Display substrate and display panel in each of which distance from convex structure to a substrate and distance from alignment layer to the substrate has preset difference therebetween
US-12164187-B2 · Dec 10, 2024 · US
US9618812B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9618812-B2 |
| Application number | US-201414173636-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 5, 2014 |
| Priority date | Sep 30, 2013 |
| Publication date | Apr 11, 2017 |
| Grant date | Apr 11, 2017 |
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Provided are a liquid crystal display and a method of fabricating the liquid crystal display. The liquid crystal display comprises: a substrate; a signal electrode on the substrate; a first light-blocking pattern on the signal electrode and having a trench extending to and exposing at least part of the signal electrode; and a second light-blocking pattern on the trench of the first light-blocking pattern and covering the signal electrode, wherein the second light-blocking pattern comprises at least one metal layer.
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What is claimed is: 1. A liquid crystal display (LCD) comprising: a substrate; a signal electrode on the substrate; a first light-blocking pattern on the signal electrode, the first light-blocking pattern having a trench extending to at least part of the signal electrode; and a second light-blocking pattern on the trench of the first light-blocking pattern and covering the signal electrode, wherein the second light-blocking pattern comprises at least one metal layer; color filters on the same layer as the first light-blocking pattern on the substrate; a first electrode on each of the color filters; a second electrode on the first electrode and insulated from the first electrode and defining a cavity between the second electrode and the first electrode; a first capping layer which is formed between the color filters and the first electrode to cover the color filters, the first light-blocking pattern and the signal electrode; and a first passivation layer between the first capping layer and the first electrode along the first capping layer. 2. The LCD of claim 1 , further comprising a thin-film transistor on the substrate and comprising a gate electrode, a source electrode and a drain electrode, wherein the signal electrode is any one of the source electrode and the drain electrode. 3. The LCD of claim 1 , wherein the metal layer is formed of any one of Cr, CrOx, IZO, Ti, Al and Ni. 4. The LCD of claim 1 , wherein the second light-blocking pattern comprises a low-reflective metal layer, wherein the low-reflective metal layer comprises a Ti-containing first metal layer and an IZO-containing second metal layer formed on the first metal layer. 5. The LCD of claim 1 , wherein the first light-blocking pattern is formed of light-blocking organic matter. 6. The LCD of claim 1 , wherein a height of the second light-blocking pattern from a flat surface of the first passivation layer is equal to or less than one tenth of a height of the cavity from the flat surface of the first passivation layer. 7. The LCD of claim 1 , further comprising: a cover layer on the second electrode; a liquid crystal layer comprising liquid crystal molecules in the cavity; an entrance of the cavity; and a sealing layer sealing the entrance of the cavity. 8. The LCD of claim 1 , wherein the second light-blocking pattern is conformally along inner walls of the trench. 9. The LCD of claim 1 , wherein the second light-blocking pattern fills at least part of the trench. 10. A method of fabricating a LCD comprising: forming a signal electrode on a substrate; forming a first light-blocking pattern, which has a trench extending to at least part of the signal electrode, on the signal electrode; forming a second light-blocking pattern, which covers the signal electrode and comprises at least one metal layer, on the trench of the first light-blocking pattern; forming color filters on the same layer as the first light-blocking pattern on the substrate; forming a first electrode on each of the color filters; forming a second electrode on the first electrode to be insulated from the first electrode and define a cavity between the second electrode and the first electrode; forming a first capping layer between the color filters and the first electrode to cover the color filters, the first light-blocking pattern and the signal electrode; and forming a first passivation layer between the first capping layer and the first electrode along the first capping layer. 11. The method of claim 10 , wherein the forming of the second light-blocking pattern comprises forming the metal layer using any one of Cr, CrOx, IZO, Ti, Al and Ni. 12. The method of claim 10 , wherein the forming of the second light-blocking pattern comprises forming the second light-blocking pattern to comprise a low-reflective metal layer. 13. The method of claim 12 , wherein the forming of the second light-blocking pattern to comprise the low-reflective metal layer comprises forming a Ti-containing first metal layer on the trench of the first light-blocking pattern and forming an IZO-containing second metal layer on the first metal layer. 14. The method of claim 10 , wherein the forming of the second light-blocking pattern is performed using a photolithography process or a printing process. 15. The method of claim 10 , wherein the forming of the second light-blocking pattern comprises forming the second light-blocking pattern such that a height of the second light-blocking pattern from a flat surface of the first passivation layer is equal to or less than one tenth of a height of the cavity from the flat surface of the first passivation layer. 16. The method of claim 10 , further comprising: forming a cover layer on the second electrode; forming an entrance of the cavity; and forming a liquid crystal layer by injecting liquid crystal molecules into the cavity through the entrance of the cavity. 17. The method of claim 16 , wherein the cavity is formed between the first electrode and the second electrode by forming a sacrificial layer on the first electrode, forming the second electrode and a second passivation layer on the sacrificial layer, forming the cover layer on the second passivation layer, and removing the sacrificial layer. 18. The method of claim 16 , further comprising forming a sealing layer which seals the entrance of the cavity.
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