Compositions and methods for well completions

US9617461B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9617461-B2
Application numberUS-96089710-A
CountryUS
Kind codeB2
Filing dateDec 6, 2010
Priority dateDec 6, 2010
Publication dateApr 11, 2017
Grant dateApr 11, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Well-cementing compositions for use in high-pressure, high-temperature (HPHT) wells usually contain a complex array of cement additives, including retarders, dispersants and fluid-loss additives. Under these extreme conditions additive degradation, reactions between additives, reactions between additives and the cement, or combinations thereof may occur—causing slurry gelation, premature setting or both. Incorporation of organoamine compounds in the cement compositions may help prevent or reduce the severity of slurry gelation, setting-time reduction or both.

First claim

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The invention claimed is: 1. A method for controlling the rheological properties, the setting time, or both of a cement slurry, comprising: (i) providing a cement slurry comprising water and Portland cement; and (ii) incorporating one or more organoamine compounds, one or more retarders, one or more borate compounds and at least one fluid-loss additive in the slurry simultaneously during slurry mixing, wherein the one or more organoamine compounds is present at a concentration between 0.2 L/tonne and 5.0 L/tonne of cement slurry, and the one or more organoamine compounds prevents formation of a quaternary gel in the cement slurry, wherein the organoamine compounds are one or more members selected from the group consisting of monoethanolamine, diethanolamine, monoisopropanolamine, diisopropanolamine, monoethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenehexamine, and tetraethylenepentamine, wherein the cement slurry has a temperature between 260° C. and 302° C. 2. The method of claim 1 , wherein the one or more retarders comprises a copolymer of styrene sulfonate and maleic acid, one or more organophosphonate compounds, or both; wherein the organophosphonate compounds comprise one or more members of the group consisting of amino trimethylene phosphonic acid; 1-hydroxyethylidene-1,1,-disphosphonic acid; ethylene diamine tetramethylene phosphonic acid, hexamethylenediamine methylene phosphonic acid, diethylene triamine pentamethylene phosphonic acid; polyamino phosphonic acid, 2-phosphono-butane-tricarboxylic acid-1,2,4; bis(hexamethylene triamine pentamethylene phosphonic acid) and salts thereof. 3. The method of claim 1 , wherein the at least one fluid-loss additive comprises a copolymer of 2-acrylamido-2-methylpropane sulfonic acid and acrylamide, or a copolymer of 2-acrylamido-2-methylpropane sulfonic acid and acrylic acid, or both. 4. The method of claim 1 , wherein the borate compounds comprise boric acid, sodium metaborate, potassium metaborate, sodium diborate, potassium diborate, sodium triborate, potassium triborate, sodium tetraborate, potassium tetraborate, sodium pentaborate, or potassium pentaborate, or mixtures thereof. 5. A method for cementing a subterranean well, comprising: (i) providing a cement slurry comprising water and Portland cement; (ii) incorporating one or more organoamine compounds, one or more retarders, one or more borate compounds and at least one fluid-loss additive in the slurry simultaneously during slurry mixing; and (iii) placing the slurry in the well, wherein the one or more organoamine compounds is present at a concentration between 0.2 L/tonne and 5.0 L/tonne of cement slurry, and the one or more organoamine compounds prevents formation of a quaternary gel in the cement slurry wherein the organoamine compounds are one or more members selected from the group consisting of monoethanolamine, diethanolamine, monoisopropanolamine, diisopropanolamine, monoethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenehexamine, and tetraethylenepentamine, wherein the cement slurry attains a temperature between 260° C. and 302° C. during placement in the well. 6. The method of claim 5 , wherein the one or more retarders comprises a copolymer of styrene sulfonate and maleic acid, one or more organophosphonate compounds, or both; wherein the organophosphonate compounds comprise one or more members selected from the group consisting of amino trimethylene phosphonic acid; 1-hydroxyethylidene-1,1,-disphosphonic acid; ethylene diamine tetramethylene phosphonic acid, hexamethylenediamine methylene phosphonic acid, diethylene triamine pentamethylene phosphonic acid; polyamino phosphonic acid, 2-phosphono-butane-tricarboxylic acid-1,2,4; bis(hexamethylene triamine pentamethylene phosphonic acid) and salts thereof. 7. The method of claim 5 , wherein the at least one fluid-loss additive comprises a copolymer of 2-acrylamido-2-methylpropane sulfonic acid and acrylamide, or a copolymer of 2-acrylamido-2-methylpropane sulfonic acid and acrylic acid, or both. 8. The method of claim 5 , wherein the borate compounds comprise boric acid, sodium metaborate, potassium metaborate, sodium diborate, potassium diborate, sodium triborate, potassium triborate, sodium tetraborate, potassium tetraborate, sodium pentaborate, or potassium pentaborate, or mixtures thereof.

Assignees

Inventors

Classifications

  • Deflocking agents · CPC title

  • obtained by reactions only involving carbon-to-carbon unsaturated bonds · CPC title

  • Defoamers, air detrainers · CPC title

  • Water-loss or fluid-loss reducers, hygroscopic or hydrophilic agents, water retention agents · CPC title

  • Organo-silicon compounds · CPC title

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What does patent US9617461B2 cover?
Well-cementing compositions for use in high-pressure, high-temperature (HPHT) wells usually contain a complex array of cement additives, including retarders, dispersants and fluid-loss additives. Under these extreme conditions additive degradation, reactions between additives, reactions between additives and the cement, or combinations thereof may occur—causing slurry gelation, premature settin…
Who is the assignee on this patent?
Nelson Erik, Pyatina Tatiana, Komocki Sylwia, and 1 more
What technology area does this patent fall under?
Primary CPC classification C09K8/487. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).