Quantitative analysis method for measuring target element in specimen using laser-induced plasma spectrum

US9606065B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9606065-B2
Application numberUS-201314104888-A
CountryUS
Kind codeB2
Filing dateDec 12, 2013
Priority dateDec 13, 2012
Publication dateMar 28, 2017
Grant dateMar 28, 2017

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  1. Title

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  2. Abstract

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Abstract

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Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest precision and reproducibility are secured through linearity of a correlation plot of the peak intensities and a value by dividing a standard deviation value of calibration curve data (peak intensity ratios) by a slope when an internal standard method is used for quantitative analysis of a target element.

First claim

Opening claim text (preview).

What is claimed is: 1. A quantitative analysis method for measuring a target element in a specimen, comprising: obtaining a spectrum generated from laser-induced plasma upon irradiation of a laser beam to a specimen including a target element; obtaining a fitting curve of a remaining element from the spectrum using Lorentzian function as a curve fitting method; obtaining a peak curve of the target element by subtracting the fitting curve of a remaining element from the spectrum; calculating a peak intensity of the peak curve of the target element and a peak intensity of the fitting curve of a remaining element; and obtaining a composition ratio of the target element based on a ratio of the peak intensity of the peak curve of the target element to the peak intensity of the fitting curve of the remaining element, wherein, when the correlation plot is represented by a straight line passing through the origin, the selected wavelengths are wavelengths at which a slope change is small with respect to laser energy change. 2. The quantitative analysis method according to claim 1 , wherein the composition ratio of the target element is measured by applying peak intensities at wavelengths, selected by analyzing a correlation plot of peak intensities obtained by changing laser energy, to an internal standard method. 3. The quantitative analysis method according to claim 2 , wherein, when the correlation plot is represented by a straight line passing through the origin, the selected wavelengths are wavelengths at which a coefficient of determination R 2 is large. 4. The quantitative analysis method according to claim 2 , wherein, when the correlation plot obtained from the peak intensities at the selected wavelengths is represented by a straight line passing through the origin, a slope of the straight line is compared with a slope of a fitted straight line of a correlation plot of a material, the composition ratio of the target element of which is known in advance. 5. The quantitative analysis method according to claim 1 , wherein the obtaining a composition ratio of the target element comprises: obtaining a calibration curve using each peak intensity ratio and a composition ratio of each element; calculating values of σ R i S (σ Ri is a standard deviation of ratios of the peak intensities, and S is a slope of the calibration curve) from the calibration curve; and selecting peaks at wavelengths at which the values of σ R i S are small, and measuring the composition ratio of the target element by applying the intensities of the selected peaks to an internal standard method. 6. The quantitative analysis method according to claim 5 , wherein ratios of peak intensities at the selected wavelengths are substituted into the calibration curve to obtain the composition ratio of the target element. 7. The quantitative analysis method according to claim 1 , wherein a transformation equation for peak fitting is represented by Equation 1: y = 1 π ⁢ ∑ i ⁢ ( A i ⁢ γ i ( x - x i ) 2 + γ i 2 ) + ax + b , wherein A i is peak intensity.

Assignees

Inventors

Classifications

  • Investigating the spectrum (using colour filters G01J3/51) · CPC title

  • Emission spectrometry · CPC title

  • G01N21/718Primary

    Laser microanalysis, i.e. with formation of sample plasma · CPC title

  • G01N21/31Primary

    Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry {(G01N21/72 takes precedence)} · CPC title

  • thermally excited · CPC title

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What does patent US9606065B2 cover?
Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest p…
Who is the assignee on this patent?
Gwangju Inst Science & Tech
What technology area does this patent fall under?
Primary CPC classification G01N21/718. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).