Method for producing metal oxide layers through arc vaporization

US9611538B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9611538-B2
Application numberUS-42925209-A
CountryUS
Kind codeB2
Filing dateApr 24, 2009
Priority dateApr 24, 2008
Publication dateApr 4, 2017
Grant dateApr 4, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The invention relates to a method for producing oxidic layers by means of PVD (physical vapor deposition), in particular by means of cathodic arc vaporization, wherein a powder-metallurgical target is vaporized and the powder-metallic target is formed of at least two metallic or semi-metallic components, the composition of the metallic or semi-metallic components of the target being chosen in such a manner that during heating in the transition from the room temperature into the liquid phase no phase boundary of purely solid phases, based on the phase diagram of a molten mixture of the at least two metallic or semi-metallic components, is crossed.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing oxidic layers by means of physical vapor deposition (PVD), comprising: forming a powder-metallurgical target comprising a composition from the group consisting of A1V, with Al ranging from 92 at % to 97 at % and V ranging from to 3 at % to 8 at %, and AlCr, with Al ranging from 80 at % to 90 at % and Cr ranging from 10 at % to 20 at %, the composition being chosen in such a manner that during heating in a transition from room temperature into a liquid phase no phase boundary of purely solid phases, based on a phase diagram of a molten mixture of the composition, is crossed; and vaporizing the powder-metallurgical target by means of cathodic arc vaporization in a reactive atmosphere comprising oxygen as reactive gas in order to produce the oxidic layers. 2. The method according to claim 1 , wherein the oxidic layer has a proportion of more than 70 at % aluminum oxide in corundum structure by using the powder-metallurgical target, and wherein the composition of the powder-metallurgical target has a transition into the liquid phase between 1000° C. and 1200° C. 3. The method according to claim 1 , wherein the powder-metallurgical target has particle sizes less than 300 μm. 4. The method according to claim 1 , wherein, when the oxidic layers include ternary or higher oxides stable at high temperature, the composition of the powder-metallurgical target is chosen in such a way that, according to the phase diagram of the molten mixture of the composition, with the transition into the liquid phase, a formation temperature is essentially determined. 5. The method according to claim 1 , wherein, while avoiding splatters, primary powders from phase mixtures are used for the forming of the powder-metallurgical target, each of the primary powders having a composition for which, during heating in the transition from the room temperature into the liquid phase, no phase boundaries of purely solid phases are crossed. 6. The method according to claim 3 , wherein the particle sizes are less than 200 μm. 7. The method according to claim 3 , wherein the particle sizes are less than 100 μm. 8. The method according to claim 1 , wherein the powder-metallurgical target consists essentially of the composition from the group consisting of A1V, with Al ranging from 92 at % to 97 at % and V ranging from to 3 at % to 8 at %, and AlCr, with Al ranging from 80 at % to 90 at % and Cr ranging from 10 at % to 20 at %.

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Classifications

  • Supplementary information concerning processes or compositions relating to powder metallurgy · CPC title

  • of aluminium, magnesium or beryllium · CPC title

  • Reactive sputtering · CPC title

  • Electric arc evaporation · CPC title

  • Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.] · CPC title

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What does patent US9611538B2 cover?
The invention relates to a method for producing oxidic layers by means of PVD (physical vapor deposition), in particular by means of cathodic arc vaporization, wherein a powder-metallurgical target is vaporized and the powder-metallic target is formed of at least two metallic or semi-metallic components, the composition of the metallic or semi-metallic components of the target being chosen in s…
Who is the assignee on this patent?
Ramm Jürgen, Widrig Beno, Oerlikon Surface Solutions Ag Pfaffikon
What technology area does this patent fall under?
Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).