Method of strengthening glass using plasma torches and/or arc jets, and articles made according to the same

US9604877B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9604877-B2
Application numberUS-201113137697-A
CountryUS
Kind codeB2
Filing dateSep 2, 2011
Priority dateSep 2, 2011
Publication dateMar 28, 2017
Grant dateMar 28, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Certain example embodiments relate to an improved method of strengthening glass substrates (e.g., soda lime silica glass substrates). In certain examples, a glass substrate may be chemically strengthened by creating an electric field within the glass. In certain cases, the chemical tempering may be performed by surrounding the substrate by a plasma including certain ions, such as Li + , K + , Mg 2+ , and/or the like. In some cases, these ions may be forced into the glass substrate due to the half-cycles of the electric field generated by the electrodes that formed the plasma. This may advantageously chemically strengthen a glass substrate on a substantially reduced time scale. In other example embodiments, an electric field may be set in a float bath such that sodium ions are driven from the molten glass ribbon into the tin bath, which may advantageously result in a stronger glass substrate with reduced sodium content.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for increasing strength of a glass substrate, the method comprising: having at least one plasma torch comprising at least first and second electrodes facing at least a first major surface of the glass substrate; spraying a plasma comprising replacement ions through a nozzle of the plasma torch facing the first major surface of the glass substrate via an applied asymmetric varying electric field between the two electrodes such that the plasma is sprayed proximate the first major surface of the glass substrate; providing the asymmetric varying electric field between the first and second electrodes, including increasing asymmetry between voltage half-cycles, in order to drive the replacement ions into the glass surface to a depth in the glass substrate of at least 100 micrometers in order to increase the strength of the glass substrate. 2. The method of claim 1 , further comprising: disposing a second plasma torch comprising third and fourth electrodes facing a second major surface of the glass substrate; and spraying a plasma comprising replacement ions through a nozzle of the second plasma torch facing the second major surface of the glass substrate via an applied electric field between the two electrodes such that the plasma is sprayed proximate the second major surface of the glass substrate, wherein the replacement ions are driven into the first and second major surfaces of the glass substrate so as to increase the strength of the glass substrate. 3. The method of claim 1 , wherein the replacement ions are divalent. 4. The method of claim 1 , wherein the replacement ions are multivalent. 5. The method of claim 1 , wherein the ions are driven to said depth in about 10 minutes or less. 6. The method of claim 5 , wherein the ions are driven to said depth in about 5 minutes or less. 7. The method of claim 1 , wherein, after the replacement ions are driven into the glass substrate, the glass substrate has an increased strength of at least 400 MPa. 8. The method of claim 7 , wherein said increased strength of the glass substrate is reached in about 10 minutes or less. 9. The method of claim 7 , wherein the said increased strength of the glass substrate is at least 600 MPa. 10. The method of claim 1 , wherein the glass substrate comprises soda lime silica glass.

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What does patent US9604877B2 cover?
Certain example embodiments relate to an improved method of strengthening glass substrates (e.g., soda lime silica glass substrates). In certain examples, a glass substrate may be chemically strengthened by creating an electric field within the glass. In certain cases, the chemical tempering may be performed by surrounding the substrate by a plasma including certain ions, such as Li + , K + , M…
Who is the assignee on this patent?
Veerasamy Vijayen S, Hu Xuequn, Cerny Glenn A, and 1 more
What technology area does this patent fall under?
Primary CPC classification C03C23/006. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).