Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9618859-B2
Application number	US-201314375457-A
Country	US
Kind code	B2
Filing date	Jan 25, 2013
Priority date	Jan 30, 2012
Publication date	Apr 11, 2017
Grant date	Apr 11, 2017

Abstract

A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

First claim

What is claimed is:

1. A lithographic apparatus component comprising:
channels configured to allow a temperature control medium to flow through the lithographic apparatus component, wherein:
a first one of the channels is configured to allow a first portion of the temperature control medium to flow that has a first temperature, and
a second one of the channels is configured to allow a second portion of the temperature control medium to flow that has a second temperature; and

a control system configured to control the first and second temperatures to deform first and second surfaces of the lithography apparatus component, wherein:
the first and second surfaces are opposite to each other; and
the first and second ones of the channels are positioned between the first and second surfaces.

2. The lithographic apparatus component as claimed in claim 1 , wherein:
the temperature control medium comprises a two phase medium; and
the channels are configured to operate as heat pipes.

3. The lithographic apparatus component as claimed in claim 2 , wherein the two phase medium comprises carbon dioxide.

4. The lithographic apparatus component as claimed in claim 1 , wherein the control system is configured to control the first and second temperatures based on a measured deformation of the lithography apparatus component.

5. The lithographic apparatus component as claimed in claim 1 , wherein the channels are configured to run parallel to the first and second surfaces of the lithographic apparatus component.

6. The lithographic apparatus component as claimed in claim 1 , wherein the channels are grouped together in channel groups, each group being coupled to the control system.

7. The lithographic apparatus component as claimed in claim 1 , further comprising a deformation measurement system configured to measure a deformation of the lithography apparatus component, the deformation measurement system comprising a measurement bar having first and second ends, the first end being coupled to the lithography apparatus component and the second end being configured to move freely with respect to the lithography apparatus component.

8. The lithographic apparatus component as claimed in claim 1 , further comprising a deformation measurement system configured to measure a deformation of the lithography apparatus component, the deformation measurement system comprising:
a first electrode having first and second ends, the first end being coupled to a first portion of the lithography apparatus component and the second end being configured to move freely with respect to the lithography apparatus component; and
a second electrode coupled to a second portion of the lithography apparatus component,
wherein the deformation measurement system is configured to determine a displacement between the first and second electrodes to determine a deformation of the lithography apparatus component.

9. The lithographic apparatus component as claimed in claim 1 , further comprising an interferometer configured to measure a deformation of the lithography apparatus component.

10. The lithographic apparatus component as claimed in claim 1 , further comprising a deformation measurement system configured to measure a deformation of the lithography apparatus component,
wherein the control system is configured to adjust a pressure of the temperature control medium to adjust the first and second temperatures based on the measured deformation by the deformation measurement system.

11. The lithographic apparatus component as claimed in claim 1 , comprising a metrology system.

12. The lithographic apparatus component as claimed in claim 11 , wherein the control system is configured to control the first and second temperatures based on a response from another control system.

13. The lithographic apparatus component as claimed in claim 1 , comprising an optical element.

14. The lithographic apparatus component as claimed in claim 13 , wherein the optical element comprises a mirror.

15. The lithographic apparatus component as claimed in claim 1 , wherein the control system is configured to control the first and second temperatures only in regions of the lithography apparatus component corresponding to image formation regions of the lithography apparatus component.

16. The lithographic apparatus component as claimed in claim 1 , wherein:
the control system is configured to control the first and second temperatures based on a feedback control signal; and
the feedback control signal corresponds to a parameter error of an image.

17. The lithographic apparatus component as claimed in claim 1 , wherein the control system comprises 1+n pressure control loops configured to control deformation of the lithography apparatus component with n degrees of freedom, n being an integer.

18. A lithographic apparatus comprising:
a substrate table configured to hold a substrate;
a projection system configured to image a pattern onto the substrate; and
a component comprising:
channels configured to allow a temperature control medium to flow through the component, wherein:
a first one of the channels is configured to allow a first portion of the temperature control medium to flow that has a first temperature, and
a second one of the channels is configured to allow a second portion of the temperature control medium to flow that has a second temperature; and

a control system configured to control the first and second temperatures to deform first and second surfaces of the lithography apparatus component, wherein:
the first and second surfaces are opposite to each other; and
the first and second ones of the channels are positioned between the first and second surfaces.

19. The lithographic apparatus as claimed in claim 18 , wherein the component further comprises a deformation measurement system configured to measure a deformation of the component, the deformation measurement system comprising a measurement bar having first and second ends, the first end being coupled to the component and the second end being configured to move freely with respect to the component.

20. The apparatus as claimed in claim 18 , wherein the control system is configured to control the first and second temperatures only in regions of the component corresponding to image formation regions of the component.

Assignees

• Asml Netherlands Bv

Inventors

• Koevoets Adrianus Hendrik
• Donders Sjoerd Nicolaas Lambertus
• Van Schoot Jan Bernard Plechelmus
• Zaal Koen Jacobus Johannes Maria
• Cadee Theodorus Petrus Maria

Classifications

• G03F7/70858

  Environment aspects, e.g. pressure of beam-path gas, temperature (pollution aspects G03F7/70916) · CPC title

• G03F7/70775

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• G03F7/70891 Primary

  Temperature · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title