugitive emissions based on the time-stamp and the indication of the one or more operating states, wherein the time-stamp is associated with data from a position sensor in response to a trigger that is representative of a change in the data from the position sensor, a minimum value of the data from the position sensor, or a maximum value of the data from the position sensor. 2. The method of claim 1 , wherein the process control device is a process control valve. 3. The method of claim 2 , wherein the one or more operating states include one of the group consisting of an activation state of the process control valve, a position state of the process control valve, a leakage state in the process control valve, a total displacement of the process control valve, an amount of time the process control valve was not fully closed, and an indication of process control valve simmering. 4. The method of claim 3 , wherein the position state comprises a position of the process control valve at different times during an activation state. 5. The method of claim 3 , wherein the position state comprises an offset position of the process control valve from a fully closed position. 6. The method of claim 3 , wherein the position state comprises an offset position of the process control valve from a fully opened position. 7. The method of claim 1 , wherein the time-stamp is a start time, an end time, or a duration. 8. The method of claim 1 , wherein the time-stamp is an absolute time or a relative time. 9. The method of claim 1 further comprising associating a time-stamp with each of a respective one of the one or more measured operating states. 10. The method of claim 1 , wherein the trigger is a change in the one or more measured operating states, a minimum value of the one or more measured operating states, or a maximum value of the one or more measured operating states. 11. The method of claim 1 , wherein transmitting the time-stamp and the indication of the one or more operating states to the monitoring device includes forming a data unit having a header field with data unit routing information and payload fields including one or more of a sequence number, a time-stamp, a valve position, a valve volume flow rate, valve simmer data, and a checksum or CRC. 12. The method of claim 1 , wherein the method is executed in response to a request from an external device. 13. The method of claim 1 further comprising receiving a request for operating state data, wherein transmitting the time-stamp and the indication of the one or more operating states to the monitoring device is in response to the request for operating state data. 14. The method of claim 1 , wherein the time-stamp and the indication of the one or more operating states are transmitted to the monitoring device at a periodic rate. 15. The method of claim 1 , wherein transmitting the time-stamp and the indication of the one or more operating states to the monitoring device includes transmitting the time-stamp and the indication of the one or more operating states according to a protocol including one of TCP/IP, UDP/IP, HART, Fieldbus, PROFIBUS, WORLDFIP, Device-Net, AS-Interface, and CAN. 16. A process control valve assembly comprising: a valve to control a process; a position sensor to measure a position of a portion of the valve; a valve, monitoring system to receive data from the position sensor, wherein the valve monitoring system is configured to associate a time-stamp with the data from the position sensor, at a point in time when a fugitive emission, to a surrounding atmosphere, begins to occur, wherein the valve monitoring system comprises a processor and a non-transitory computer-readable medium with instructions executable by the processor of the valve monitoring system to quantify an amount of fugitive emissions based on the time-stamp and the data from the position sensor; and a communications interface for transmitting data, from the valve monitoring system that is representative of the amount of fugitive emissions, wherein the time-stamp is associated with the data from the position sensor in response to a trigger that is representative of a change in the data from the position sensor, a minimum value of the data from the position sensor, or a maximum value of the data from the position sensor. 17. The process control valve assembly of claim 16 , wherein the time-stamp is a start time, an end time, or a duration. 18. The process control valve assembly of claim 16 , wherein the time-stamp is an absolute time or a relative time. 19. The process control valve assembly of claim 16 further comprising a process variable sensor to measure the process, wherein the valve monitoring system is configured to receive data from the process variable sensor and associate a time-stamp with the data from the process variable sensor in response to a trigger. 20. The process control valve assembly of claim 19 , wherein the trigger is a change in the data from the process variable sensor or the position sensor, a minimum value of the data from the process variable sensor or the position sensor, or a maximum value of the data from the process variable sensor or the position sensor. 21. The process control valve assembly of claim 16 , wherein the data transmitted from the valve monitoring system includes one of the group consisting of an activation of the valve, a position of a portion of the valve at different points within an activation cycle of the valve, a position of the valve when the valve should be at a fully closed position, an indication of a leak in the valve, an indication of the total displacement of a portion of the valve, an indication of an amount of time the valve was not fully closed, and an indication of valve simmering. 22. The process control valve assembly of claim 16 , wherein the communications interface is configured to transmit data according to a protocol including one of TCP/IP, UDP/IP, HART, Fieldbus, PROFIBUS, WORLDFIP, Device-Net, AS-Interface, and CAN. 23. The valve assembly of claim 16 further comprising: a valve actuator to change a position associated with the valve; a valve position controller to control the valve actuator; and a process controller to receive commands to cause the valve position controller to control the valve actuator in response to the commands.
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for valves · CPC title
for valves (G01M3/30 takes precedence) · CPC title
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