Replaceable upper chamber section of plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-9613834-B2
Application number	US-74814110-A
Country	US
Kind code	B2
Filing date	Mar 26, 2010
Priority date	Mar 27, 2009
Publication date	Apr 4, 2017
Grant date	Apr 4, 2017

Abstract

A replaceable upper chamber section of a plasma reaction chamber in which semiconductor substrates can be processed comprises a monolithic metal cylinder having a conical inner surface which is widest at a lower end thereof, an upper flange extending horizontally outward away from the conical inner surface and a lower flange extending horizontally away from the conical inner surface. The cylinder includes an upper annular vacuum sealing surface adapted to seal against a dielectric window of the plasma chamber and a lower annular vacuum sealing surface adapted to seal against a bottom section of the plasma chamber. A thermal mass at an upper portion of the cylinder is effective to provide azimuthal temperature uniformity of the conical inner surface. A thermal choke is located at a lower portion of the cylinder and is effective to minimize transfer of heat across the lower vacuum sealing surface.

First claim

What is claimed is:

1. A replaceable upper chamber section of a plasma reaction chamber in which semiconductor substrates can be processed, comprising:
a monolithic metal cylinder having a conical inner surface which has a largest diameter at a lower end thereof, an upper flange extending horizontally outward away from the conical inner surface and a lower flange extending horizontally away from the conical inner surface;
an upper annular vacuum sealing surface adapted to seal against a dielectric window of the plasma chamber;
a lower annular vacuum sealing surface adapted to seal against a bottom section of the plasma chamber;
a thermal choke at a lower portion of the cylinder effective to minimize transfer of heat across the lower vacuum sealing surface, the thermal choke defined by a thin metal section having a thickness of less than 0.25 inch and extending at least 25% of the length of the conical inner surface; and
a thermal mass section at an upper portion of the cylinder, the thermal mass section defined by a portion of the cylinder between the conical inner surface, an outer surface extending vertically from the upper flange, a horizontal surface extending from an upper end of the thermal choke, and the upper flange.

2. The replaceable upper chamber section of claim 1 , wherein the upper and lower vacuum sealing surfaces include at least one annular groove therein adapted to receive an O-ring.

3. The replaceable upper chamber section of claim 1 , wherein the upper flange includes a recessed surface extending horizontally at least 1inch from the outer surface and the upper vacuum sealing surface extends horizontally at least 1 inch, the outer surface is spaced from the conical inner surface by at least 1 inch at a lower end of the outer surface and the outer surface is spaced from the conical inner surface by at least 2 inches at an upper end of the outer surface.

4. The replaceable upper chamber section of claim 1 , wherein the outer surface is recessed and includes an alignment pin hole adapted to receive an alignment pin used to position a heating and cooling arrangement on the outer surface.

5. The replaceable upper chamber section of claim 1 , including at least one temperature probe mounting hole extending into the upper flange.

6. The replaceable upper chamber section of claim 1 , wherein the conical inner surface includes a plurality of mounting holes adapted to mount gas injectors therein.

7. The replaceable upper chamber section of claim 1 , wherein the upper flange includes mounting holes adapted to receive an RF coil mounting assembly which positions an RF coil above the dielectric window.

8. The replaceable upper chamber section of claim 1 , wherein the conical inner surface includes a thermally sprayed yttria coating thereon.

9. The replaceable upper chamber section of claim 1 , wherein the cylinder is anodized aluminum.

10. The replaceable upper chamber section of claim 1 , comprising:
a heating and cooling arrangement, which mounts around the outer surface.

11. The replaceable upper chamber section of claim 1 , wherein the upper annular vacuum sealing surface has a greater surface area than the lower annular vacuum sealing surface.

12. The replaceable upper chamber section of claim 1 , wherein the horizontal surface is spaced from the upper recessed surface by at least two inches.

13. The replaceable upper chamber section of claim 1 , wherein the thermal choke extends from the vacuum sealing surface to the thermal mass section of the cylinder.

14. A replaceable upper chamber section of a plasma reaction chamber in which semiconductor substrates can be processed, comprising:
a monolithic metal cylinder having a conical inner surface which has a largest diameter at a lower end thereof, an upper flange extending horizontally outward away from the conical inner surface and a lower flange extending horizontally away from the conical inner surface;
an upper annular vacuum sealing surface adapted to seal against a dielectric window of the plasma chamber, and a lower annular vacuum sealing surface adapted to seal against a bottom section of the plasma chamber, the upper annular vacuum sealing surface having a greater surface area than the lower annular vacuum sealing surface;
a thermal choke at a lower portion of the cylinder effective to minimize transfer of heat across the lower vacuum sealing surface, the thermal choke defined by a thin metal section having a thickness of less than 0.25 inch and extending at least 25% of the length of the conical inner surface; and
a thermal mass section at an upper portion of the cylinder, the thermal mass section defined by a portion of the cylinder between the conical inner surface, an outer surface extending vertically from the upper flange, a horizontal surface extending from an upper end of the thermal choke, and the upper flange, and wherein the thermal choke extends from the vacuum sealing surface to the thermal mass section of the cylinder.

15. The replaceable upper chamber section of claim 14 , wherein the upper and lower vacuum sealing surfaces include at least one annular groove therein adapted to receive an O-ring.

16. The replaceable upper chamber section of claim 14 , comprising:
a heating and cooling arrangement, which mounts around the outer surface.

17. The replaceable upper chamber section of claim 14 , wherein the conical inner surface includes a thermally sprayed yttria coating thereon.

18. The replaceable upper chamber section of claim 14 , wherein the cylinder is anodized aluminum.

Assignees

• Sharpless Leonard J
• Singh Harmeet
• Kang Michael S
• Lam Res Corp

Inventors

• Sharpless Leonard J
• Singh Harmeet
• Kang Michael S

Classifications

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0441

  Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

• H10P72/0421 Primary

  for drying etching · CPC title

• H01J37/32458

  Vessel · CPC title

• H01L21/67069 Primary

  Electricity · mapped topic