Magnetic field generation apparatus and sputtering apparatus

Patent metadata

Field	Value
Publication number	US-9607813-B2
Application number	US-201414319638-A
Country	US
Kind code	B2
Filing date	Jun 30, 2014
Priority date	Jul 11, 2013
Publication date	Mar 28, 2017
Grant date	Mar 28, 2017

Abstract

Provided is a magnetic field generation apparatus including: two or more main magnetic pole portions configured to generate a main magnetic field; one or more secondary magnetic pole portions including a plurality of first divisional magnets obtained by a division, that generate a secondary magnetic field for adjusting the generated main magnetic field; and a yoke portion including one or more first yokes opposing the plurality of first divisional magnets in correspondence with the one or more secondary magnetic pole portions.

First claim

What is claimed is:

1. A magnetic field generating apparatus, comprising:
(a) a first main magnetic pole portion comprised of a first plurality of first divisional magnets;
(b) a second main magnetic pole portion comprised of a second plurality of first divisional magnets;
(c) a first secondary magnetic pole portion comprised of a first plurality of second divisional magnets;
(d) a second secondary magnetic pole portion comprised of a second plurality of second divisional magnets;
(e) a back yoke;
(f) a first main magnetic pole yoke portion;
(g) a second main magnetic pole yoke portion;
(h) a first secondary magnetic pole yoke portion;
(i) a second secondary magnetic pole yoke portion,
wherein,
the first and second main magnetic pole portions generate a main magnetic field,
the first and second secondary magnetic pole portions generate a secondary magnetic field to adjust the main magnetic field,
the first plurality of first divisional magnets are arranged in a first effective annulus;
the second plurality of first divisional magnets are linearly arranged along an axis of the first effective annulus,
the first plurality of second divisional magnets are arranged in a second effective annulus and positioned between the first plurality of first divisional magnets and the second plurality of first divisional magnets,
the second plurality of second divisional magnets are arranged in a third effective annulus and positioned between the first plurality of second divisional magnets and the second plurality of first divisional magnets,
the back yoke is located at first sides of the first main magnetic pole portion, the second main magnetic pole portion, the first secondary magnetic pole portion, and the second secondary magnetic pole portion,
the first main magnetic pole yoke portion (a) is located at a second side of the first magnetic pole portion, which second side faces away from the first side of the first magnetic pole portion, and (b) overlies the first plurality of first divisional magnets,
the second main magnetic pole yoke portion (a) is located at a second side of the second magnetic pole portion, which second side faces away from the first side of the second magnetic pole portion, and (b) overlies the second plurality of first divisional magnets,
the first secondary magnetic pole yoke portion (a) is located at a second side of the first secondary magnetic pole portion, which second side faces away from the first side of the of the first secondary magnetic portion, and (b) overlies the first plurality of second divisional magnets,
the second secondary magnetic pole yoke portion is (a) located at a second side of the second secondary magnetic pole portion, which second side faces away from the first side of the second secondary magnetic pole portion, and (b) overlies the second plurality of second divisional magnets,
each of first main magnetic pole yoke portion, the second main magnetic pole yoke portion, the first secondary magnetic pole yoke portion, and the second secondary magnetic pole yoke portion respectively comprises one or more yokes made of a soft magnetic material.

2. The magnetic field generation apparatus according to claim 1 , further comprising a generation portion side where the main magnetic field is generated, wherein:
the generation portion is located at the second sides of the first and second main magnetic pole portions;
one of the first or second main magnetic pole portions has an N pole at its second side while the other of the first or second main magnetic pole portions has an S pole at its second side; and
one of the first or second secondary magnetic pole portions has an N pole at its second side while the other of the first or second secondary magnetic pole portions has an S pole at its second side
and the second main magnetic pole portion and has an S pole on the generation portion side.

3. The magnetic field generation apparatus according to claim 2 , wherein each annulus is an oval.

4. The magnetic field generation apparatus according to claim 1 , further comprising a holding portion configured to removably hold the first and second pluralities of second divisional magnets.

5. A sputtering apparatus, comprising:
a vacuum chamber;
a substrate support portion provided inside the vacuum chamber;
a target opposing the substrate support portion;
a magnetic field generation according to claim 1 .

6. The magnetic field generation apparatus of claim 1 , wherein the soft magnetic material is soft copper.

7. The sputtering apparatus of claim 5 , wherein the soft magnetic material is soft copper.

8. The magnetic field generation apparatus of claim 1 , wherein the first divisional magnets are rectangular shape and the second divisional magnets are cylindrical in shape.

9. The sputtering apparatus of claim 5 , wherein the first divisional magnets are rectangular shape and the second divisional magnets are cylindrical in shape.

10. The magnetic field generation apparatus of claim 1 , wherein the second divisional magnets of the first plurality of second divisional magnets and the second divisional magnets of the second plurality of second divisional magnetics are of different sizes.

11. The sputtering apparatus of claim 5 , wherein the second divisional magnets of the first plurality of second divisional magnets and the second divisional magnets of the second plurality of second divisional magnetics are of different sizes.

12. The magnetic field generation apparatus of claim 8 , wherein the second divisional magnets of the first plurality of second divisional magnets and the second divisional magnets of the second plurality of second divisional magnetics are of different diameters.

13. The sputtering apparatus of claim 9 , wherein the second divisional magnets of the first plurality of second divisional magnets and the second divisional magnets of the second plurality of second divisional magnetics are of different diameters.

14. The magnetic field generating apparatus of claim 1 , wherein:
the first plurality of first divisional magnets, the second plurality of first divisional magnets, first plurality of second divisional magnets, and the second plurality of second divisional magnets are each selectable to adjustably generate a magnetic field comprised of the main magnetic field and the secondary magnetic field, and
the one or more yokes of first main magnetic pole yoke portion average the magnetic fields generated by the first plurality of first divisional magnets, the one or more yokes of the second main magnetic pole yoke portion average the magnetic fields generated by the second plurality of first divisional magnets, the one or more yokes of the first secondary magnetic pole yoke portion average the magnetic fields generated by the first plurality of second divisional magnets, and the second secondary magnetic pole yoke portion average the magnetic fields generated by the second plurality of second divisional magnets.

15. The magnetic field generating apparatus of 1 , wherein each of first main magnetic pole yoke portion, the second main magnetic pole yoke portion, the first secondary magnetic pole yoke portion, and the second secondary magnetic pole yoke portion respectively comprises one yoke.

Assignees

• Sony Corp

Inventors

• Sasaki Jun
• Abe Atsuhiro
• Hiratsuka Ryoichi

Classifications

• H01J37/3455

  Movable magnets · CPC title

• H01J37/3405

  Magnetron sputtering · CPC title

• H01J37/345

  Magnet arrangements in particular for cathodic sputtering apparatus (material of magnets or magnets in general H01F1/00, H01F7/00) · CPC title

• H01F7/0278

  for generating uniform fields, focusing, deflecting electrically charged particles (for magnetic separation by Lorentz force B03C1/023; specially adapted for NMR applications G01R33/383) · CPC title

• C23C14/35

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title