Method of forming a light-emitting device

US9620732B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9620732-B2
Application numberUS-201614993355-A
CountryUS
Kind codeB2
Filing dateJan 12, 2016
Priority dateJan 16, 2015
Publication dateApr 11, 2017
Grant dateApr 11, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of forming a light-emitting device comprises: forming patterned portions of precursor material over a substrate, the edges of the patterned portions defining sidewalls; performing a shaping control process on the patterned portions of precursor material to control the sidewall profile to reduce the angle the sidewalls of the precursor material make with the substrate to less than 15 degrees; selectively applying from solution a conductive coating onto the portions of shaped precursor material so as to form a plurality of first conducting contacts such that an upper surface of said conductive coating follows the sidewall profile of the precursor material; forming a light-emitting layer over the conductive contacts and substrate, and forming a plurality of second conducting contacts over the light-emitting layer. The precursor material may comprises an activator catalyst and the conductive coating comprises a metal selectively applied to the shaped precursor material by electroless plating.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of forming a light-emitting device, the method comprising: providing a planar substrate; forming patterned portions of precursor material over the substrate, the edges of the patterned portions of precursor material defining sidewalls; performing a shaping control process on the patterned portions of precursor material to control the sidewall profile of the precursor material to reduce the angle the sidewalls of the precursor material make with the planar substrate to less than 15 degrees; selectively applying from solution a conductive coating onto the portions of shaped precursor material so as to form a plurality of first conducting contacts such that an upper surface of said conductive coating follows the sidewall profile of the precursor material; forming a light-emitting layer over the conductive contacts and substrate, and forming a plurality of second conducting contacts over the light-emitting layer. 2. A method as claimed in claim 1 , wherein the precursor material comprises a light-curable material and an activator, and the formation of the portions of precursor material comprises exposing said portions to light prior to the application of said conductive coating. 3. A method as claimed in claim 2 , wherein the light-curable material comprises one of a monomer based on an acrylate functional group and a monomer based on a methacrylate functional group. 4. A method as claimed in claim 1 , wherein the patterned portions of precursor material are formed by photolithography. 5. A method as claimed in claim 1 , wherein the patterned portions of precursor material are formed by printing. 6. A method as claimed in claim 2 , wherein the light-curable material acts as a negative photoresist and the shaping control process comprises a proximity exposure, whereby a photomask used to selectively expose said portions of precursor material is held at a distance from the substrate during said photolithography. 7. A method as claimed in claim 1 , wherein the precursor material comprises an activator catalyst and the conductive coating comprises a metal selectively applied to the shaped precursor material by electroless plating. 8. A method as claimed in claim 1 wherein the shaping control process comprises a reflow bake. 9. A method as claimed in claim 1 , wherein the sidewall of the precursor material makes an angle with the planar substrate of less than or equal to five degrees. 10. A method as claimed in claim 1 , wherein the portions of precursor material are each formed having a ratio of width to height being less than or equal to 0.007 in the plane of said sidewall profile. 11. A method as claimed in claim 1 , wherein the conducting coating comprises at least one of silver, copper, nickel, gold and Ni:P. 12. A method as claimed in claim 1 , wherein the light-emitting layer comprises an electroluminescent organic material.

Assignees

Inventors

Classifications

  • of conductive or resistive materials · CPC title

  • Anodes · CPC title

  • H10K71/60Primary

    Forming conductive regions or layers, e.g. electrodes · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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What does patent US9620732B2 cover?
A method of forming a light-emitting device comprises: forming patterned portions of precursor material over a substrate, the edges of the patterned portions defining sidewalls; performing a shaping control process on the patterned portions of precursor material to control the sidewall profile to reduce the angle the sidewalls of the precursor material make with the substrate to less than 15 de…
Who is the assignee on this patent?
Cambridge Display Tech Ltd
What technology area does this patent fall under?
Primary CPC classification H10K71/60. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).