Micro led display panel
US-2024371838-A1 · Nov 7, 2024 · US
US9608163B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9608163-B2 |
| Application number | US-201414165082-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 27, 2014 |
| Priority date | Jan 29, 2013 |
| Publication date | Mar 28, 2017 |
| Grant date | Mar 28, 2017 |
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A nano-structure semiconductor light emitting device includes a base layer formed of a first conductivity type semiconductor, and a first insulating layer disposed on the base layer and having a plurality of first openings exposing partial regions of the base layer. A plurality of nanocores is disposed in the exposed regions of the base layer and formed of the first conductivity-type semiconductor. An active layer is disposed on surfaces of the plurality of nanocores and positioned above the first insulating layer. A second insulating layer is disposed on the first insulating layer and has a plurality of second openings surrounding the plurality of nanocores and the active layer disposed on the surfaces of the plurality of nanocores. A second conductivity-type semiconductor layer is disposed on the surface of the active layer positioned to be above the second insulating layer.
Opening claim text (preview).
What is claimed is: 1. A nano-structure semiconductor light emitting device comprising: a base layer formed of a first conductivity type semiconductor; a first insulating layer disposed on the base layer and having a plurality of first openings exposing partial regions of the base layer; a plurality of nano-light emitting structures, each comprising a nanocore disposed in the exposed regions of the base layer and formed of the first conductivity-type semiconductor and a shell including an active layer and a second conductivity-type semiconductor layer sequentially disposed on a surface of the nanocore; and a second insulating layer disposed on the first insulating layer and having a plurality of second openings surrounding the nanocore and the active layer, wherein the second openings have a diameter greater than that of the first openings, and a portion of the first insulating layer in a perimeter of the first openings is exposed by the second openings; wherein the active layer is entirely positioned above the exposed portion of first insulating layer and the second conductivity-type semiconductor layer is entirely positioned above the second insulating layer. 2. The nano-structure semiconductor light emitting device of claim 1 , wherein regions of the nanocores positioned in the second openings have a sectional area greater than upper and lower regions thereof. 3. The nano-structure semiconductor light emitting device of claim 1 , wherein the first and second insulating layers are made of a same material. 4. The nano-structure semiconductor light emitting device of claim 1 , wherein the first and second insulating layers have different etching rates under same etching conditions. 5. The nano-structure semiconductor light emitting device of claim 4 , wherein an etching rate of the second insulating layer is higher than that of the first insulating layer. 6. The nano-structure semiconductor light emitting device of claim 4 , wherein the first and second insulating layers are made of different materials or have different air gap densities. 7. The nano-structure semiconductor light emitting device of claim 1 , wherein the second insulating layer is made of a material obtained by oxidizing a material of the first insulating layer.
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