Method of forming film

Patent metadata

Field	Value
Publication number	US-9623439-B2
Application number	US-201214349941-A
Country	US
Kind code	B2
Filing date	Oct 19, 2012
Priority date	Oct 24, 2011
Publication date	Apr 18, 2017
Grant date	Apr 18, 2017

Abstract

Provided is a method of manufacturing a film, including: applying, onto a substrate, a photocurable composition containing a polymerizable monomer, a photopolymerization initiator, and a photosensitive gas generator that generates a gas through light stimulation to form an applied film; bringing a mold into contact with the applied film; irradiating the applied film with light through the mold to cure the applied film and to generate the gas in the applied film; and releasing the mold from the applied film after the irradiation of the applied film with the light to form a film (cured film) having a predetermined pattern shape on the substrate, in which in the irradiation of the applied film with the light, a reaction rate of a polymerization reaction of the polymerizable monomer in the applied film is higher than a reaction rate of a gas-generating reaction of the photosensitive gas generator in the applied film.

First claim

The invention claimed is:

1. A method of manufacturing a film, comprising:
applying, onto a substrate, a photocurable composition containing a polymerizable monomer, a photopolymerization initiator, and a photosensitive gas generator that generates a gas through light stimulation to form an applied film;
bringing a mold into contact with the applied film;
irradiating the applied film with light through the mold to cure the applied film and to generate the gas in the applied film; and
releasing the mold from the applied film after the irradiation of the applied film with the light to form a film having a predetermined pattern shape on the substrate,
wherein in the irradiation of the applied film with the light, a reaction rate of a polymerization reaction of the polymerizable monomer in the applied film is higher than a reaction rate of a gas-generating reaction of the photosensitive gas generator in the applied film, and
wherein the photosensitive gas generator comprises a molecule with a repeating unit of an ethylene oxide group at a non-terminal location.

2. The method according to claim 1 , wherein:
the photopolymerization initiator in the photocurable composition comprises 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone;
the photosensitive gas generator in the photocurable composition comprises a 1,2-naphthoquinonediazide-5-sulfonic acid amide-based compound; and
the light with which the applied film is irradiated has a wavelength of 313±5 nm.

3. The method according to claim 1 , wherein:
the photopolymerization initiator in the photocurable composition comprises 2-hydroxy-2-methyl-1-phenyl-propan-1-one;
the photosensitive gas generator in the photocurable composition comprises a 1,2-naphthoquinonediazide-5-sulfonic acid amide-based compound; and
the light with which the applied film is irradiated has a wavelength of 254±5 nm.

4. The method according to claim 1 , wherein:
the photopolymerization initiator in the photocurable composition comprises 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone;
the photosensitive gas generator in the photocurable composition comprises a 1,2-naphthoquinonediazide-5-sulfonic acid amide-based compound; and
the light with which the applied film is irradiated has a wavelength of 313±5 nm or 254±5 nm.

5. A method of manufacturing a substrate with a circuit, comprising processing a substrate with a film obtained by the manufacturing method according to claim 1 as a mask to form a circuit on the substrate.

6. A method of manufacturing an optical component including:
a substrate; and
a member provided on the substrate and having a predetermined pattern shape,
the method comprising manufacturing the member by the manufacturing method according to claim 1 .

7. The method according to claim 1 , wherein a viscosity of the photocurable composition is 6 cP to 20 cP.

8. The method according to claim 1 , wherein a weight ratio of the photosensitive gas generator to the photocurable composition is 5/102 or more.

Assignees

• Canon Kk

Inventors

• Ito Toshiki
• Matsufuji Naoko
• Kawahata Kanae

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B05D3/06 Primary

  by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141}) · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F7/027

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title