Doped ultra-low expansion glass and methods for making the same

US9611169B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9611169-B2
Application numberUS-201514958024-A
CountryUS
Kind codeB2
Filing dateDec 3, 2015
Priority dateDec 12, 2014
Publication dateApr 4, 2017
Grant dateApr 4, 2017

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Abstract

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A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K 2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

First claim

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What is claimed is: 1. A doped silica-titania glass article, comprising: a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant, wherein the fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %, and further wherein the glass article has an expansivity slope of less than 0.5 ppb/K 2 at 20° C. 2. The article of claim 1 , wherein the silica-titania base glass contains 8 wt. % to 16 wt. % titania and the remainder silica. 3. The article of claim 1 , wherein the glass article has an expansivity slope of less than 0.25 ppb/K 2 at 20° C. 4. The article of claim 1 , wherein the glass article has a fictive temperature of less than 750° C. 5. The article of claim 1 , wherein the glass article has a first and a second zero crossover temperature between 0° C. and 100° C. and the maximum CTE between the zero crossover temperatures is less than 8 ppb/K. 6. A doped silica-titania glass article, comprising: a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant at a concentration of up to 5 wt. %, and (iii) an OH concentration of less than 100 ppm, wherein the glass article has an expansivity slope of less than 0.5 ppb/K 2 at 20° C. 7. The article of claim 6 , wherein the silica-titania base glass contains 8 wt. % to 16 wt. % titania and the remainder silica. 8. The article of claim 6 , wherein the glass article has an expansivity slope of less than 0.25 ppb/K 2 at 20° C. 9. The article of claim 6 , wherein the glass article has a fictive temperature of less than 750° C. 10. The article of claim 6 , wherein the glass article has a first and a second zero crossover temperature between 0° C. and 100° C. and the maximum CTE between the zero crossover temperatures is less than 8 ppb/K. 11. A method for making a doped silica-titania glass body, comprising the steps: preparing silica-titania soot particles using a silica precursor and a titania precursor; forming a soot blank from the soot particles; consolidating the soot blank in a furnace, wherein the consolidation step comprises: (a) heating the soot blank to more than 1200° C. in a flowing inert atmosphere, and (b) consolidating the blank at a peak temperature of more than 1250° C. under a flowing consolidation gas comprising helium- and oxygen-containing gases, and a doping gas comprising a fluorine-containing gas; sectioning the blank into at least one glass body; heating the at least one glass body to a crystal melting temperature of at least 1500° C.; and cooling the at least one glass body from the crystal melting temperature to room temperature, the step for cooling comprising a first annealing of the at least one glass body for about 2 hours to 2000 hours between 1050° C. and 700° C. at a first cooling rate between about 50° C./hour and 0° C./hour. 12. The method of claim 11 , further comprising the step: second annealing the at least one glass body after the first annealing, the second annealing comprising (i) heating the at least one glass body to an upper annealing temperature in the range of 800° C. to 1000° C. for about 0.5 to 2 hours, and (ii) cooling the at least one glass body from the upper annealing temperature to a lower annealing temperature in the range of 600° C. to 700° C. at a second cooling rate between about 50° C./hour and 0° C./hour, wherein the second annealing step is conducted during or after the step of cooling the at least one glass body from the crystal melting temperature to room temperature. 13. The method of claim 11 , wherein the concentration of the fluorine-containing gas is set to obtain up to about 5% by weight of fluorine in the at least one glass body. 14. The method of claim 11 , wherein the step for preparing silica-titania soot particles further comprises using at least one oxide dopant precursor selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides to obtain at a total oxide concentration in the at least one glass body from 50 ppm to 6 wt. %. 15. The method of claim 11 , wherein the at least one glass body has an expansivity slope of less than 0.5 ppb/K 2 at 20° C. after the cooling step. 16. A method for making a doped silica-titania glass body, comprising the steps: preparing silica-titania soot particles using a silica precursor and a titania precursor; forming a soot blank from the soot particles; consolidating the soot blank in a furnace, wherein the consolidation step comprises: (a) heating the soot blank to more than 1200° C. in a flowing inert atmosphere, and (b) consolidating the blank at a peak temperature of more than 1250° C. under a flowing consolidation gas comprising helium- and oxygen-containing gases sectioning the blank into at least one glass body; heating the at least one glass body to a crystal melting temperature of at least 1500° C.; diffusing an alkali dopant at a concentration of 0.04 wt. % to 1.4 wt. % by alkali oxide into the at least one glass body at or above 500° C. after the step of heating the at least one glass body to a crystal melting temperature; and cooling the at least one glass body from the crystal melting temperature to room temperature, the step for cooling comprising a first annealing of the at least one glass body for about 2 hours to 2000 hours between 1050° C. and 700° C. at a first cooling rate that is set between about 50° C./hour and 0° C./hour. 17. The method of claim 16 , further comprising the step: second annealing the at least one glass body after the first annealing, the second annealing comprising (i) heating the at least one glass body to an upper annealing temperature in the range of 800° C. to 1000° C. for about 0.5 to 2 hours, and (ii) cooling the at least one glass body from the upper annealing temperature to a lower annealing temperature in the range of 600° C. to 700° C. at a second cooling rate between about 50° C./hour and 0° C./hour, wherein the second annealing step is conducted during or after the step of cooling the at least one glass body from the crystal melting temperature to room temperature. 18. The method of claim 16 , wherein the step for preparing silica-titania soot particles further comprises using at least one dopant precursor selected from the group consisting of B-, halogen-, OH-, Mn-, and alkaline earth-containing precursors. 19. The method of claim 16 , wherein the flowing consolidation gas further comprises a halogen-containing gas. 20. The method of claim 16 , wherein the at least one glass body has an expansivity slope of less than 1.3 ppb/K 2 at 20° C. after the cooling step.

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What does patent US9611169B2 cover?
A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li ox…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03C4/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).