MOS devices with ultra-high dielectric constants and methods of forming the same

Patent metadata

Field	Value
Publication number	US-9614079-B2
Application number	US-201414245785-A
Country	US
Kind code	B2
Filing date	Apr 4, 2014
Priority date	Apr 4, 2014
Publication date	Apr 4, 2017
Grant date	Apr 4, 2017

Abstract

An integrated circuit structure includes a semiconductor substrate, and a gate stack over the semiconductor substrate. The gate stack includes a high-k gate dielectric over the semiconductor substrate, and a magnetic compound over and in contact with the high-k gate dielectric. A source region and a drain region are on opposite sides of the gate stack. The gate stack, the source region, and the drain region are portions of a Metal-Oxide-Semiconductor (MOS) device.

First claim

What is claimed is:

1. An integrated circuit structure comprising:
a semiconductor substrate;
a Metal-Oxide-Semiconductor (MOS) device comprising:
a gate stack over the semiconductor substrate, the gate stack having two substantially vertical outer sidewalls opposing to each other, wherein the gate stack comprises:
a gate dielectric over the semiconductor substrate; and
a magnetic layer over the gate dielectric, wherein the magnetic layer is between the two substantially vertical outer sidewalls.

2. The integrated circuit structure of claim 1 , wherein the magnetic layer is configured to generate a magnetic field penetrating through the gate dielectric in a direction perpendicular to a major surface plane of the gate dielectric.

3. The integrated circuit structure of claim 1 , wherein the magnetic layer comprises FePt or NiFe.

4. The integrated circuit structure of claim 3 , wherein the magnetic layer comprises FePt.

5. The integrated circuit structure of claim 1 , wherein the magnetic layer comprises a first substantially vertical portion and a second substantially vertical portion having magnetic fields opposing to each other.

6. The integrated circuit structure of claim 1 , wherein the gate dielectric comprises a high-k dielectric material comprising BaTiO 3 , CoFe 2 O 4 , YFeO 3 , CdCr 2 S 4 , TbMnO 3 , or BiFeO 3 .

7. The integrated circuit structure of claim 1 , wherein the gate dielectric is in physical contact with the magnetic layer.

8. An integrated circuit structure comprising:
a semiconductor substrate;
a gate stack over the semiconductor substrate, wherein the gate stack comprises:
a gate dielectric over the semiconductor substrate; and
a magnetic compound over the gate dielectric, wherein the magnetic compound is configured to generate a magnetic field perpendicular to a planar surface of the gate dielectric; and
a gate electrode, wherein the magnetic compound is between the gate electrode and the gate dielectric; and

a source region and a drain region on opposite sides of the gate stack.

9. The integrated circuit structure of claim 8 , wherein the gate dielectric comprises:
a bottom portion parallel to a top surface of the semiconductor substrate, wherein the magnetic field comprises a first portion perpendicular to and penetrating through the bottom portion of the gate dielectric; and
a sidewall portion perpendicular to the top surface of the semiconductor substrate, wherein the magnetic field comprises a second portion perpendicular to and penetrating through the sidewall portion of the gate dielectric.

10. The integrated circuit structure of claim 8 , wherein the magnetic compound comprises FePt or NiFe.

11. The integrated circuit structure of claim 10 , wherein the magnetic compound comprises FePt, and wherein an atomic percentage of platinum in the magnetic compound is in a range between about 20 percent and about 80 percent.

12. The integrated circuit structure of claim 1 further comprising:
a source region extending into the semiconductor substrate; and
a drain region extending into the semiconductor substrate.

13. The integrated circuit structure of claim 12 , wherein the gate dielectric and the magnetic layer overlaps a portion of the semiconductor substrate, and the source region and the drain region are on opposite sides of, and do not extend into, the portion of the semiconductor substrate.

14. The integrated circuit structure of claim 8 , wherein the source region and the drain region extend into the semiconductor substrate.

15. The integrated circuit structure of claim 8 , wherein the source region, the drain region, and the gate stack are parts of a transistor, and the transistor is configured to have a current flowing between the source region and the drain region, and in the semiconductor substrate.

Assignees

• Taiwan Semiconductor Mfg Co Ltd
• Univ Nat Taiwan

Inventors

• Liao Ming-Han
• Hong Minghwei

Classifications

• H10D64/01342

  by deposition, e.g. evaporation, ALD or laser deposition (H10D64/01344 takes precedence) · CPC title

• H01L29/78391 Primary

  Electricity · mapped topic

• H01L29/66545

  Electricity · mapped topic

• H01L29/165

  Electricity · mapped topic

• H01L29/7834

  Electricity · mapped topic