Resin composition and molded article

US9605144B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9605144-B2
Application numberUS-201414341588-A
CountryUS
Kind codeB2
Filing dateJul 25, 2014
Priority dateJul 5, 2010
Publication dateMar 28, 2017
Grant dateMar 28, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A resin composition including an aromatic polyether ketone resin (I), and a fluororesin (II), the fluororesin (II) being a copolymer of tetrafluoroethylene and a perfluoroethylenic unsaturated compound represented by the following formula (1): CF 2 ═CF—R f 1   (1) wherein R f 1 represents —CF 3 or —OR f 2 , and R f 2 represents a C1 to C5 perfluoroalkyl group; the composition containing the aromatic polyether ketone resin (I) and the fluororesin (II) at a mass ratio (I):(II) of 95:5 to 50:50; the fluororesin (II) being dispersed as particles in the aromatic polyether ketone resin (I) and having an average dispersed particle size of 3.0 μm or smaller.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resin composition comprising an aromatic polyether ketone resin (I), and a fluororesin (II), the fluororesin (II) being a copolymer of tetrafluoroethylene and a perfluoroethylenic unsaturated compound represented by the following formula (1): CF 2 ═CF—R f 1   (1) wherein R f 1 represents —CF 3 or —OR f 2 , and R f 2 represents a C1 to C5 perfluoroalkyl group; the composition comprising the aromatic polyether ketone resin (I) and the fluororesin (II) at a mass ratio (I):(II) of 95:5 to 50:50; the fluororesin (II) being dispersed as particles in the aromatic polyether ketone resin (I) and having an average dispersed particle size of 1.90 μm or smaller, wherein the fluororesin (II) has a melt flow rate of 0.1 to 100 g/10 min, wherein the fluororesin (II) comprises 90 to 99 mol % of tetrafluoroethylene and 1 to 10 mol % of the perfluoroethylenic unsaturated compound represented by formula (1), and a molded article obtained from the resin composition has a limiting PV value of 800·kPa m/s or higher. 2. The resin composition according to claim 1 , wherein the fluororesin (II) has an average dispersed particle size of 0.30 μm or smaller. 3. The resin composition according to claim 1 , wherein the aromatic polyether ketone resin (I) is a polyether ether ketone. 4. The resin composition according to claim 1 , wherein a molded article obtained from the resin composition has a limiting PV value of 1000·kPa m/s or higher. 5. The resin composition according to claim 1 , which comprises the aromatic polyether ketone resin (I) and the fluororesin (II) at a mass ratio (I):(II) of 90:10 to 50:50. 6. The resin composition according to claim 1 , wherein the fluororesin (II) has an average dispersed particle size of 1.0 μm or smaller.

Assignees

Inventors

Classifications

  • C08L71/10Primary

    from phenols · CPC title

  • C08L27/18Primary

    Homopolymers or copolymers or tetrafluoroethene · CPC title

  • C08L61/16Primary

    of ketones with phenols · CPC title

  • containing ketone groups, e.g. polyarylethylketones, PEEK or PEK · CPC title

  • Compositions of polyethers obtained by reactions forming an ether link in the main chain (of polyacetals C08L59/00; of epoxy resins C08L63/00; of polythioether-ethers C08L81/02; of polyether-sulfones C08L81/06); Compositions of derivatives of such polymers · CPC title

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What does patent US9605144B2 cover?
A resin composition including an aromatic polyether ketone resin (I), and a fluororesin (II), the fluororesin (II) being a copolymer of tetrafluoroethylene and a perfluoroethylenic unsaturated compound represented by the following formula (1): CF 2 ═CF—R f 1   (1) wherein R f 1 represents —CF 3 or —OR f 2 , and R f 2 represents a C1 to C5 perfluoroalkyl group; the composition con…
Who is the assignee on this patent?
Univ Tsinghua, Daikin Ind Ltd
What technology area does this patent fall under?
Primary CPC classification C08L71/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).